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This technology provides a promising approach for future CMOS scaling with large scale new 2-D material transistors.
The measurements also demonstrate the possibility of realizing ambipolar transistors using InSb nanowires.
The results show the possibility of fabricating transistors with a very thin, highly doped base.
The results demonstrate a new scheme of building nanometer-scale transistors.
RTS measurements performed on small-area MOS transistors partly support the validity of this model.
Thus, this device is promising for highly scaled transistors.
The proposed device structure is especially beneficial for nanowire-based transistors.

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