Microstructural characterizations of magnetron sputtered Ti films on glass substrate
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Cites background from "Microstructural characterizations o..."
...Moreover, hcp structure of Ti using d.c. sputtering has been shown in various reports (Song et al 2007; Chawla et al 2009)....
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"Microstructural characterizations o..." refers methods in this paper
...The lattice parameters ‘a’ and ‘c’ of Ti films were alculated using the equation (Cullity and Stock, 2001): 1 d2 = 4 3 (h2 + hk + k2) a2 + l 2 c2 (3) here d is the interplanar distance obtained from the position f the (1 0 0) peak using the Bragg condition, a and c are the latice parameters (being…...
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"Microstructural characterizations o..." refers result in this paper
...The morphology of Ti thin films deposited under varying sputtering power, substrate temperature and sputtering pressure are in accordance with the structural zone models discussed in the literature (Thornton, 1977)....
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