Oxide Semiconductor Thin‐Film Transistors: A Review of Recent Advances
TL;DR: The recent progress in n- and p-type oxide based thin-film transistors (TFT) is reviewed, with special emphasis on solution-processed andp-type, and the major milestones already achieved with this emerging and very promising technology are summarizeed.
Abstract: Transparent electronics is today one of the most advanced topics for a wide range of device applications. The key components are wide bandgap semiconductors, where oxides of different origins play an important role, not only as passive component but also as active component, similar to what is observed in conventional semiconductors like silicon. Transparent electronics has gained special attention during the last few years and is today established as one of the most promising technologies for leading the next generation of flat panel display due to its excellent electronic performance. In this paper the recent progress in n- and p-type oxide based thin-film transistors (TFT) is reviewed, with special emphasis on solution-processed and p-type, and the major milestones already achieved with this emerging and very promising technology are summarizeed. After a short introduction where the main advantages of these semiconductors are presented, as well as the industry expectations, the beautiful history of TFTs is revisited, including the main landmarks in the last 80 years, finishing by referring to some papers that have played an important role in shaping transparent electronics. Then, an overview is presented of state of the art n-type TFTs processed by physical vapour deposition methods, and finally one of the most exciting, promising, and low cost but powerful technologies is discussed: solution-processed oxide TFTs. Moreover, a more detailed focus analysis will be given concerning p-type oxide TFTs, mainly centred on two of the most promising semiconductor candidates: copper oxide and tin oxide. The most recent data related to the production of complementary metal oxide semiconductor (CMOS) devices based on n- and p-type oxide TFT is also be presented. The last topic of this review is devoted to some emerging applications, finalizing with the main conclusions. Related work that originated at CENIMAT|I3N during the last six years is included in more detail, which has led to the fabrication of high performance n- and p-type oxide transistors as well as the fabrication of CMOS devices with and on paper.
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TL;DR: The role of defects and impurities on the transport and optical properties of bulk, epitaxial, and nanostructures material, the difficulty in p-type doping, and the development of processing techniques like etching, contact formation, dielectrics for gate formation, and passivation are discussed in this article.
Abstract: Gallium oxide (Ga2O3) is emerging as a viable candidate for certain classes of power electronics, solar blind UV photodetectors, solar cells, and sensors with capabilities beyond existing technologies due to its large bandgap. It is usually reported that there are five different polymorphs of Ga2O3, namely, the monoclinic (β-Ga2O3), rhombohedral (α), defective spinel (γ), cubic (δ), or orthorhombic (e) structures. Of these, the β-polymorph is the stable form under normal conditions and has been the most widely studied and utilized. Since melt growth techniques can be used to grow bulk crystals of β-GaO3, the cost of producing larger area, uniform substrates is potentially lower compared to the vapor growth techniques used to manufacture bulk crystals of GaN and SiC. The performance of technologically important high voltage rectifiers and enhancement-mode Metal-Oxide Field Effect Transistors benefit from the larger critical electric field of β-Ga2O3 relative to either SiC or GaN. However, the absence of clear demonstrations of p-type doping in Ga2O3, which may be a fundamental issue resulting from the band structure, makes it very difficult to simultaneously achieve low turn-on voltages and ultra-high breakdown. The purpose of this review is to summarize recent advances in the growth, processing, and device performance of the most widely studied polymorph, β-Ga2O3. The role of defects and impurities on the transport and optical properties of bulk, epitaxial, and nanostructures material, the difficulty in p-type doping, and the development of processing techniques like etching, contact formation, dielectrics for gate formation, and passivation are discussed. Areas where continued development is needed to fully exploit the properties of Ga2O3 are identified.
1,535 citations
TL;DR: This Review surveys the uniqueness and universality of MOs versus other unconventional electronic materials in terms of materials chemistry and physics, electronic characteristics, thin-film fabrication strategies and selected applications in thin- film transistors, solar cells, diodes and memories.
Abstract: Optical transparency, tunable conducting properties and easy processability make metal oxides key materials for advanced optoelectronic devices. This Review discusses recent advances in the synthesis of these materials and their use in applications. Metal oxides (MOs) are the most abundant materials in the Earth's crust and are ingredients in traditional ceramics. MO semiconductors are strikingly different from conventional inorganic semiconductors such as silicon and III–V compounds with respect to materials design concepts, electronic structure, charge transport mechanisms, defect states, thin-film processing and optoelectronic properties, thereby enabling both conventional and completely new functions. Recently, remarkable advances in MO semiconductors for electronics have been achieved, including the discovery and characterization of new transparent conducting oxides, realization of p-type along with traditional n-type MO semiconductors for transistors, p–n junctions and complementary circuits, formulations for printing MO electronics and, most importantly, commercialization of amorphous oxide semiconductors for flat panel displays. This Review surveys the uniqueness and universality of MOs versus other unconventional electronic materials in terms of materials chemistry and physics, electronic characteristics, thin-film fabrication strategies and selected applications in thin-film transistors, solar cells, diodes and memories.
