Magnetron sputtering: a review of recent developments and applications
TL;DR: Magnetron sputtering has become the process of choice for the deposition of a wide range of industrially important coatings, such as hard, wear-resistant, low friction, corrosion resistant, and decorative coatings as discussed by the authors.
About: This article is published in Vacuum.The article was published on 2000-03-01. It has received 1640 citations till now. The article focuses on the topics: High-power impulse magnetron sputtering & Sputter deposition.
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TL;DR: The physicochemical characteristics of spinels such as their compositions, structures, morphologies, defects, and substrates have been rationally regulated through various approaches and can yield spinels with improved ORR/OER catalytic activities, which can further accelerate the speed, prolong the life, and narrow the polarization of fuel cells, metal-air batteries, and water splitting devices.
Abstract: Spinels with the formula of AB2O4 (where A and B are metal ions) and the properties of magnetism, optics, electricity, and catalysis have taken significant roles in applications of data storage, biotechnology, electronics, laser, sensor, conversion reaction, and energy storage/conversion, which largely depend on their precise structures and compositions. In this review, various spinels with controlled preparations and their applications in oxygen reduction/evolution reaction (ORR/OER) and beyond are summarized. First, the composition and structure of spinels are introduced. Then, recent advances in the preparation of spinels with solid-, solution-, and vapor-phase methods are summarized, and new methods are particularly highlighted. The physicochemical characteristics of spinels such as their compositions, structures, morphologies, defects, and substrates have been rationally regulated through various approaches. This regulation can yield spinels with improved ORR/OER catalytic activities, which can furth...
1,036 citations
TL;DR: In this article, the development and application of magnetron sputtering systems for ionized physical vapor deposition (IPVD) is reviewed, and the application of a secondary discharge, inductively coupled plasma magnetron (ICP-MS), microwave amplified magnetron, and self-sustained sputtering (SSS) is discussed as well as the hollow cathode magnetron discharges.
972 citations
TL;DR: High power pulsed magnetron sputtering (HPPMS) is an emerging technology that has gained substantial interest among academics and industrials alike as discussed by the authors, also known as HIPIMS (high power impulse...
Abstract: High power pulsed magnetron sputtering (HPPMS) is an emerging technology that has gained substantial interest among academics and industrials alike. HPPMS, also known as HIPIMS (high power impulse ...
846 citations
TL;DR: A new kind of transparent conducting electrode is produced that exhibits both superior optoelectronic performances and remarkable mechanical flexibility under both stretching and bending stresses.
Abstract: Transparent conducting electrodes are essential components for numerous flexible optoelectronic devices, including touch screens and interactive electronics. Thin films of indium tin oxide-the prototypical transparent electrode material-demonstrate excellent electronic performances, but film brittleness, low infrared transmittance and low abundance limit suitability for certain industrial applications. Alternatives to indium tin oxide have recently been reported and include conducting polymers, carbon nanotubes and graphene. However, although flexibility is greatly improved, the optoelectronic performance of these carbon-based materials is limited by low conductivity. Other examples include metal nanowire-based electrodes, which can achieve sheet resistances of less than 10Ω □(-1) at 90% transmission because of the high conductivity of the metals. To achieve these performances, however, metal nanowires must be defect-free, have conductivities close to their values in bulk, be as long as possible to minimize the number of wire-to-wire junctions, and exhibit small junction resistance. Here, we present a facile fabrication process that allows us to satisfy all these requirements and fabricate a new kind of transparent conducting electrode that exhibits both superior optoelectronic performances (sheet resistance of ~2Ω □(-1) at 90% transmission) and remarkable mechanical flexibility under both stretching and bending stresses. The electrode is composed of a free-standing metallic nanotrough network and is produced with a process involving electrospinning and metal deposition. We demonstrate the practical suitability of our transparent conducting electrode by fabricating a flexible touch-screen device and a transparent conducting tape.
842 citations
TL;DR: The investigation shows how sensitive the refractive index functions are to the O2 and N2 flow rates, and for which growth conditions the materials deposit homogeneously, and allows conclusions to be drawn on the degree of amorphousness and roughness.
