WSe2 Light-Emitting Tunneling Transistors with Enhanced Brightness at Room Temperature
Summary (2 min read)
Introduction
- Monolayers of molybdenum and tungsten dichalcogenides are direct bandgap semiconductors, which makes them promising for opto-electronic applications.
- The main component of their stacked-layer van der Waals heterostructure LEQWs is a light- emitting monolayer of WSe2 encapsulated between thin (2-5 monolayers) hexagonal boron nitride (hBN) barriers with top and bottom transparent graphene electrodes for vertical current injection (Fig. 1).
- As the temperature increases, the thermal activation increases the bright exciton population.
- As a result, MoSe2 LEQW’s always show the opposite behavior with a notable decrease of light emission with increasing T. Electrical and optical measurements:.
- Samples were mounted either in a liquid helium flow cryostat for temperature dependent measurements, or in an exchange-gas cryostat for measurements at T= 4.2 K.
ASSOCIATED CONTENT
- Description of the device fabrication, Temperature dependent electroluminescence data for additional WSe2 LED’s, low temperature photoluminescence of MoSe2 LED’s, details of their quantum efficiency estimations and further discussion, also known as Supporting Information.
- “This material is available free of charge via the Internet at http://pubs.acs.org.”.
Notes
- The authors declare no competing financial interest.
- Supplementary Materials for WSeに light-emitting tunnelling transistors with enhanced brightness at room temperature.
Fabrication
- Quantum well heterostructure devices are assembled by a multiple peel-lift Van der Waals assembly procedure which has been described in detail previously [1-3].
- Estimation of the hBN tunnel barrier thickness is conducted using a combination of optical and atomic force microscopy measurements.
- Devices were also fabricated onto distributed Bragg reflector (DBR) substrates which allow for the collection of 30% of the emitted light ;ミS ノW;Sゲ デラ マ┌Iエ HヴキェエデWヴ LEQWげゲ.
- This step was found to be necessary due to poor adhesion of flakes to the DBR mirrors preventing direct exfoliation onto the mirror surfaces.
- A, hBN crystal exfoliated onto an oxidized silicon wafer, dark field images are shown on the right; B, a graphene flake is peeled from an PMMA membrane onto the large hBN crystal; C, the graphene flake is then covered with the first hBN tunnel barrier which is again peeled from a PMMA membrane.
Additional devices and data
- Temperature dependence of additional WSe2 LEDげゲ Figure S4.
- Right: Atomic force microscopy reveals that the trapped contamination self-cleans into pockets leaving ~ ´マ ゲキ┣WS ;デラマキI;ノノ┞ aノ;デ ヴWェキラミゲく Inset: AFM step profile used to estimate the number of layers in one of the hBN tunnel barriers.
- Temperature dependence of the photoluminescence for MoSe2 and WSe2 Figure S9 shows the temperature dependence of the photoluminescence integrated intensity for the MoSe2 (red) and WSe2 (blue) devices shown in figure 3D of the main text.
- The total loss is defined as, 。 Э 。Lens。optic。system.
- Taking into account that 1 pW of power corresponds to NЭPっエ`ЭンヱΑΑヴΑヶ ヮエラデラミゲが the authors arrive at a conversion coefficient between the number of integrated counts and the number of photons incident on the slit of the spectrometer per second leading to the system efficiency of 。system=4203/3177476 =1.32 x 10-3.
Cross sectional imaging
- In summary a dual beam instrument (FEI Dual Beam Nova 600i) has been used for site specific preparation of cross sectional samples suitable for TEM analysis using the lift-out approach [Schaffer, M. et al.
- Total power emitted within a polar angle for an emitting dipole placed on Si-SiO2 and on a distributed Bragg reflector (DBR) as well as in free space.
- The strap protects the region of interest during milling as well as providing mechanical stability to the cross sectional slice after its removal.
- The fact that the cross sectional slice was precisely extracted from the chosen spot was confirmed for all devices by comparing the positions of identifiable features such as Au contacts and /or hydrocarbon bubbles, which are visible both in the SEM images of the original device and within TEM images of the prepared cross section.