1,098 citations
TL;DR: This Review focuses on the analysis of new approaches and results in the field of solution combustion synthesis (SCS) obtained during recent years, emphasizing the chemical mechanisms that are responsible for rapid self-sustained combustion reactions.
Abstract: Solution combustion is an exciting phenomenon, which involves propagation of self-sustained exothermic reactions along an aqueous or sol–gel media. This process allows for the synthesis of a variety of nanoscale materials, including oxides, metals, alloys, and sulfides. This Review focuses on the analysis of new approaches and results in the field of solution combustion synthesis (SCS) obtained during recent years. Thermodynamics and kinetics of reactive solutions used in different chemical routes are considered, and the role of process parameters is discussed, emphasizing the chemical mechanisms that are responsible for rapid self-sustained combustion reactions. The basic principles for controlling the composition, structure, and nanostructure of SCS products, and routes to regulate the size and morphology of the nanoscale materials are also reviewed. Recently developed systems that lead to the formation of novel materials and unique structures (e.g., thin films and two-dimensional crystals) with unusual...
841 citations
TL;DR: In this review, recent progress in materials and devices for future wearable sensor technologies for bio and medical applications are reported.
Abstract: Printable electronics present a new era of wearable electronic technologies. Detailed technologies consisting of novel ink semiconductor materials, flexible substrates, and unique processing methods can be integrated to create flexible sensors. To detect various stimuli of the human body, as well as specific environments, unique electronic devices formed by "ink-based semiconductors" onto flexible and/or stretchable substrates have become a major research trend in recent years. Materials such as inorganic, organic, and hybrid semiconductors with various structures (i.e., 1D, 2D and 3D) with printing capabilities have been considered for bio and medical applications. In this review, we report recent progress in materials and devices for future wearable sensor technologies.
589 citations
TL;DR: In this article, the recent progress in n-and p-type oxide based thin-film transistors (TFT) is reviewed, with special emphasis on solution-processed and p type, and the major milestones already achieved with this emerging and very promising technology are summarized.
Abstract: Transparent electronics is today one of the most advanced topics for a wide range of device applications. The key components are wide bandgap semiconductors, where oxides of different origins play an important role, not only as passive component but also as active component, similar to what is observed in conventional semiconductors like silicon. Transparent electronics has gained special attention during the last few years and is today established as one of the most promising technologies for leading the next generation of flat panel display due to its excellent electronic performance. In this paper the recent progress in n- and p-type oxide based thin-film transistors (TFT) is reviewed, with special emphasis on solution-processed and p-type, and the major milestones already achieved with this emerging and very promising technology are summarizeed. After a short introduction where the main advantages of these semiconductors are presented, as well as the industry expectations, the beautiful history of TFTs is revisited, including the main landmarks in the last 80 years, finishing by referring to some papers that have played an important role in shaping transparent electronics. Then, an overview is presented of state of the art n-type TFTs processed by physical vapour deposition methods, and finally one of the most exciting, promising, and low cost but powerful technologies is discussed: solution-processed oxide TFTs. Moreover, a more detailed focus analysis will be given concerning p-type oxide TFTs, mainly centred on two of the most promising semiconductor candidates: copper oxide and tin oxide. The most recent data related to the production of complementary metal oxide semiconductor (CMOS) devices based on n- and p-type oxide TFT is also be presented. The last topic of this review is devoted to some emerging applications, finalizing with the main conclusions. Related work that originated at CENIMAT|I3N during the last six years is included in more detail, which has led to the fabrication of high performance n- and p-type oxide transistors as well as the fabrication of CMOS devices with and on paper.
529 citations
References
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TL;DR: In this article, the photoluminescence spectra of amorphous InGaZnO (a-IGZO) was observed for the first time at liquid nitrogen temperature, even weak near-band-edge emission was clearly observed at a wavelength of ∼400 nm (3.1 eV) accompanied by a much stronger broad deep emission peaking at around 700 nm (1.77 eV).
