Low-voltage pentacene organic field-effect transistors with high-κ HfO2 gate dielectrics and high stability under bias stress
TL;DR: In this article, a low-voltage pentacene organic field effect transistors are demonstrated with high-κ hafnium dioxide gate dielectrics grown by atomic layer deposition at 200 °C.
Abstract: Low-voltage pentacene organic field-effect transistors are demonstrated (operating voltage of −3 V) with high-κ hafnium dioxide gate dielectrics grown by atomic layer deposition at 200 °C. A high hole mobility of 0.39 cm2/V s with low threshold voltage (<−0.5 V) and low subthreshold slope of 120 mV/dec is achieved with a HfO2 dielectric layer modified with a phosphonic acid based treatment. A high value of 94.8 nF/V s is obtained for the product of mobility and capacitance density. The devices show excellent bias stress stability with or without the phosphonic acid at the HfO2 gate dielectric surface.
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TL;DR: In this paper , the spontaneous polarization and thermal conductivity of ferroelectric HfO2 were investigated under pressure and strain engineering, and it was shown that the larger spontaneous polarization, the larger the thermal conduction, regardless of whether the spontaneous polarities were enhanced or suppressed.
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TL;DR: In this article, the synthesis and dielectric properties of polymetalloxane dielectrics materials for organic field-effect transistor applications were reported, which showed an appreciable stability to self-condensation and a good coating quality.
Abstract: We report here the synthesis and dielectric properties of polymetalloxane dielectric materials for organic field-effect transistor applications. The gate insulators were obtained from polymetalloxanes by condensation polymerization of metal chelates and silicic acid. The solution shows an appreciable stability to self-condensation and a good coating quality. A high dielectric constant 6.16–8.27 was obtained for the prepared films. Organic thin film transistors with this gate dielectric were found to exhibit high performances, including carrier mobility as large as 1.77 cm2/Vs, on-off current ratios above 1×104, threshold voltages below −0.13 V, and subthreshold swing as low as 0.1 V/decade. In addition, the operating voltage ranges as low as 5 volts was obtained.
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20 Jun 2021
TL;DR: In this article, the fabrication of high-performance OFETs based on room temperature deposited Ba0.5Sr 0.5TiO3 (BST) as a high-k dielectric layer was reported.
Abstract: Lowering the processing temperature is a crucial factor in the development of flexible electronic devices. Here we report the fabrication of high-performance OFETs based on room temperature deposited Ba0.5Sr0.5TiO3 (BST) as a high-k dielectric layer. The fabricated devices exhibited excellent performance while operating at a low voltage of -3 V along with demonstrating high operational stability when tested for 1 h bias stress and continuous transfer measurement cycles. In addition, inverter circuit performance is also investigated with these devices by connecting them to external loads.
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TL;DR: Flexible active-matrix monochrome electrophoretic displays based on solution-processed organic transistors on 25-μm-thick polyimide substrates based on 1,888 transistors are demonstrated, which are the largest organic integrated circuits reported to date.
Abstract: At present, flexible displays are an important focus of research1,2,3 Further development of large, flexible displays requires a cost-effective manufacturing process for the active-matrix backplane, which contains one transistor per pixel One way to further reduce costs is to integrate (part of) the display drive circuitry, such as row shift registers, directly on the display substrate Here, we demonstrate flexible active-matrix monochrome electrophoretic displays based on solution-processed organic transistors on 25-μm-thick polyimide substrates The displays can be bent to a radius of 1 cm without significant loss in performance Using the same process flow we prepared row shift registers With 1,888 transistors, these are the largest organic integrated circuits reported to date More importantly, the operating frequency of 5 kHz is sufficiently high to allow integration with the display operating at video speed This work therefore represents a major step towards 'system-on-plastic'
1,577 citations
TL;DR: In this article, the properties of low-temperature Al2O3 ALD films were investigated versus growth temperature by depositing films on Si(100) substrates and quartz crystal microbalance (QCM) sensors.
Abstract: Al2O3 films were deposited by atomic layer deposition (ALD) at temperatures as low as 33 °C in a viscous-flow reactor using alternating exposures of Al(CH3)3 (trimethylaluminum [TMA]) and H2O. Low-temperature Al2O3 ALD films have the potential to coat thermally fragile substrates such as organic, polymeric, or biological materials. The properties of low-temperature Al2O3 ALD films were investigated versus growth temperature by depositing films on Si(100) substrates and quartz crystal microbalance (QCM) sensors. Al2O3 film thicknesses, growth rates, densities, and optical properties were determined using surface profilometry, atomic force microscopy (AFM), QCM, and spectroscopic ellipsometry. Al2O3 film densities were lower at lower deposition temperatures. Al2O3 ALD film densities were 3.0 g/cm3 at 177 °C and 2.5 g/cm3 at 33 °C. AFM images showed that Al2O3 ALD films grown at low temperatures were very smooth with a root-mean-squared (RMS) roughness of only 4 ± 1 A. Current−voltage and capacitance−voltage...