Abstract: The complex refractive index components, n and k, have been studied for thin films of several common dielectric materials with a low to medium refractive index as functions of wavelength and stoichiometry for mid-infrared (MIR) wavelengths within the range 1.54–14.29 μm (700–6500 cm−1). The materials silicon oxide, silicon nitride, aluminum oxide, aluminum nitride, and titanium oxide are prepared using room temperature reactive sputter deposition and are characterized using MIR variable angle spectroscopic ellipsometry. The investigation shows how sensitive the refractive index functions are to the O2 and N2 flow rates, and for which growth conditions the materials deposit homogeneously. It also allows conclusions to be drawn on the degree of amorphousness and roughness. To facilitate comparison of the materials deposited in this work with others, the index of refraction was also determined and provided for the near-IR and visible ranges of the spectrum. The results presented here should serve as a useful information base for designing optical coatings for the MIR part of the electromagnetic spectrum. The results are parameterized to allow them to be easily used for coating design.
724 citations
Cites background from "Magnetron sputtering: a review of r..."
...Reactive sputtering is a useful tool to create thin films of sufficient quality to serve as optical coatings and has been a routine method for the various regions of the optical spectrum for many years [5]....
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References
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TL;DR: Two cylindrically symmetric and complementary sputtering geometries, the post and hollow cathodes, were used to deposit thick coatings of various metals (Mo, Cr, Ti, Fe, Cu, and Al-alloy) onto glass and metallic substrates at deposition rates of 1000-2000 A/min under various conditions of substrate temperature, argon pressure, and plasma bombardment as mentioned in this paper.
Abstract: Two cylindrically symmetric and complementary sputtering geometries, the post and hollow cathodes, were used to deposit thick (∼25-μ) coatings of various metals (Mo, Cr, Ti, Fe, Cu, and Al-alloy) onto glass and metallic substrates at deposition rates of 1000–2000 A/min under various conditions of substrate temperature, argon pressure, and plasma bombardment. Coating surface topographies and fracture cross sections were examined by scanning electron microscopy. Polished cross sections were examined metallographically. Crystallographic orientations were determined by x-ray diffraction. Microstructures were generally consistent with the three-zone model proposed by Movchan and Demchishin [Fiz. Metal. Metalloved. 28, 653 (1969)]. Three differences were noted: (1) at low argon pressures a broad zone 1–zone 2 transition zone consisting of densely packed fibrous grains was identified; (2) zone 2 columnar grains tended to be faceted at elevated temperatures, although facets were often replaced by smooth flat surf...
2,195 citations
TL;DR: In this paper, the structure zone models, previously developed to classify the larger sized physical structures, are revised to account for the evolutionary growth stages of structure development as well as the separate effects of thermal and bombardment induced mobility.
Abstract: Thin films prepared under conditions of low adatom mobility are characterized by a highly anisotropic physical structure with a wide range of systematically varying column and void sizes. The structure zone models, previously developed to classify the larger sized physical structures, are revised to account for the evolutionary growth stages of structure development as well as the separate effects of thermal‐ and bombardment‐induced mobility. The zone T introduced by Thornton is shown to be a subzone within zone 1.
850 citations
01 Jan 1983
622 citations
"Magnetron sputtering: a review of r..." refers background in this paper
...Consequently, magnetron sputtering now makes a signi"cant impact in application areas including hard, wear-resistant coatings, low friction coatings, corrosion-resistant coatings, decorative coatings and coatings with speci"c optical, or electrical properties [1]....
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TL;DR: In this article, the charged particle fluxes from circular planar magnetrons with different magnetic field configurations were investigated and the authors reported measurements of the currents to earthed substrates, the substrate self-biasing voltages, the ion currents to substrates at −100 V, and deposition rates as functions of axial and radial positions with respect to the target.
Abstract: We have investigated the charged particle fluxes from circular planar magnetrons with different magnetic field configurations and report measurements of the currents to earthed substrates, the substrate self‐biasing voltages, the ion currents to substrates at −100 V, and deposition rates as functions of axial and radial positions with respect to the target. The magnetrons fall into two classes, whose characteristics are explained in terms of electron motion in inhomogeneous magnetic fields. Both low and high electron/ion bombardment of the growing film can be achieved by small alterations to the magnetic field configuration.
396 citations