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Morphological and microstructural characterization of nanostructured pure α-phase W coatings on a wide thickness range

N. Gordillo, +10 more
- 15 Oct 2014 - 
- Vol. 316, pp 1-8
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TLDR
In this paper, the influence of the sputtering power on the adhesion of the coatings to the substrate was investigated by depositing coatings at powers varying from 30 up to 220 W.
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This article is published in Applied Surface Science.The article was published on 2014-10-15 and is currently open access. It has received 33 citations till now. The article focuses on the topics: Coating & Sputter deposition.

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Influence of grain boundaries on the radiation-induced defects and hydrogen in nanostructured and coarse-grained tungsten

G. Valles, +9 more
- 01 Jan 2017 - 
TL;DR: In this paper, the influence of grain boundaries (GBs) on the radiation-induced defect evolution and on H retention at 300 K, both experimentally and by computer simulations, was studied.
Journal ArticleDOI

Hydrogen diffusion and trapping in nanocrystalline tungsten

Pablo M. Piaggi, +8 more
- 01 Mar 2015 - 
TL;DR: In this article, the hydrogen behavior in nanocrystalline W (ncW) samples with grain size of 5 and 10nm was studied using Molecular Dynamics (MD) with a bond order potential (BOP) for the W-H system.
Journal ArticleDOI

The influence of high grain boundary density on helium retention in tungsten

G. Valles, +5 more
- 01 Feb 2015 - 
TL;DR: In this paper, the influence of a high grain boundary density on the amount, size and distribution of defects produced by pulsed helium (625 keV) irradiation in tungsten has been studied.
Journal ArticleDOI

Metal-semiconductor oxide (WO3@W) induces an efficient electro–photo synergistic catalysis for MOR and ORR

Zhongshui Li, +5 more
- 15 Jun 2021 - 
TL;DR: In this article, the oxide-derived metal nanostructures (M-MOx) were used to construct WO3@W in situ to ensure the close contact at the interface between W and WO 3, resulting in the unique two contact modes (Ohmic contact between X and Y and Schottky contact between Pt and X) in Pt-WO3-@W/graphene (simplified as PtwO3/W/GNs).
Journal ArticleDOI

Hydrogen accumulation in nanostructured as compared to the coarse-grained tungsten

Raquel González-Arrabal, +7 more
- 01 Oct 2014 - 
TL;DR: In this paper, the influence of sample microstructure and of irradiation conditions on the H behavior in Tungsten (W) was investigated, where commercial coarse grained (CGW) and nanostructured W (NW) samples were implanted with (i) H at room temperature (RT), (ii) C and H at RT, and (iii) simultaneously (co-implanted) with H and C at RT.
References
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Journal ArticleDOI

Stress, strain, and microstructure in thin tungsten films deposited by dc magnetron sputtering

Teunis J. Vink, +5 more
- 15 Jul 1993 - 
TL;DR: In this paper, the authors investigated the microstructure of tungsten thin films by cross-sectional transmission electron microscopy and showed that high-pressure conditions resulted in dendritic-like film growth, which brought about complete relaxation of internal stresses.
Journal ArticleDOI

Phase transformation of sputter deposited tungsten thin films with A-15 structure

Matthew J. O'Keefe, +1 more
- 15 Jun 1996 - 
TL;DR: In this article, the phase transformation of sputter deposited A−15 crystal structure tungsten thin films by rapid thermal annealing and in situ heat treatments in a transmission electron microscope was investigated.
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Stress reduction in tungsten films using nanostructured compliant layers

Tansel Karabacak, +4 more
- 05 Nov 2004 - 
TL;DR: In this article, a nanostructured compliant layer was used to reduce the residual stress in sputter-deposition tungsten films by using the oblique angle deposition technique.
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Pulsed laser deposition of tungsten and tungsten oxide thin films with tailored structure at the nano- and mesoscale

A. Bailini, +7 more
- 31 Jul 2007 - 
TL;DR: In this paper, the non-dimensional ratio of the target-to-substrate distance to the time integrated visible plume length, which depends on the gas mass and pressure and on the substrate position, permits to select morphologies ranging from a compact structure with a density similar to bulk, to a film with an open, low density foam-like mesostructure and a high fraction of voids.
Journal ArticleDOI

The origin of internal stress in low−voltage sputtered tungsten films

R. C. Sun, +2 more
- 01 Jan 1975 - 
TL;DR: In this paper, an extension of an earlier study on the dependence of the stress in lowvoltage triode sputtered tungsten films upon deposition conditions and substrate materials is presented.
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Q1. What are the contributions in "Morphological and microstructural characterization of nanostructured pure α-phase w coatings on a wide thickness range" ?

In a previous work this paper, the authors have presented an overview of the relationship between the safety and Durability of Structures and Materials ( CISDEM ), UPM-CSIC, IMM-CNM, and Isaac Newton 8 PTM.