1,274 citations
Book•
01 Jan 1996
TL;DR: Semiconductor Models -- A General Introduction, Field Effect Introduction -- the J-FET and MESFET, and Electrostatics -- Mostly Qualitative Formulation.
Abstract: I. SEMICONDUCTOR FUNDAMENTALS. 1. Semiconductors -- A General Introduction. General Material Properties. Crystal Structure. Crystal Growth. 2. Carrier Modeling. The Quantization Concept. Semiconductor Models. Carrier Properties. State and Carrier Distributions. Equilibrium Carrier Concentrations. 3. Carrier Action. Drift. Diffusion. Recombination -- Generation. Equations of State. Supplemental Concepts. 4. Basics of Device Fabrication. Fabrication Processes. Device Fabrication Examples. R1. Part I Supplement and Review. Alternative/Supplemental Reading List. Figure Sources/Cited References. Review List of Terms. Part I Review Problem Sets and Answers. IIA. PN JUNCTION DIODES. 5. PN Junction Electrostatics. Preliminaries. Quantitative Electrostatic Relationships. 6. PN Junction Diode -- I-V Characteristics. The Ideal Diode Equation. Deviations from the Ideal. Special Considerations. 7. PN Junction Diode -- Small-Signal Admittance. Introduction. Reverse-Bias Junction Capacitance. Forward-Bias Diffusion Admittance. 8. PN Junction Diode -- Transient Response. Turn-Off Transient. Turn-On Transient. 9. Optoelectronic Diodes. Introduction. Photodiodes. Solar Cells. LEDs. IIB. BJTS AND OTHER JUNCTION DEVICES. 10. BJT Fundamentals. Terminology. Fabrication. Electrostatics. Introductory Operational Considerations. Performance Parameters. 11. BJT Static Characteristics. Ideal Transistor Analysis. Deviations from the Ideal. Modern BJT Structures. 12. BJT Dynamic Response Modeling. Equivalent Circuits. Transient (Switching) Response. 13. PNPN Devices. Silicon Controlled Rectifier (SCR). SCR Operational Theory. Practical Turn-on/Turn-off Considerations. Other PNPN Devices. 14. MS Contacts and Schottky Diodes. Ideal MS Contacts. Schottky Diode. Practical Contact Considerations. R2. Part II Supplement and Review. Alternative/Supplemental Reading List. Figure Sources/Cited References. Review List of Terms. Part II Review Problem Sets and Answers. III. FIELD EFFECT DEVICES. 15. Field Effect Introduction -- the J-FET and MESFET. General Introduction. J-FET. MESFET. 16. MOS Fundamentals. Ideal Structure Definition. Electrostatics -- Mostly Qualitative. Electrostatics -- Quantitative Formulation. Capacitance-Voltage Characteristics. 17. MOSFETs -- The Essentials. Qualitative Theory of Operation. Quantitative ID - VD Relationships. ac Response. 18. Nonideal MOS. Metal-Semiconductor Workfunction Difference. Oxide Charges. MOSFET Threshold Considerations. 19. Modern FET Structures. Small Dimension Effects. Select Structure Survey. R3. Part III Supplement and Review. Alternative/Supplemental Reading List. Figure Sources/Cited References. Review List of Terms. Part III Review Problem Sets and Answers. Appendix A. Elements of Quantum Mechanics. Appendix B. MOS Semiconductor Electrostatics -- Exact Solution. Appendix C. MOS C-V Supplement. Appendix D. MOS I-Vsupplement. Appendix E. List of Symbols. Appendix M. MATLAB Program Script.
1,048 citations
TL;DR: In this article, a pentacene organic thin-film transistor (OTFT) driven active matrix organic light-emitting diode (OLED) displays on flexible polyethylene terephthalete substrates were fabricated.
Abstract: We have fabricated pentacene organic thin-film transistor (OTFT) driven active matrix organic light-emitting diode (OLED) displays on flexible polyethylene terephthalete substrates These displays have 48×48 bottom-emission OLED pixels with two pentacene OTFTs used per pixel Parylene is used to isolate the OTFTs and OLEDs with good OTFT yield and uniformity
577 citations
05 Jul 2005
TL;DR: Progress is reported on in developing materials, processes, and devices for the realization of ultralow-cost printed RFID tags using novel pentacene and oligothiophene precursors for pMOS and ZnO nanoparticles for nMOS.
Abstract: Printed electronics provides a promising potential pathway toward the realization of ultralow-cost RFID tags for item-level tracking of consumer goods. Here, we report on our progress in developing materials, processes, and devices for the realization of ultralow-cost printed RFID tags. Using printed nanoparticle patterns that are subsequently sintered at plastic-compatible temperatures, low-resistance interconnects and passive components have been realized. Simultaneously, printed transistors with mobilities >10/sup -1/ cm/sup 2//V-s have been realized using novel pentacene and oligothiophene precursors for pMOS and ZnO nanoparticles for nMOS. AC performance of these devices is adequate for 135-kHz RFID, though significant work remains to be done to achieve 13.56-MHz operation.
501 citations