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Substrate effect on electrodeposited copper morphology and crystal shapes

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TLDR
In this paper, the surface morphology varies with the change in overpotential, but not with change in substrate, and the crystal shape is independent of the applied over-potential but varies with bath chemistry or choice of substrate.
Abstract
Copper has been electrodeposited on copper (FCC) and mild steel (BCC) substrates from acidic sulphate bath with and without cetyl trimethyl ammonium bromide at 0.25, 2, 6 and 9 V. It is found that the surface morphology varies with the change in overpotential, but not with the change in substrate. On the contrary, the crystal shape is found to be independent of the applied overpotential, but varies with the bath chemistry or choice of substrate.

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Citations
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Estimation of Zwitterionic Surfactant Response in Electroless Composite Coating and Properties of Ni–P–CuO (Nano)Coating

TL;DR: In this article, Zwitterionic surfactant was introduced into the composite coating for the first time to increase the suspension of nanoparticles effectively during the coating process, which reduced the intermolecular attraction between the solid and liquid interfaces and eliminated the binding of the nanoparticles with the hydrogen gas bubbles.
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Coating Technologies for Copper Based Antimicrobial Active Surfaces: A Perspective Review

TL;DR: In this article, the authors compared the properties of copper-based antimicrobial coatings produced by various deposition methods including thermal spray technique, electrodeposition, electroless plating, chemical vapor deposition (CVD), physical vapor deposition, and sputtering techniques.
Journal ArticleDOI

Electrochemical approaches for selective recovery of critical elements in hydrometallurgical processes of complex feedstocks.

TL;DR: In this review, recent advances in electrochemically mediated technologies for metal recovery are discussed, with a focus on rare earth elements and other key critical materials for the modern circular economy.
Journal ArticleDOI

Synthesis and characterization of novel Cu, Cu-SiC functionally graded coating by pulse reverse electrodeposition

TL;DR: In this paper, a Cu based functionally graded coating (FGC) has been deposited on an annealed Cu substrate by galvanostatic pulse reverse electrodeposition (PRED) route.
References
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Journal ArticleDOI

How does your crystal grow? A commentary on Burton, Cabrera and Frank (1951) 'The growth of crystals and the equilibrium structure of their surfaces'.

TL;DR: The key ideas presented in the classic paper ‘The growth of crystals and the equilibrium structure of their surfaces’ by W. K. Burton, N. Cabrera and F. C. Frank are summarized and put in the context of both the state of knowledge at the time of publication and the considerable amount of work since that time that built on and developed these ideas.
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A review of developments in the electrodeposition of tin-copper alloys

TL;DR: The importance of tin-copper electrodeposits is summarised and the scope for plating them is highlighted in this article, where the authors focus on electrochemical voltammetry techniques together with morphological information from SEM imaging.
Journal ArticleDOI

Effect of pulse parameter on pulsed electrodeposition of copper on stainless steel

TL;DR: In this paper, the pulsed electrodeposition of copper on stainless steel has been studied in copper sulphate bath and the effect of duty cycle and frequency on the thickness and current efficiencies were compared at 50°C and at room temperature with average current density of 4 A dm−2.
Journal ArticleDOI

Microstructure in electrodeposited copper layers, the role of the substrate

TL;DR: The microstructures of Cu layers, ranging in thickness from 3 to 12 µm, were investigated in this article, where the layers were electrodeposited from an acidic copper electrolyte onto two distinct substrate materials.
Journal ArticleDOI

Structural Accelerating Effect of Chloride on Copper Electrodeposition

TL;DR: In this article, video-rate scanning-tunneling-microscopy imaging during Cu electrodeposition reveals a profound structural accelerating effect of Cl(-) on the deposition process.
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Trending Questions (1)
How does the co-deposition of hydrogen with copper affect the crystal structure of the electrodeposited material?

The provided paper does not mention anything about the co-deposition of hydrogen with copper and its effect on the crystal structure of the electrodeposited material.