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Journal ArticleDOI
John M. Shannon, Ed Gerstner 
86 Citations
The authors introduce a source-gated transistor that overcomes some of the fundamental limitations of the field-effect transistor.
Proceedings ArticleDOI
J. Wu, Jihong Chen, Kaiping Liu 
07 Nov 2002
17 Citations
We found that when the transistor width becomes comparable to the LER spatial period, the resulting transistor Ion/Ioff degradation presents a very different signature from that of wide transistor cases.
As a consequence, a remarkable thin film transistor performance is obtained.
The transistor in a high vacuum outperforms that in air.
In this letter, we report a novel transient/ biodegradable transistor.
In this paper, we propose a structure that improves the OFF state and switching behavior of the transistor without increase in the transistor length.
Open accessBook ChapterDOI
Sergei Skorobogatov, Ross Anderson 
13 Aug 2002
828 Citations
Circuits can be designed so that single-transistor failures do not lead to security failure.
This paper advances the hypothesis that the failure mechanism is strictly related to how this transistor is being activated during reverse recovery.
In addition, it is shown that the floating gate transistor can be modeled as a weakly conductive stuck-on transistor or as a stuck-open transistor depending on the values of the parameters characterizing the defect.
Proceedings ArticleDOI
Victor Champac, A. Rubio, Joan Figueras 
27 Oct 1993
15 Citations
It is shown that a floating gate transistor is not a stuck-open transistor and that significative values of quiescent current consumption may exist.

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What is advantage of immunosensor?
5 answers
Immunosensors offer several advantages over conventional methods for pathogen and toxin detection. They do not require highly trained personnel for operation, are quick, highly selective, and sensitive, and have the potential to significantly enhance diagnostic processes. In the case of Rituximab (RTX) monitoring, immunosensors provide a feasible alternative to chromatographic methods and immunoassays, offering affordability, label-free detection, and high sensitivity for on-site monitoring. Moreover, in the context of SARS-CoV-2 detection, immunosensors demonstrate high performance in terms of rapid and precise virus detection, without the need for polymerase chain reaction tests or labeling, showcasing their potential for efficient and accurate diagnostics. Overall, immunosensors present a promising solution for various detection applications due to their speed, sensitivity, selectivity, and ease of use.
What are the minimum mask steps required to make a functional pMOS?
5 answers
To create a functional pMOS transistor with reduced masking steps, the process involves utilizing a minimum number of critical masks. By forming conductive gate/insulator layer stacks on different conductivity portions of a semiconductor substrate and implementing disposable outer sidewall spacers, heavy and light source/drain implantations of opposite conductivity types can be performed with only two critical masks, reducing production costs and duration while increasing manufacturing throughput. Additionally, a method involves forming Sigma-shaped grooves in sidewalls and filling them with crushing stress materials to enhance the transistor's channel region. This streamlined approach allows for the efficient formation of pMOS transistors with improved performance.
How GaN Field-Plate dielectric affect the TDDB?
5 answers
The presence of a field plate in GaN devices significantly impacts Time-Dependent Dielectric Breakdown (TDDB). Field plates enhance breakdown voltage, as evidenced by a GaN HEMT with a field plate exhibiting a breakdown voltage of 292V compared to 98V without a field plate. Additionally, the use of a field plate in GaN MIS-FETs contributes to robust forward gate TDDB stability, allowing for an extrapolated operating gate voltage of 7V or 8.8V after 10 years with 1% failure rate. However, the introduction of a field plate can lead to reduced frequency performance, with field-plated GaN HEMTs showing lower cut-off and maximum frequencies compared to those without field plates. Understanding the impact of field plates on TDDB is crucial for optimizing the reliability and performance of GaN devices.
What is the number of studies on memcapacitor emulator in the literature?
5 answers
There are five studies on memcapacitor emulators in the literature. These studies propose innovative designs for memcapacitor emulators using various components such as current feedback amplifiers, analog multipliers, resistors, and capacitors. The emulators are designed to operate at high frequencies, exhibit non-volatility behavior, and are robust against mismatch and process variations. Additionally, the studies demonstrate the expandability of memcapacitor circuits using memristors and mutators, enabling the construction of complex circuit configurations. The proposed emulators have been validated through simulations, experimental verifications, and post-layout analyses, showcasing their efficiency, low power consumption, and applicability in practical applications like neuromorphic computing.
How dielectric film which under the gate flate plate of GaN affect the TDDB?