Abstract: The authors observed the photoluminescence (PL) spectra of amorphous InGaZnO (a-IGZO) for the first time. At liquid nitrogen temperature, even weak near-band-edge emission was clearly observed at a wavelength of ∼400 nm (3.1 eV) accompanied by a much stronger broad deep emission peaking at around 700 nm (1.77 eV) for 1-μm-thick samples deposited by sputtering on sapphire substrates at room temperature. The PL intensity of each emission strongly depends on the electron concentration of a-IGZO ranging from 1016 to 1018 cm−3. As the carrier concentration increased, the PL intensity of the broad deep emission decreased. The near-band-edge emission energy of 3.0 eV (413 nm) was in good agreement with the estimated absorption energy of 3.03–3.08 eV (403–409 nm) at 77 K. The depth profile of the carrier concentration of the a-IGZO layer was estimated using step-etching Hall measurements and was found to be uniform. The width of the depletion layer was determined by the film-thickness dependence of the sheet carr...
29 citations
TL;DR: In this paper, the stability of polycrystalline silicon thin film transistors formed at low temperatures has been studied and charge trapping in the deposited gate oxide is observed over a wide range of conditions.
Abstract: The stability of polycrystalline silicon thin film transistors formed at low temperatures has been studied. Charge trapping in the deposited gate oxide is observed over a wide range of conditions. At high gate biases this is due to the passage of a tunnel current, and at lower biases to direct tunnelling into the traps. Trap concentrations, cross sections and energy levels have been deduced based upon a simple trapping model, and an empirical device lifetime model is presented.
29 citations
TL;DR: In this paper, the optical nonlinearity of single-phase CuO and Cu2O thin films has been characterized by X-ray diffraction and UV-VIS spectroscopy.
Abstract: By controlling the oxygen pressure, single-phase CuO and Cu2O thin films have been obtained on quartz substrates using a pulsed laser deposition technique. The structure properties and linear optical absorption of the films were characterized by X-ray diffraction and UV–VIS spectroscopy. By performing z-scan measurements using a femtosecond laser (800 nm, 50 fs), the real and imaginary parts of the third-order nonlinear susceptibility, Re χ
(3) and Im χ
(3), of the films were determined. Both CuO and Cu2O films exhibited large optical nonlinearities, which is comparable to those in some representative semiconductor films such as ZnO and GaN films using femtosecond laser excitation. Compared with Cu2O films, the CuO films showed larger third-order nonlinear optical effects under off-resonance excitation. Furthermore, the mechanisms of the optical nonlinearities in CuO and Cu2O films are explained in the main text. It was suggested that the reasons of the difference in their nonlinear refractive effects may be related to the different electronic structure in CuO and Cu2O materials.
28 citations
TL;DR: In this article, a ten-stage half-bit shift register utilizing amorphous In-Ga-Zn-O (a-IGZO) thin-film transistors (TFT) technology was designed, fabricated and successfully characterized.
Abstract: We have designed, fabricated, and successfully characterized a ten-stage half-bit shift register utilizing amorphous In-Ga-Zn-O (a-IGZO) thin-film-transistor (TFT) technology. High-performance bottom-gate staggered TFT structures with aluminum source, drain, and gate electrodes and RF-sputtered a-IGZO active material has been developed with a field-effect mobility of 16 cm2/V ·s. The half-bit shift register, which consists of only seven transistors per stage, has been successfully driven at a maximum clock frequency of 40 kHz (sufficient to drive a full VGA display at a frame rate of more than 80 kHz) and minimum rail-to-rail supply voltage of 20 V. This effort further demonstrates the potential of oxide-TFT technology to be employed for systems with higher integration level.
28 citations
TL;DR: In this paper, a low temperature (i.e., 250°C) solution processed AIO TFT exhibits a channel mobility of 2.37 cm2/Vs, a sub-threshold slope of 0.6 V/decade, and an on-to-off current ratio greater than 106.
Abstract: Thin-film transistors (TFTs) with indium based metal oxide, aluminum indium oxide, channel layers were fabricated via a simple and low-cost solution process. The process temperature was reduced to 250°C, an applicable temperature to plastic substrates, by applying post-annealing. Post-annealing under various atmospheric conditions effectively converts the remaining In(OH) species to a metal oxide at low temperature. It was revealed that humid O2 post-annealing mostly facilitated the conversion of In(OH) species to a metal oxide. The optimized low temperature (i.e., 250°C) solution processed AIO TFT exhibits a channel mobility of 2.37 cm2/Vs, a sub-threshold slope of 0.6 V/decade, and an on-to-off current ratio greater than 106.
28 citations