Journal ArticleDOI
Temperature Dependency of Resistance of Thin Metal Films
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TLDR
In this article, the authors studied the temperature dependency of resistance of vacuum deposited gold and platinum films between room temperature and 400° and 600° C, respectively, and showed that the observed behavior can be attributed to a linear combination of the resistance of the individual grains or aggregates and the resistance due to gaps or potential barriers between the grains.Abstract:
The temperature dependency of resistance of vacuum deposited gold and platinum films between room temperature and 400° and 600° C, respectively, has been studied. Particular emphasis has been placed on the transition between thick, continuous films with positive temperature coefficients and thin, granular, or lacunary films with negative temperature coefficients. In addition to the low positive coefficients usually observed in this transition region, a minimum in the resistance vs temperature curve is observed. It is shown that the observed behavior can be attributed to a linear combination of the resistance of the individual grains or aggregates and the resistance due to gaps or potential barriers between the grains. The behavior in the transition region depends critically on the size of both the barriers and grains in the film.read more
Citations
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Electrical conduction in discontinuous metal films: A discussion
TL;DR: The most popular theory to date is that of tunnelling between islands with an electrostatic activation energy associated with single island charging as discussed by the authors, which has not yet been fully and satisfactorily explained.
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A new route toward ultrasensitive, flexible chemical sensors: metal nanotubes by wet-chemical synthesis along sacrificial nanowire templates.
Mi Ae Lim,Donghwan Kim,Chong-Ook Park,Young Wook Lee,Sang Woo Han,Zhiyong Li,R. Stan Williams,Inkyu Park +7 more
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Electrical Conduction between Metallic Microparticles
D. S. Herman,T. N. Rhodin +1 more
TL;DR: In this paper, it was shown that conduction can occur in the substrate surface by electron tunneling between the separated microparticles, and that the current carriers can be contributed to the insulator surface regions by the metallic particles.
Journal ArticleDOI
Effect of grain-boundary scattering on the electrical resistivity of indium films
Arun K. Pal,Subhadra Chaudhuri +1 more
TL;DR: In this paper, the grain-boundary scattering theory of Mayadas and Shatzkes reproduces the experimental observations more faithfully than the size-effect theory given by Fuchs.
Journal ArticleDOI
Electrical and Structural Properties of Mixed Chromium and Silicon Monoxide Films
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TL;DR: In this article, a mixture of chromium and silicon monoxide was prepared on glass substrates by vacuum deposition and the significance of various deposition parameters was determined, including temperature and applied electrical field.
References
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Journal ArticleDOI
The mean free path of electrons in metals
TL;DR: The mean free path of electrons in metals has been studied in this paper, where the authors show that electrons follow a straight line along the path of the electron in the metal atom.
Journal ArticleDOI
Electrical Conduction Mechanism in Ultrathin, Evaporated Metal Films
C. A. Neugebauer,M. B. Webb +1 more
TL;DR: In this paper, the authors investigated the electrical conduction mechanism in the film plane of ultrathin, evaporated metal films and showed that the conductivity depends exponentially on reciprocal temperature, and it should be independent of field at low fields.
Journal ArticleDOI
A possible explanation of the increase of the electrical resistance of thin metal films at low temperatures and small field strengths
TL;DR: In this article, an explanation for the increase in resistance of certain thin metal films at low temperatures and small electrical field strengths is tentatively suggested, which seems to describe in principle the observed increase of resistance.
Journal ArticleDOI
Temperature Coefficients of Resistance of Metallic Films in the Temperature Range 25° to 600°C
Richard B. Belser,W.H. Hicklin +1 more
TL;DR: The temperature coefficients of resistance (TCR) of films of sputtered Au, Ir, Mo, Ni, Pd, Pt, Rh, Ta, and W, of evaporated Al, Cr, Ti, and Zr, and of the alloy films Pt-Au, Pt-Ir, and Pt-Ni have been measured in vacuo over the temperature range 25° to 600°C; the film thickness range was 75 to 2000 A..
Journal ArticleDOI
Mean Free Paths of Electrons in Evaporated Metal Films
F. W. Reynolds,G. R. Stilwell +1 more
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