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Identification of Nucleation Center Sites in Thermally Annealed Hydrogenated Amorphous Silicon

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TLDR
In this article, it was shown that nucleation in thermally annealed hydrogenated amorphous silicon occurs in the more well ordered spatial regions in the network, which are defined by the initial inhomogeneous H distributions in the as-grown films.
Abstract
Utilizing the concepts of a critical crystallite size and local film inhomogeneity, it is shown that nucleation in thermally annealed hydrogenated amorphous silicon occurs in the more well ordered spatial regions in the network, which are defined by the initial inhomogeneous H distributions in the as-grown films. Although the film H evolves very early during annealing, the local film order is largely retained in the still amorphous films even after the vast majority of the H is evolved, and the more well ordered regions which are the nucleation center sites for crystallization are those spatial regions which do not initially contain clustered H, as probed by H NMR spectroscopy. The sizes of these better ordered regions relative to a critical crystallite size determine the film incubation times (the time before the onset of crystallization). Changes in film short range order upon H evolution, and the presence of microvoid type structures in the as grown films play no role in the crystallization process. While the creation of dangling bonds upon H evolution may play a role in the actual phase transformation itself, the film defect densities measured just prior to the onset of crystallization exhibit no trends which can be correlated with the film incubation times.

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Citations
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Journal ArticleDOI

On the effect of the amorphous silicon microstructure on the grain size of solid phase crystallized polycrystalline silicon

TL;DR: In this paper, the effect of the microstructure of remote plasma-deposited amorphous silicon films on the grain size development in polycrystalline silicon upon solid-phase crystallization is reported.
Journal ArticleDOI

Characterization and control of crystal nucleation in amorphous electron beam evaporated silicon for thin film solar cells

TL;DR: In this paper, the kinetics of crystal nucleation in high-rate electron beam evaporated amorphous Si for polycrystalline thin film solar cells were systematically studied on SiN and selected ZnO:Al-coated glass substrates with dissimilar surface topographies by employing Raman spectroscopy, transmission electron microscopy, and optical microscopy.
Journal ArticleDOI

Finite-thickness effect on crystallization kinetics in thin films and its adaptation in the Johnson-Mehl-Avrami-Kolmogorov model

TL;DR: In this article, an analytical solution for the crystallization kinetics in the special case of plate-shaped samples with a finite thickness is presented. But the analytical solution does not reveal the thickness range which influences the isothermal crystallization mode significantly.
Journal ArticleDOI

Solid-phase crystallization of ultra high growth rate amorphous silicon films

TL;DR: In this article, the authors report on the deposition of amorphous silicon (a-Si:H) films at ultra-high growth rate (11-60nm/s) by means of the expanding thermal plasma technique, followed by solid phase crystallization (SPC).
References
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Journal ArticleDOI

Deposition of device quality, low H content amorphous silicon

TL;DR: In this paper, it was shown that hydrogenated amorphous silicon containing as little as 1/10 the bonded H observed in device-quality glow discharge films have been deposited by thermal decomposition of silane on a heated filament.
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Structural information from the Raman spectrum of amorphous silicon.

TL;DR: It is shown that the width of the ``optic peak'' increases roughly linearly with the rms bond-angle distortion of the network, consistent with model-building experience which shows that it is impossible to construct fully bonded amorphous networks with \ensuremath{\Delta}${\ensureMath{\theta}}_{b}$.
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Crystal grain nucleation in amorphous silicon

TL;DR: In this paper, the morphological evolution of the amorphous towards the polycrystalline phase is investigated by transmission electron microscopy and it is interpreted in terms of a physical model containing few free parameters related to the thermodynamical properties of ammorphous silicon and to the kinetical mechanisms of crystal grain growth.
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Recrystallization of amorphized polycrystalline silicon films on SiO2: Temperature dependence of the crystallization parameters

TL;DR: In this paper, a theoretical and experimental study of the recrystallization behavior of polycrystalline silicon films amorphized by self-implantation was carried out and the crystallization behavior was found to be similar to the crystallisation behavior of films deposited in the amorphous state, however, a transient time was observed, during which negligible crystallization occurs.
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Large grain polycrystalline silicon by low‐temperature annealing of low‐pressure chemical vapor deposited amorphous silicon films

TL;DR: In this paper, the average grain size of the crystallized amorphous silicon films depends on the annealing temperature and the deposition conditions, and the final grain size is also influenced by the annaling temperature with the largest grain size obtained at low-annealing temperatures.
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