Investigations on the Optical Properties of Undoped, Fluorine Doped and Antimony Doped Tin Oxide Films

TLDR: In this paper, the optical properties of these films are investigated in the entire UV-Visible-IR region (0.2 - 10 mikrom). The observed absorption edge lies at 3.65 eV for undoped tin oxide and on doping it shifts towards higher energies, which is due to the Moss-Burstein effect.

Abstract: Undoped, fluorine doped and antimony doped tin oxide films are prepared on quartz plates by Spray pyrolysis technique. The films grown at the optimum substrate temperature with different doping levels have been chosen for this study. Optical properties of these films are investigated in the entire UV-Visible -IR region (0.2 - 10 mikrom). The observed absorption edge lies at 3.65 eV for undoped tin oxide and on doping it shifts towards higher energies, which is due to the Moss - Burstein effect. For fluorine doping depending upon the fluorine concentration, the absorption edge lies in the range 3.9 - 4.14 eV and for antimony doping it lies in the range 3.82 - 4.1 eV. In the undoped tin oxide films the direct allowed transition occurs at 4.02 eV and indirect allowed transition occurs at 2.43 eV, whereas for fluorine doped tin oxide and antimony doped tin oxide films, the direct allowed transitions occur in the range 4.18 - 4.28 and 4.13 - 4.22 eV respectively and the indirect allowed transitions occur in the range 2.63 - 2.73 and 2.54 - 2.65 eV respectively. Optical properties near the plasma edge have been analyzed using Drude's theory. The dependence of effective mass on carrier concentration has been explained on the basis of nonparabolicity of the conduction band. The shift in the fermi energy, calculated on the basis of energy dependent effective mass, is consistent with the measured shift in the absorption edge.