In situ XAS and XRF study of nanoparticle nucleation during O3-based Pt deposition
01 Jan 2013-
TL;DR: X-ray absorption spectroscopy (XAS) and X-ray fluorescence (XRF) were combined in situ to study the ALD-based synthesis of Pt catalysts as discussed by the authors.
Abstract: X-ray absorption spectroscopy (XAS) and X-ray fluorescence (XRF) were combined in situ to study the ALD-based synthesis of Pt catalysts. This first time combination of synchrotron-based techniques was applied during the (methylcyclopentadienyl)trimethylplatinum/ozone deposition process executed at 150 °C on a silica support. A nucleation delay indicative for nanoparticle formation was observed for Pt loadings below 1 equivalent monolayer. XAS and XRF were recorded simultaneously at different catalyst loadings in this nucleation regime. Analysis of the combined in situ data yielded a quantitative picture of the evolution of the diameter, shape, lattice packing and density of the deposited Pt clusters. Additionally, the degree of oxidation at the cluster surface after the ozone pulse could be monitored. At the early start of the deposition process, Pt adatoms cluster together to form stable nuclei. A strong increase in the density of nuclei is seen below 0.16 equivalent monolayers, after which coalescence gradually occurs. From 0.04 to 0.71 equivalent monolayers, Pt clusters are fcc packed and correspond best to a hemispherical (1 1 1)-truncated cuboctahedral shape. By crosslinking the XRF and XAS data, a linear increase in cluster diameter with Pt loading is observed within this range. The surface of the Pt clusters is shown to be oxidized immediately after the ozone exposure. The degree of surface oxidation remains approximately constant for clusters with a 1–3 nm diameter. This surface oxygen is shown to be crucial for further growth during deposition. The combined application of in situ XRF and XAS thus allowed for an advanced identification of the ALD-deposited Pt nanoparticles.
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Dissertation•
01 Jan 2015
TL;DR: In this article, a wavelet transformed (WT) XAS was applied to reveal physicochemical mechanisms governing Pt-In catalyst formation. But the results were limited to the case of a Pt-acac 2 impregnated Mg(In)(Al)Ox support.
Abstract: Complementary to conventional X-ray absorption near edge structure (XANES) and Fourier transformed (FT) extended X-ray absorption fine structure (EXAFS) analysis, the systematic application of wavelet transformed (WT) XAS is shown to disclose the physicochemical mechanisms governing Pt-In catalyst formation. The simultaneous kand R-space resolution of the WT XAS signal allows for the efficient allocation of the elemental nature to each Rspace peak. Because of its elemental discrimination capacity, the technique delivers structural models which can subsequently serve as an input for quantitative FT EXAFS modeling. The advantages and limitations of applying WT XAS are demonstrated (1) before and (2) after calcination to 650 °C of a Pt(acac)2 impregnated Mg(In)(Al)Ox support, and (3) after subsequent H2 reduction to 650 °C. Combined XANES, FT and WT XAS analysis shows that the acac ligands of the Pt precursor decompose during calcination, leading to atomically dispersed Pt 4+ cations on the Mg(In)(Al)Ox support. H2 reduction treatment eventually results in the formation of 1.5 nm Pt-In alloyed nanoparticles. Wide-spread use and systematic application of wavelet-based XAS can potentially reveal in greater details the intricate mechanisms involved in catalysis, chemistry and related fields.
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TL;DR: In this paper , a multi-pronged approach is developed to provide complementary information on Pt sintering covering multiple length scales, including high-resolution scanning electron microscopy (HRSEM) and Monte Carlo simulation.
Abstract: Metal nanoparticle (NP) sintering is a prime cause of catalyst degradation, limiting its economic lifetime and viability. To date, sintering phenomena are interrogated either at the bulk scale to probe averaged NP properties or at the level of individual NPs to visualize atomic motion. Yet, "mesoscale" strategies which bridge these worlds can chart NP populations at intermediate length scales but remain elusive due to characterization challenges. Here, a multi-pronged approach is developed to provide complementary information on Pt NP sintering covering multiple length scales. High-resolution scanning electron microscopy (HRSEM) and Monte Carlo simulation show that the size evolution of individual NPs depends on the number of coalescence events they undergo during their lifetime. In its turn, the probability of coalescence is strongly dependent on the NP's mesoscale environment, where local population heterogeneities generate NP-rich "hotspots" and NP-free zones during sintering. Surprisingly, advanced in situ synchrotron X-ray diffraction shows that not all NPs within the small NP sub-population are equally prone to sintering, depending on their crystallographic orientation on the support surface. The demonstrated approach shows that mesoscale heterogeneities in the NP population drive sintering and mitigation strategies demand their maximal elimination via advanced catalyst synthesis strategies.
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TL;DR: A software package for the analysis of X-ray absorption spectroscopy (XAS) data is presented, based on the IFEFFIT library of numerical and XAS algorithms and is written in the Perl programming language using the Perl/Tk graphics toolkit.
Abstract: A software package for the analysis of X-ray absorption spectroscopy (XAS) data is presented. This package is based on the IFEFFIT library of numerical and XAS algorithms and is written in the Perl programming language using the Perl/Tk graphics toolkit. The programs described here are: (i) ATHENA, a program for XAS data processing, (ii) ARTEMIS, a program for EXAFS data analysis using theoretical standards from FEFF and (iii) HEPHAESTUS, a collection of beamline utilities based on tables of atomic absorption data. These programs enable high-quality data analysis that is accessible to novices while still powerful enough to meet the demands of an expert practitioner. The programs run on all major computer platforms and are freely available under the terms of a free software license.
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1,464 citations
TL;DR: Puurunen et al. as discussed by the authors summarized the two-reactant ALD processes to grow inorganic materials developed to-date, updating the information of an earlier review on ALD.
Abstract: Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely suitable for depositing uniform and conformal films on complex three-dimensional topographies. The deposition of a film of a given material by ALD relies on the successive, separated, and self-terminating gas–solid reactions of typically two gaseous reactants. Hundreds of ALD chemistries have been found for depositing a variety of materials during the past decades, mostly for inorganic materials but lately also for organic and inorganic–organic hybrid compounds. One factor that often dictates the properties of ALD films in actual applications is the crystallinity of the grown film: Is the material amorphous or, if it is crystalline, which phase(s) is (are) present. In this thematic review, we first describe the basics of ALD, summarize the two-reactant ALD processes to grow inorganic materials developed to-date, updating the information of an earlier review on ALD [R. L. Puurunen, J. Appl. Phys. 97, 121301 (2005)], and give an overview of the status of processing ternary compounds by ALD. We then proceed to analyze the published experimental data for information on the crystallinity and phase of inorganic materials deposited by ALD from different reactants at different temperatures. The data are collected for films in their as-deposited state and tabulated for easy reference. Case studies are presented to illustrate the effect of different process parameters on crystallinity for representative materials: aluminium oxide, zirconium oxide, zinc oxide, titanium nitride, zinc zulfide, and ruthenium. Finally, we discuss the general trends in the development of film crystallinity as function of ALD process parameters. The authors hope that this review will help newcomers to ALD to familiarize themselves with the complex world of crystalline ALD films and, at the same time, serve for the expert as a handbook-type reference source on ALD processes and film crystallinity.
1,160 citations
892 citations