Abstract: In this paper, the transient radiation effect of MOS devices irradiated by pulse laser is studied using TCAD tool. Firstly, the laser radiation model is built up based on the TCAD tool, and also MOS devices model are created and the I-V characteristics are simulated for proving their correctness. With the pulse laser model, the transient responses of MOS devices working in different modes irradiated by pulse laser are simulated. The results show that the transient radiation effect caused by pulse laser when irradiating MOS devices leads to leakage current of the substrate of MOS devices, and the current amplitude increases with the laser’s intensity. Introduction In the radiation environment, the interaction of gamma rays, neutrons etc. with semiconductor devices can induce ionization effects and short term effects, which can severely impact the function of devices and circuits [1]. Therefore, devices and circuits working in harsh environments have to be tested before using them in certain missions. Pulsed X-ray machines and linear accelerators are commonly used to study these radiation effects and analysis the reliability of devices and circuits; however, they require relatively large installations and have a high cost of operation. The laser interacting with semiconductor materials can produce photoelectric effect, which can excite electron-hole pairs in the semiconductor. This is similar with the radiation effect caused by gamma or X rays and ions that can inject excess carries to the semiconductor materials or devices. Habing from SNL first reported the use of pulse laser to simulate the radiation effects of semiconductor devices. It is proved that the pulse laser can effectively simulate the transient radiation effect [2]. In practical use, the pulse laser facility has the advantages of low cost, easy control and precise spatial resolution, which make the laser simulation technique very popular in radiation area. It can simulate the radiation effect and help analysis the reliability of semiconductor devices flexibly and safely in the laboratory [3-6]. TCAD (Technology Computer Aided Design) tool can be used to model semiconductor fabrication and semiconductor device operation. It can help study the physical characteristics of devices used in circuits from lower level. In this paper, based on the TCAD tool, a laser radiation model is built up for deeply studying the transient radiation effect of the pulse laser interacting with MOS (Metal Oxide Semiconductor) devices. The structure of this paper is as follows: in the first section, the laser radiation model based on TCAD is descripted; besides, the MOS devices used for simulation is created. Then, with the laser radiation model, simulation results of pulse laser irradiating MOS devices are given and analyzed. And finally the paper draws conclusions. Simulation Setup A. Pulse laser modeling As shown in Figure 1, when a laser illuminates a semiconductor structure, a reflection/ transmission process occurs at interfaces. The photons transmitted inside the semiconductor device are absorbed by the semiconductor material or escape from the structure. If the energy of the 4th International Conference on Electrical & Electronics Engineering and Computer Science (ICEEECS 2016) Copyright © 2016, the Authors. Published by Atlantis Press. This is an open access article under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/). Advances in Computer Science Research, volume 50