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Journal ArticleDOI

Photon Emission from Avalanche Breakdown in Silicon

A. G. Chynoweth, +1 more
- 15 Apr 1956 - 
- Vol. 102, Iss: 2, pp 369-376
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TLDR
In this article, it was shown that the number of light spots increases with the current rather than individual spots growing brighter, and that all the breakdown current is carried through the junction by these localized light-emitting spots.
Abstract
Visible light is emitted from reverse-biased silicon $p\ensuremath{-}n$ junctions at highly localized regions where avalanche breakdown is taking place. The emission occurs in both grown and diffused junctions. By using junctions diffused to a depth of only 2 microns below the crystal surface, it was established that the light sources are randomly spaced over the whole area of the junction as well as around the periphery where the junction intercepts the surface. The light sources are too small to be resolved under a high-power microscope. Their sites are reproducible with current cycling and their intensity and color are relatively insensitive to the field distribution, to the junction width, and to temperature. The number of light spots increases with the current rather than individual spots growing brighter. It is concluded that all the breakdown current is carried through the junction by these localized light-emitting spots.The spectral distribution of the light is continuous with a long tail extending to photon energies greater than 3.3 ev. It is concluded that recombination between free electrons and free holes within the junction region is responsible for the light at the shorter wavelengths, the carrier energies in excess of the energy gap being supplied by the field. At longer wavelengths there appears to be a considerable contribution to the emission from intraband transitions.A tentative figure for the emission efficiency over the visible spectrum is one photon for every ${10}^{8}$ electrons crossing the junction. The recombination cross section required is reasonable, being about ${10}^{\ensuremath{-}22}$ ${\mathrm{cm}}^{2}$.

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Hot-electron-induced MOSFET degradation—Model, monitor, and improvement

TL;DR: In this paper, a physical model involving the breaking of the ≡ Si s H bonds was proposed to explain the observed time dependence of MOSFET degradation and the observed channel field.
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Problems related to p-n junctions in silicon

TL;DR: In this article, a simplified model of secondary ionization, avalanche breakdown and microplasma phenomena in p-n junctions was proposed, in which holes and electrons have identical properties described by four constants: generation of highest energy or Raman phonons, energy E R and mean-free-path L R ; ionization or electron-hole pair production, threshold carrier energy E i and mean free path L i.
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TL;DR: In this article, the authors demonstrate the successful integration of silicon-based visible light-emitting devices into a standard bipolar microelectronic circuit by exploiting the thermal and chemical stability of porous silicon.
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Hot-Electron-Induced MOSFET Degradation - Model, Monitor, and Improvement

TL;DR: In this article, it was shown that MOSFET degradation is due to interface states generation by electrons having 3.7 eV and higher energies, and this critical energy and the observed time dependence was explained with a physical model involving the breaking of the = Si/sub s/H bonds.
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Electroluminescence studies in silicon dioxide films containing tiny silicon islands

TL;DR: In this paper, the authors studied the effect of the amount of excess silicon (Si) in the form of tiny Si precipitates in metal-insulator-semiconductor structures.
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