- Scanning transmission electron microscope imaging and energy dispersive x-ray spectroscopy analysis High resolution scanning transmission electron microscope (STEM) imaging was performed using a probe side aberration-corrected FEI Titan G2 80-200 kV with an X-FEG electron source operated at 200kV.
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Frequently Asked Questions (15)
Q2. What was the final polish used to remove side damage?
A final gentle polish with Ga+ ions (at 5kV and50pA) was used to remove side damage and reduce the specimen thickness to 20-70nm.
Q3. What is the purpose of the pt strap?
The strap protects the region of interest during milling as well as providing mechanical stability to the cross sectional slice after its removal.
Q4. What is the quantum efficiency of the optical system?
The quantum efficiency is defined as the number of photons emitted per number of injectedcarriers, Ne/i (N = number of emitted photons per second, e electron charge, The authoris the current passingthrough their collection area).
Q5. What is the process of removing the graphene from the hBN?
the quantum well is completed by using a second hBN tunnel barrier to lift a WSe2 flake from a separate Si-SiO2 substrate, the second tunnel barrier together with the WSe2 layer are then peeled onto the hBN-Gr stack.
Q6. How many cts/sec is the system efficiency?
Taking into account that 1 pW of power corresponds to NЭPっエ`ЭンヱΑΑヴΑヶ ヮエラデラミゲが the authors arrive at a conversion coefficient between the number of integrated counts and the number of photons incident on the slit of the spectrometer per second leading to the system efficiency of 。system=4203/3177476 =1.32 x 10-3.
Q7. How does the tunneling conductivity change with increasing temperature?
2. Temperature dependence of the Tunneling conductivityAll their LEQW devices display only a weak dependence of the tunnel current on increasing temperature, at most the tunnel current increases by a factor of 2 times in some samples.
Q8. What is the Typical I-Vb dependence for a LEQW device?
Typical I-Vb dependence for a LEQW device , showing only weak dependence on temperature B, ratio of the tunnel conductivity at a given temperature to that of T = 6 K showing onlya small increase from T = 6 K to T = 300 K taken at Vb = 2.8 V.3.
Q9. How does the EL intensity of the high energy peak increase?
As the temperature increases from 20 to 80 K, the EL intensity of the high energy peak X 0 increases by a factor of 2 and the X - peak grows by 1.5 times (see Fig. S8).
Q10. What was the end of the Pt strap?
Before removing the final edge supporting the milled slice and milling beneath it to free from the substrate, one end of the Pt strap slice was welded to a nano-manipulator needle ┌ゲキミェ a┌ヴデ
Q11. What is the simplest way to measure the brightness of a light emitting tunnelling transistor?
Devices were also fabricated onto distributed Bragg reflector (DBR) substrates which allow for the collection of 30% of the emitted light ;ミS ノW;Sゲ デラ マ┌Iエ HヴキェエデWヴ LEQWげゲ.
Q12. What is the process of etching graphene onto a PMMA membrane?
hBN crystal exfoliated onto an oxidized silicon wafer, dark field images are shown on the right; B, a graphene flake is peeled from an PMMA membrane onto the large hBN crystal; C, the graphene flake is then covered with the first hBN tunnel barrier which is again peeled from a PMMA membrane.
Q13. What is the EL intensity of the WSe2 device?
The observed redistribution of the EL intensity clearly shows thermal-activation type behavior where the occupation of the low energy states decreases, while the population of the high energy states grows with temperature.
Q14. What is the EL intensity of the WSe2 monolayer?
that, eventually, at room T, the neutral exciton line dominates in PL and EL in the majority of LEQWs studied in this work (see also PL results on WSe2 monolayer films in Refs.[6, 7]).
Q15. What is the main topic of the paper?
Supporting Information: Description of the device fabrication, Temperature dependent electroluminescence data for additional WSe2 LED’s, low temperature photoluminescence of MoSe2 LED’s, details of their quantum efficiency estimations and further discussion.