Are all disposable masks made with graphene?
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36 Citations | Taken together, the current findings on common scenarios (exfoliation, CVD growth, and transfer), while not inclusive of all graphene manufacturing processes, indicate very minimal graphene or particle exposure at facilities manufacturing graphenes with good manufacturing practices. |
180 Citations | Our findings demonstrate a step forward to all-graphene transparent and flexible electronics. |
30 Citations | We demonstrate that these etch masks have numerous advantages: they can be synthesized simply by heating a copper foil in air, deposited on graphene from a solution, they are inert to oxygen plasma, and can be removed from the substrate by dissolution in mild acids. |
68 Citations | While oxidized graphene-containing surfaces are antimicrobial when either basal planes or sharp edges are exposed, graphene-containing surfaces are mainly effective when sharp edges are protruding, except for few studies showing effect due to graphene basal planes when coated over conductive materials. |
33 Citations | The results showed that scaffolds coated with graphene are biocompatible and they can support cellular activity. |
26 Citations | This work shows that not all graphene materials are beneficial for the detection at lab-on-chip devices. |
Importantly, the as-made graphene can be readily dispersed into aqueous solution in the presence of surfactant and thus is compatible with various solution-processing techniques towards graphene-based thin film devices. | |
Electron-beam induced deposition on graphene might be used to create nanometer-scale doping patterns, diffraction gratings, or etch masks in this novel electronic material. | |
We show that sputter-coating graphene and graphene-like materials with zinc and dissolving the latter with dilute acid removes one graphene layer and leaves the lower layers intact. | |
Compared with conventional lithographic fabrication techniques, this new approach uses graphene edges as the templates or masks and offers advantage in technological simplicity and capability of creating small features below 10 nm scale. |
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