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Journal ArticleDOI

Review of MOS Models for Use in Computer-Aided Design (Circuit Simulation) of LSI Circuits

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TLDR
Equations of threshold voltage and device current have been presented in a generalized way from where the different proposed models have been derived as approximations to reality.
Abstract
A review study of various MOS models proposed in the literature for use in circuit simulation has been carried out. Equations of threshold voltage and device current have been presented in a generalized way from where the different proposed models have been derived as approximations to reality. For each approximation, the underlying physical assumptions have been discussed so that the user of the model may have a clear physical picture of the model he is using along with the implications of the modelling approximations used for accuracy and applicability to his situation before deciding to use the model. The models covered include various levels of models used in popular circuit simulation programs. Modelling of various intrinsic device capacitances has also been discussed along with the underlying physical meaning of the modelling equations used.

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References
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Journal ArticleDOI

Modeling and simulation of insulated-gate field-effect transistor switching circuits

TL;DR: A new equivalent circuit for the insulated-gate field-effect transistor (IGFET) is described, particularly useful for computer-aided analysis of monolithic integrated IGFET switching circuits.
Journal ArticleDOI

An accurate large-signal MOS transistor model for use in computer-aided design

TL;DR: In this article, some MOS transistor models for computer-aided design, each having a given accuracy and complexity, are presented, which apply before saturation and in the saturation region.
Journal ArticleDOI

A long-channel MOSFET model

TL;DR: The model described correctly the drain current and the small signal parameters in all regions of operation, including the subthreshold regime and the saturation regime, in this article, where mobility variations along the channel, resulting from the normal and lateral electric fields, can be taken into account.
Journal ArticleDOI

Subthreshold design considerations for insulated gate field-effect transistors

TL;DR: In this article, the effect of drain voltage on the sub-threshold region as the channel length becomes shorter and the impact of substrate bias on both the shift in and the slope of the subthreshold curves is discussed.
Journal ArticleDOI

Calculation of threshold voltage in nonuniformly doped MOSFET's

TL;DR: In this article, a semi-empirical modification of a closed form expression for the inversion charge is presented to calculate the extrapolated threshold voltage versus source-substrate bias in nonuniformly doped MOSFET's.
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