Growth of Different Microstructure of MoS 2 through Controlled Processing Parameters of Chemical Vapor Deposition Method
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18,008 citations
"Growth of Different Microstructure ..." refers background in this paper
...[2][3] Moreover, high flexibility (strain level of ~ 10%) of the MoS2 has been introduced its presence in flexible electronics.[4][5] Mechanically exfoliated MoS2 based transistor exhibited mobility 200 cm(2) V s and high on-off current ratio of 10(8)....
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13,348 citations
"Growth of Different Microstructure ..." refers background in this paper
...8 eV as well as modulating electronic properties as indirect to direct semiconductor with varying layers of the MoS2 make it most promising candidate for nanoelectronic, optoelectronic, and photonic devices applications on conventional substrates.[2][3] Moreover, high flexibility (strain level of ~ 10%) of the MoS2 has been introduced its presence in flexible electronics....
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12,477 citations
"Growth of Different Microstructure ..." refers background in this paper
...[4][5] Mechanically exfoliated MoS2 based transistor exhibited mobility 200 cm(2) V s and high on-off current ratio of 10(8).[6] However, mechanical exfoliation limits the high yield of MoS2 fabrication that restricts its utillization for practical device applications....
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10,586 citations
"Growth of Different Microstructure ..." refers background in this paper
...Semiconducting MoS2 member of transition-metal dichalcogenides family has been emerged as an exciting 2D (two-dimensional) material in contrast to renowned zere band gap graphene.[1] Tunable bandgap form 1....
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4,212 citations
"Growth of Different Microstructure ..." refers background in this paper
...Because, horizontally aligned MoS2 (exposed basal plane) is useful for fabricating transistor and photodiode due to inplane transportation[7] and exposed edge site MoS2 microstructures show more beneficial for sensing and hydrogen evolution reaction (HER) as a result of high chemical reactivity of edge sites....
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