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Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering

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TLDR
In this article, the silicon doped hydrogenated amorphous carbon (a-C:H:Si) films were prepared on silicon substrates by middle-frequency magnetron sputtering silicon target in an argon and methane gas mixture atmosphere.
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This article is published in Applied Surface Science.The article was published on 2016-08-30. It has received 20 citations till now. The article focuses on the topics: Sputter deposition & Silicon.

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Citations
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Mechanical properties, chemical analysis and evaluation of antimicrobial response of Si-DLC coatings fabricated on AISI 316 LVM substrate by a multi-target DC-RF magnetron sputtering method for potential biomedical applications

TL;DR: In this article, the authors synthesize silicon doped diamond-like carbon (Si-DLC) coatings on two substrates: silicon and AISI 316LVM stainless steel using a multi-target DC-RF magnetron sputtering method.
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Investigation of γ-(2,3-Epoxypropoxy)propyltrimethoxy Silane Surface Modified Layered Double Hydroxides Improving UV Ageing Resistance of Asphalt.

TL;DR: KH560-LDHs obviously restrained performance deterioration of the asphalt, and helped to relieve the variation of the chemical compositions and morphology of asphalt, which suggested that the improvement of KH560- LDHs on UV ageing resistance of asphalt was superior to LDhs.
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Enhanced dielectric loss induced by the doping of SiC in thick defective graphitic shells of Ni@C nanocapsules with ash-free coal as carbon source for broadband microwave absorption

TL;DR: In this article, Ni@C nanocapsules with ash-free carbon as a carbon source, functionalized by the doping of SiC in a thick defective graphitic shell, demonstrate enhanced dielectric losses at the gigahertz level, and energy transfer from permeability to permittivity at 14.24 GHz.
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Effects of silicon doping on low-friction and high-hardness diamond-like carbon coating via filtered cathodic vacuum arc deposition.

TL;DR: In this paper, silicon was doped on a tetrahedral amorphous carbon (ta-C) coating and the tribological characteristics of the resulting Si-doped diamond-like carbon (DLC; a-C:Si:H) were investigated against a SUJ2 ball.
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Structure evolution and stress transition in diamond-like carbon films by glancing angle deposition

TL;DR: In this paper, the diamond-like carbon films have been prepared by the strategy of the glancing angle deposition using unbalanced magnetron sputtering technique, which is found that the structure and the residual stress of the films are strongly dependent on the deposition angle.
References
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Journal ArticleDOI

Diamond-like amorphous carbon

TL;DR: In this paper, the authors describe the deposition methods, deposition mechanisms, characterisation methods, electronic structure, gap states, defects, doping, luminescence, field emission, mechanical properties and some applications of diamond-like carbon.
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Tribology of diamond-like carbon films: recent progress and future prospects

TL;DR: Diamond-like carbon (DLC) films have attracted an overwhelming interest from both industry and the research community as mentioned in this paper, and they offer a wide range of exceptional physical, mechanical, biomedical and tribological properties that make them commercially essential for numerous industrial applications.
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Separation of the sp3 and sp2 components in the c1s photoemission spectra of amorphous carbon films

TL;DR: Two different types of amorphous carbon films were deposited on Si substrates, with film hardness of 22 GPa and 40 GPa, by pulsed laser evaporation of graphite targets, and the core level of the C1{ital s} core level shifted toward lower binding energy in the films for annealing temperatures above 900 K.
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Subplantation Model for Film Growth from Hyperthermal Species

TL;DR: La discussion porte sur le depot de couches de carbones type diamant mais on donne aussi des exemples pour d'autres systemes tels que Si, Ge and Ag.
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Tribological Properties and Characterization of Diamond-Like Carbon Coatings with Silicon Prepared by Plasma-Assisted Chemical Vapour Deposition

TL;DR: Amorphous C-Si coatings containing hydrogen (a-C-Si-H) were formed by a d.c. glow discharge method from reactant gases of CH4, SiCl4, H2, and argon as mentioned in this paper.
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