Journal ArticleDOI
Proximity effect in electron-beam lithography
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TLDR
In this article, a simple technique for the computation of the proximity effect in electron-beam lithography is presented, which gives results of the exposure intensity received at any given point in a pattern area using a reciprocity principle.Abstract:
A simple technique for the computation of the proximity effect in electron‐beam lithography is presented. The calculations give results of the exposure intensity received at any given point in a pattern area using a reciprocity principle. Good agreement between the computed results and experimental data was achieved.read more
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Technologies for nanofluidic systems: top-down vs. bottom-up - a review
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Directed self-assembly of block copolymers for use in bit patterned media fabrication
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Nanoscale Three-Dimensional Patterning of Molecular Resists by Scanning Probes
David Pires,James L. Hedrick,Anuja De Silva,Jane Frommer,Bernd Gotsmann,Heiko Wolf,Michel Despont,Urs T. Duerig,Armin W. Knoll +8 more
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Electron‐beam fabrication of 80‐Å metal structures
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