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Journal ArticleDOI

Size effect in the electrical properties of thin epitaxial bismuth films

Hajime Asahi, +1 more
- 03 Mar 1980 - 
- Vol. 66, Iss: 2, pp 131-137
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TLDR
The thickness dependence of the electrical properties of thin epitaxial bismuth films (of thickness 2-3 μm) was studied at 42 and 77 K in this article.
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This article is published in Thin Solid Films.The article was published on 1980-03-03. It has received 18 citations till now. The article focuses on the topics: Grain boundary & Bismuth.

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Citations
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Journal ArticleDOI

Thermoelectric properties of Bi1−xSbx films with 0 < x ⩽ 0.3

F. Völklein, +1 more
- 30 Dec 1987 - 
TL;DR: In this article, the electrical conductivity, its temperature coefficient and the thermoelectric power of Bi 1− x Sb x films with 0 x ⩽ 0.3 and thickness from 20 to 400 nm were measured in the temperature range 80 −400 K.
Journal ArticleDOI

Temperature and thickness dependence of electrical and thermal transport coefficients of Bi1–xSbx films in an anisotropic, non-degenerate two-band model

TL;DR: In this article, the thickness and temperature dependences of electrical and thermal transport coefficients (e.g. electrical conductivity, thermoelectric power, thermal conductivity) of Bi1-xSbx films are described by a non-degenerated two-band model, considering the anisotropic elliptical band structure (many-valley model).
Journal ArticleDOI

Effect of annealing on the transport properties of an epitaxial film of bismuth

TL;DR: In this article, the authors studied the effect of annealing on the transport properties of an epitaxial bismuth film and found that the helium temperature resistivity decreased by a factor of 15.
Journal ArticleDOI

Quantum freeze‐out effect in a size‐limited intrinsic transport

TL;DR: In this article, the size-limited resistivity of intrinsic thin films is calculated theoretically in the sizequantum limit (SQL), where the film thickness d is comparable to the de Broglie wavelength λD of the electrons (λD≥d).
References
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Journal ArticleDOI

The mean free path of electrons in metals

TL;DR: The mean free path of electrons in metals has been studied in this paper, where the authors show that electrons follow a straight line along the path of the electron in the metal atom.
Journal ArticleDOI

Electrical-Resistivity Model for Polycrystalline Films: the Case of Arbitrary Reflection at External Surfaces

A. F. Mayadas, +1 more
- 15 Feb 1970 - 
TL;DR: In this paper, the total resistivity of a thin metal film is calculated from a model in which three types of electron scattering mechanisms are simultaneously operative: an isotropic background scattering (due to the combined effects of phonons and point defects), scattering due to a distribution of planar potentials (grain boundaries), and scattering by the external surfaces.
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Electrical Transport Properties of Thin Bismuth Films.

TL;DR: In this paper, the authors measured the resistivity, Hall coefficient, and magnetoresistance coefficient of twinned bismuth films between 1.15 and 300 K and found that the surface scattering in these films is not specular, contrary to the findings of some other workers.
Journal ArticleDOI

Quantum size effect in thin bismuth films

TL;DR: In this paper, the dependence of the resistivity ρ magnetoresistance Δρ/ρ and Hall coefficient RH of thin Bi films (thickness d: 700-2000 A) on thickness and temperature was studied.
Journal ArticleDOI

Electromagnetic properties of thin epitaxial Bi films in magnetic fields up to 85 kG

TL;DR: In this paper, the authors reported that the transverse magnetoresistance had a tendency of saturation with increasing magnetic fields, which was attributed to the scattering at the grain-boundary planes parallel to the electric field.
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