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Proceedings ArticleDOI

Impact of technology scaling on the minimum energy point for FinFET based flip-flops

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TLDR
Analysis of FinFET based transmission gate, sense amplifier, and semi dynamic Flip-flops metrics are evaluated with technology scaling from 20nm down to 7nm technology node and the optimum supply voltage value at each technology node from minimum energy perspective is evaluated.
Abstract
Analysis of FinFET based transmission gate (TG), sense amplifier (SA), and semi dynamic (SD) Flip-flops metrics are evaluated with technology scaling from 20nm down to 7nm technology node. The impact of supply voltage variation on delay, power, and energy is reported. The power delay product of Flip-flops is enhanced with technology scaling. The optimum supply voltage value at each technology node from minimum energy perspective is evaluated which is used by the industry to optimize logic and memory circuitry designs. For instance, considering the 7nm TG Flip-flop, the optimum supply voltage from energy saving point of view occurs at 0.65V. The work also characterizes each Flip-flop according to the obtained simulation results. SD Flip-flop has the best performance, however it exhibits high power consumption. TG Flip-flop is the best choice from power dissipation perspective, but it has high clock load. SA Flip-flop has a very useful feature of monotonous transitions at the outputs, which drives fast domino logic, however it might have glitches and it is the most vulnerable to soft errors.

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References
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Proceedings ArticleDOI

FinFET scaling to 10 nm gate length

TL;DR: In this paper, the authors report the design, fabrication, performance, and integration issues of double-gate FinFETs with the physical gate length being aggressively shrunk down to 10 nm and the fin width down to 12 nm.
Proceedings ArticleDOI

Exploring sub-20nm FinFET design with predictive technology models

TL;DR: Predictive MOSFET models are critical for early stage design-technology co-optimization and circuit design research and PTM for FinFET devices are generated for 5 technology nodes corresponding to the years 2012-2020 on the ITRS roadmap.
Proceedings ArticleDOI

Tri-Gate Transistor Architecture with High-k Gate Dielectrics, Metal Gates and Strain Engineering

TL;DR: In this paper, the benefits of the fully depleted tri-gate transistor architecture with high-k gate dielectrics, metal gate electrodes and strain engineering are combined with high performance NMOS and PMOS trigate transistors.
Journal ArticleDOI

Intrinsic fluctuations in sub 10-nm double-gate MOSFETs introduced by discreteness of charge and matter

TL;DR: In this article, the intrinsic parameter fluctuations in sub 10 nm gate length double gate MOSFETs introduced by discreteness of charge and atomicity of matter were studied using numerical simulation.
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