Abstract: Summary form only given. It has been known for some time that entangled photon pairs, such as generated by spontaneous parametric down conversion, have unusual imaging characteristics with sub-shot-noise interferometric phase measurement. In fact, Fonseca, et al., recently demonstrated resolution of a two-slit diffraction patterned at half the Rayleigh limit in a coincidence counting experiment. What we show is that this type of effect is possible not only in coincidence counting experiments, but also in real two-photon absorbing systems, such as those used in classical interferometric lithography. In particular, we will demonstrate that quantum entanglement is the resource that allows sub-diffraction limited lithography.
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