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Journal ArticleDOI

Sputtering of compound semiconductor surfaces. II: Compositional changes and radiation-induced topography and damage

01 Jan 1994-Critical Reviews in Solid State and Materials Sciences (Taylor & Francis Group)-Vol. 19, Iss: 3, pp 129-195
TL;DR: In this paper, the effects of ion sputtering on the surface layers of multicomponent targets are discussed, and it is shown that the changes are due to radiation-induced diffusion and segregation effects.
Abstract: Ion bombardment often leads to compositional changes in the surface layers of multicomponent targets. Such changes due to noble gas ion sputtering are discussed for InP and GaAs. The analyses show that the compositional change in InP (i.e., indium enrichment) is mainly due to preferential sputtering. In the case of GaAs. the changes are due to radiation-induced diffusion and segregation effects. Brief mention is made of compositional changes in a few other systems. The discussion on sputter-induced topography development deals mainly with InP because ion bombardment leads to dramatic topographical effects in this material. Ripple development on GaAs is also briefly discussed. Radiation damage has been well researched, and its mechanism and effects usually differ substantially when going from one semiconductor group to another. Bombardment-induced damage is briefly discussed for InP, GaAs, SiC, some II-VI semiconductors, and HgCdTe.
Citations
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Journal ArticleDOI
TL;DR: In this article, the authors summarize the trends observed when elemental and multicomponent materials are exposed to energetic ion beams, focusing on low-energy (low-energy) sputtering.

192 citations

Journal ArticleDOI
TL;DR: Unlike other encyclopedias it contains almost no historical or biographical discussions, but to allow for longer essays consists entirely of modern factual presentations of scientific subjects.
Abstract: This momentous 15-volume work with its entirely new, lucid, and unique format should prove of remarkable value to all physicians. With its 7,200 profusely illustrated articles by more than 2,100 contributors, including a number of Nobel Laureates and other eminent scientists, this encyclopedia should stand as one of the most useful and usable publications for the dissemination of scientific information in many years. The books have been edited to be "a work of, not about, science." Unlike other encyclopedias it contains almost no historical or biographical discussions, but to allow for longer essays consists entirely of modern factual presentations of scientific subjects. The articles are written to be understandable by scientists outside of their field of specialization. For example the numerous articles on physics are written for the nonphysicist, but still are more comprehensive and much more readable than expositions in general encyclopedias. One or more illustrations or diagrams appear

176 citations

Journal ArticleDOI
TL;DR: In this paper, an organic film-based image is produced, which is subsequently transferred by plasma etching techniques into underlying films/substrates to produce nanoscale materials templates.
Abstract: Photolithographic patterning of organic materials and plasma-based transfer of photoresist patterns into other materials have been remarkably successful in enabling the production of nanometer scale devices in various industries. These processes involve exposure of highly sensitive polymeric nanostructures to energetic particle fluxes that can greatly alter surface and near-surface properties of polymers. The extension of lithographic approaches to nanoscale technology also increasingly involves organic mask patterns produced using soft lithography, block copolymer self-assembly, and extreme ultraviolet lithographic techniques. In each case, an organic film-based image is produced, which is subsequently transferred by plasma etching techniques into underlying films/substrates to produce nanoscale materials templates. The demand for nanometer scale resolution of image transfer protocols requires understanding and control of plasma/organic mask interactions to a degree that has not been achieved. For manufa...

174 citations

Journal ArticleDOI
TL;DR: In this article, an analysis is made of the sputtering yields of materials for argon gas cluster ion beams used in SIMS and XPS as a function of the beam energy, E, and the cluster size, n.
Abstract: An analysis is made of the sputtering yields of materials for argon gas cluster ion beams used in SIMS and XPS as a function of the beam energy, E, and the cluster size, n. The analysis is based on the yield data for the elements Si and Au, the inorganic compound SiO2, and the organic materials Irganox 1010, the OLED HTM-1, poly(styrene), poly(carbonate), and poly(methyl methacrylate). The argon primary ions have cluster sizes, n, in the range 100–16 000 and beam energies, E, from 2.5 to 80 keV. It is found that the elemental and compound data expressed as the yields, Y, of atoms sputtered per primary ion may all be described by a simple universal equation: Y/n = (E/An)q/[1 + (E/An)q−1] where the parameters A and q are established by fitting. The sputtering yields of the three organic materials are given as yield volumes expressed in nm3. For these, an extra parameter B is included multiplying the right-hand side of the equation where B is found by fitting to be of the order (0.18 nm)3 to (0.26 nm)3. This...

122 citations

Journal ArticleDOI
TL;DR: In this paper, the diffusion of the important fission products (silver, caesium, iodine and strontium) in polycrystalline 3C-SiC is discussed.
Abstract: A major problem with most of the present nuclear reactors is their safety in terms of the release of radioactivity into the environment during accidents. In some of the future nuclear reactor designs, i.e. Generation IV reactors, the fuel is in the form of coated spherical particles, i.e. TRISO (acronym for triple coated isotropic) particles. The main function of these coating layers is to act as diffusion barriers for radioactive fission products, thereby keeping these fission products within the fuel particles, even under accident conditions. The most important coating layer is composed of polycrystalline 3C–SiC. This paper reviews the diffusion of the important fission products (silver, caesium, iodine and strontium) in SiC. Because radiation damage can induce and enhance diffusion, the paper also briefly reviews damage created by energetic neutrons and ions at elevated temperatures, i.e. the temperatures at which the modern reactors will operate, and the annealing of the damage. The interaction between SiC and some fission products (such as Pd and I) is also briefly discussed. As shown, one of the key advantages of SiC is its radiation hardness at elevated temperatures, i.e. SiC is not amorphized by neutrons or bombardment at substrate temperatures above 350 °C. Based on the diffusion coefficients of the fission products considered, the review shows that at the normal operating temperatures of these new reactors (i.e. less than 950 °C) the SiC coating layer is a good diffusion barrier for these fission products. However, at higher temperatures the design of the coated particles needs to be adapted, possibly by adding a thin layer of ZrC.

112 citations

References
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Book
01 Jan 1939

14,299 citations

Journal ArticleDOI
TL;DR: In this paper, a theory explaining the origin of ripple topography is presented, which shows that the ripple wave vector is parallel to the surface component of the beam direction, provided that longitudinal straggling of the beacon is not too large.
Abstract: When an amorphous solid is etched by an off‐normal incidence ion beam, a ripple topography often results. A theory explaining the origin of these waves is presented. For incidence angles close to the normal, we find that the ripple wave vector is parallel to the surface component of the beam direction, provided that longitudinal straggling of the beam is not too large. The ripple orientation is rotated by 90° when the beam is close to grazing incidence. The wavelength given by the theory varies as λ∼( f T)−1/2 exp(−ΔE/2kBT) for high temperatures T and low fluxes f, where ΔE is the activation energy for surface self‐diffusion. The predicted magnitude of the wavelength is in reasonable accord with experiments in this regime.

1,179 citations

BookDOI
01 Jan 1983

622 citations