Statistical modeling of device mismatch for analog MOS integrated circuits
Citations
282 citations
Cites background from "Statistical modeling of device mism..."
...as a function of device area and spacing [30], [32], [33]....
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...In order to characterize global parametric variations, a set of independent factors is usually identified that explain lot-tolot, wafer-to-wafer, and die-to-die variations in a process, often by principal components methods [30], [31]....
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217 citations
Cites background from "Statistical modeling of device mism..."
...Device mismatch due to process non-uniformity [22]–[24] is a fundamental limiting factor preventing the realization of a monolithically integrated large-scale optical phased array with a conventional architecture....
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192 citations
Cites background from "Statistical modeling of device mism..."
...However, a more restrictive bound exists due to MOS transistor mismatch [21], [ 24 ] and Early voltage (VA) degradation with channel length....
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182 citations
139 citations
References
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"Statistical modeling of device mism..." refers background in this paper
...Lakshmikumar et al. [ 2 ] advanced this work by separating the area dependence of transistor mismatch into two separate components: the standard deviations of the current factor and the threshold voltage....
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564 citations
"Statistical modeling of device mism..." refers methods in this paper
...The method employed in this study to account for parameter correlations during the calculation of model decks is called the principal component analysis (PCA) [ 20 ]-[22]....
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561 citations
"Statistical modeling of device mism..." refers methods in this paper
...The method employed in this study to account for parameter correlations during the calculation of model decks is called the principal component analysis (PCA) [20]-[ 22 ]....
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560 citations