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Schottky barrier engineering in III-V nitrides via the piezoelectric effect

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TLDR
In this paper, a method for enhancing effective Schottky barrier heights in III-V nitride heterostructures based on the piezoelectric effect is proposed, demonstrated, and analyzed.
Abstract
A method for enhancing effective Schottky barrier heights in III–V nitride heterostructures based on the piezoelectric effect is proposed, demonstrated, and analyzed. Two-layer GaN/AlxGa1−xN barriers within heterostructure field-effect transistor epitaxial layer structures are shown to possess significantly larger effective barrier heights than those for AlxGa1−xN, and the influence of composition, doping, and layer thicknesses is assessed. A GaN/Al0.25Ga0.75N barrier structure optimized for heterojunction field-effect transistors is shown to yield a barrier height enhancement of 0.37 V over that for Al0.25Ga0.75N. Corresponding reductions in forward-bias current and reverse-bias leakage are observed in current–voltage measurements performed on Schottky diodes.

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Citations
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Journal ArticleDOI

Two dimensional electron gases induced by spontaneous and piezoelectric polarization in undoped and doped AlGaN/GaN heterostructures

TL;DR: In this paper, a combination of high resolution x-ray diffraction, atomic force microscopy, Hall effect, and capacitance-voltage profiling measurements is used to calculate the polarization induced sheet charge bound at the AlGaN/GaN interfaces.
Journal ArticleDOI

Undoped AlGaN/GaN HEMTs for microwave power amplification

TL;DR: In this paper, a two-dimensional electron gas (2DEG) is induced using the strong spontaneous and piezoelectric polarization inherent in the AlGaN/GaN structures, and three-dimensional nonlinear thermal simulations are made to determine the temperature rise from heat dissipation in various geometries.
Journal ArticleDOI

Built-in electric-field effects in wurtzite AlGaN/GaN quantum wells

TL;DR: In this article, the role of the sample structure geometry on the electric field is exemplified by changing the thickness of the AlGaN barriers in multiple-QW structures and electrostatic arguments well account for the overall trends of the electric-field variations.
Journal ArticleDOI

Spontaneous and piezoelectric polarization effects in III-V nitride heterostructures

TL;DR: In this paper, the role of spontaneous and piezoelectric polarization in III-V nitride heterostructures is investigated and a detailed analysis of their influence in the field effect transistors is presented.
Journal ArticleDOI

Gate leakage current mechanisms in AlGaN/GaN heterostructure field-effect transistors

TL;DR: In this paper, the gate leakage currents in AlGaN/GaN heterostructure field effect transistor (HFET) structures with conventional and polarization-enhanced barriers have been studied.
References
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Journal ArticleDOI

Very high breakdown voltage and large transconductance realized on gan heterojunction field effect transistors

TL;DR: In this article, the authors reported record high breakdown voltages up to 340 and 230 V realized on unintentionally doped (1.5 μm gate length) and Si doped(1 μm/GaN modulation doped field effect transistors (MODFETs), respectively.
Journal ArticleDOI

Measurement of piezoelectrically induced charge in GaN/AlGaN heterostructure field-effect transistors

TL;DR: In this article, electron concentration profiles have been obtained for AlxGa1−xN/GaN heterostructure field effect transistor structures and the measured electron distributions demonstrate the influence of piezoelectric effects in coherently strained layers on III-V nitride heterostructures device characteristics.
Journal ArticleDOI

Piezoelectric charge densities in AlGaN/GaN HFETs

TL;DR: In this paper, the piezoelectric charge density at (0001) AlGaN/GaN interfaces is estimated for both MBE and MOCVD structures on sapphire and SiC substrate.
Journal ArticleDOI

The influence of the strain‐induced electric field on the charge distribution in GaN‐AlN‐GaN structure

TL;DR: In this paper, it was shown that strongly pronounced piezoelectric properties play a key role in GaN−AlN−GaN semiconductor-insulator-semiconductor (SIS) and related structures.
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