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Proceedings ArticleDOI

Ultra-Narrow Silicon Nanowire Gate-All-Around CMOS Devices: Impact of Diameter, Channel-Orientation and Low Temperature on Device Performance

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TLDR
Fully CMOS compatible silicon-nanowire (SiNW) gate-all-around (GAA) n- and p-MOS transistors are fabricated with nanowire channel in different crystal orientations and characterized at various temperatures down to 5K as mentioned in this paper.
Abstract
Fully CMOS compatible silicon-nanowire (SiNW) gate-all-around (GAA) n- and p-MOS transistors are fabricated with nanowire channel in different crystal orientations and characterized at various temperatures down to 5K. SiNW width is controlled in 1 nm steps and varied from 3 to 6 nm. Devices show high drive current (2.4 mA/mum for n-FET, 1.3 mA/mum for p-FET), excellent gate control, and reduced sensitivity to temperature. Strong evidences of carrier confinement are noticed in term of Id-Vg oscillations and shift in threshold voltage with SiNW diameter. Orientation impact has been investigated as well

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Citations
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Excimer laser-annealed dopant segregated schottky (ELA-DSS) si nanowire gate-all-around (GAA) pFET

TL;DR: In this paper, a pulsed excimer laser annealing (ELA) integrated with dopant segregation method for source/drain junction engineering of gate-all-around (GAA) silicon nanowire P-FETs is reported.
Journal ArticleDOI

The Short Channel and Quantum Confinement Effects on Transfer Characteristics of Si NWMOSFET Depending on the Gate Length and Temperature

TL;DR: In this paper , the authors have investigated the quantum ballistic transport properties of Si nanowire MOSFET (Si NWMOSFet) with 4 nm gate length.
Journal Article

Low Frequency Noise Behavior of Independent Gate Junctionless FinFET

TL;DR: In this paper, the authors used low frequency noise analysis to understand and map the current conduction path in a multi-gate junctionless FinFET, which behaves as a gated resistor and shows excellent short channel effect suppression due to its multi gate structure.

A Simple, Accurate Capacitance-Voltage Model of Undoped Silicon Nanowire MOSFETs

TL;DR: In this paper, the authors presented a simple, accurate charge and capacitance model for undoped cylindrical gate-allaround (GAA) silicon-nanowire (SiNW) MOSFETs.
Journal ArticleDOI

Advanced gate-all-around fin-like poly-si tfts with multiple nanowire channels

TL;DR: The gate-all-around (GAA) fin-like poly-Si TFTs with multiple nanowire channels (MNCs) have been fabricated using a simple process to demonstrate high performance electrical characteristics.
References
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Journal ArticleDOI

Semiconductor nanowires and nanotubes

TL;DR: In this article, a review highlights the recent advances in the field, using work from this laboratory for illustration, and the understanding of general nanocrystal growth mechanisms serves as the foundation for the rational synthetic control of one-dimensional nanoscale building blocks, novel properties characterization and device fabrication based on nanowire building blocks.
Journal ArticleDOI

High-performance fully depleted silicon nanowire (diameter /spl les/ 5 nm) gate-all-around CMOS devices

TL;DR: In this article, gate-all-around (GAA) n-and p-FETs on a silicon-on-insulator with 5-nm-diameter laterally formed Si nanowire channel were demonstrated.
Journal ArticleDOI

Scaling theory for cylindrical, fully-depleted, surrounding-gate MOSFET's

TL;DR: In this paper, a scaling theory for fully-depleted, cylindrical MOSFET's was presented. But the scaling theory was derived from the cylinrical form of Poisson's equation by assuming a parabolic potential in the radial direction.
Journal ArticleDOI

Multiple-gate SOI MOSFETs: device design guidelines

TL;DR: In this paper, the authors describe computer simulations of various SOI MOSFETs with double and triple-gate structures, as well as gate-all-around devices.
Journal ArticleDOI

Integrated nanoscale electronics and optoelectronics: Exploring nanoscale science and technology through semiconductor nanowires*

TL;DR: In this paper, a general approach for the synthesis of a broad range of semiconductor nanowires (NWs) with precisely controlled chemical composition, physical dimension, and electronic, optical properties using a metal cluster-catalyzed vapor-liquid-solid growth mechanism was introduced.
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