5 answers
The dielectric film under the gate field plate of GaN significantly impacts Time-Dependent Dielectric Breakdown (TDDB). Stress variations in the film affect the electric characteristics of GaN transistors, with compressive films increasing isolation leakage and tensile films increasing gate leakage. The intense electric field on the gate dielectric causes trapping of electrons, leading to transient shifts in threshold voltage, known as Bias-Temperature Instability (BTI), and the formation of defects that can eventually short the dielectric, causing TDDB. Utilizing high-quality dielectrics like Al2O3 can mitigate trap states and enhance device performance, offering promising TDDB stability in GaN transistors. Understanding and optimizing the dielectric film properties are crucial for improving TDDB characteristics in GaN-based devices.
How nitride film or oxide film which under the gate flate plate of GaN affect the TDDB?
5 answers
The nitride or oxide film under the gate flat plate of GaN significantly impacts Time-Dependent Dielectric Breakdown (TDDB) characteristics. Research on GaN Metal-Insulator-Semiconductor Field-Effect Transistors (MIS-FETs) with Al2O3 gate dielectric demonstrates stable forward gate bias TDDB behavior, showcasing enhanced E-mode characteristics and low gate leakage, with no breakdown observed up to 15V at room temperature. Additionally, investigations on AlGaN/GaN MIS-HEMTs reveal TDDB concerns in the OFF state, emphasizing the necessity to consider trapping effects for accurate breakdown voltage estimation. Furthermore, a proposed TDDB testing device for gate oxide layers in integrated circuits offers a method to determine breakdown field strength, acceleration factors, and service life calculations based on breakdown time and field strength data.
How dielectric film property effect the TDDB of GaN device?
5 answers
The dielectric film properties significantly impact the Time-Dependent Dielectric Breakdown (TDDB) of GaN devices. Dielectric breakdown mechanisms determine the Weibull distribution shape and mean time to failure scale factor, influenced by buffer traps and percolation path establishment. Dielectric breakdown in GaN devices is a critical concern due to the formation of defects under intense electric fields, leading to the creation of conducting paths that shorten device lifetimes. Studies on GaN Metal-Insulator-Semiconductor devices show that the gate dielectric material, such as ALD Al2O3, affects TDDB stability under forward bias, with implications for device reliability and longevity. Additionally, investigations on AlGaN/GaN Metal-Insulator-Semiconductor devices reveal that TDDB under AC stress exhibits longer breakdown times compared to DC stress, influenced by gate stack dynamics and recovery voltage levels.
What are good papers that explain the delta method of minimizing offset thermal EMFs?
5 answers
The delta method for minimizing offset thermal EMFs is well explained in the paper by Rodenbeck et al., where they introduce a technique called "delta modulation" (DM) to improve the sensitivity of RF subsamplers in radar and coherent receiver applications. This method involves feeding the time-average output of a monobit analog-to-digital converter (ADC) back to the ADC input with opposite polarity to correct for aggregate DC offsets, enhancing ADC sensitivity. The paper demonstrates the effectiveness of analog and digital DM circuits in correcting output quantization imbalance, even under varying temperature conditions, and improving baseband spectrum quality for realistic radar applications. The DM technique does not impact ADC linearity, as confirmed through two-tone testing.
How transparent oxides can be used as gate dielectric?
5 answers
Transparent oxides can be utilized as gate dielectrics in various applications. For instance, in the study by Alshammari et al., a novel process was developed to fabricate thin film transistors (TFTs) using a binary oxide, Hf x Zn1- x O2- δ (HZO), for all transistor layers, including the gate and dielectric layers. This approach allowed for tuning the electronic properties of the oxide from conducting to insulating by adjusting the chemical precursors' flow ratio. Additionally, the work by ViolBarbosa et al. demonstrated that ionic liquid gating can induce a metallic phase in insulating films of WO3, altering the material's conductivity while maintaining transparency in the visible range. These studies highlight the versatility of transparent oxides in serving as gate dielectrics with tunable electronic properties for various electronic devices.
What is the difference between constant voltage and constant current in gel electrophoresis?
5 answers
In the context of gel electrophoresis, the difference between constant voltage and constant current lies in their control mechanisms and adaptability. Constant current control in microchip electrophoresis directly indicates the velocity of the electroosmotic flow (EOF), making it more convenient than constant voltage control. Constant voltage electromigration testing offers advantages over constant current testing for materials with varying geometries, while the benefits are minimal for properly produced materials. A constant current circuit with high breakdown-voltage transistors is designed for high voltage circuits with low manufacturing costs. Additionally, a constant current constant voltage circuit stabilizes voltage and controls levels effectively, featuring strong anti-interference capabilities. These findings highlight the nuanced differences and applications of constant voltage and constant current in gel electrophoresis.
Is there an article about a led-array with individually addressable electrodes?
5 answers
Yes, there are multiple articles discussing LED arrays with individually addressable electrodes. One article presents a novel approach using GaN micro-light-emitting diodes (LEDs) with individually addressed n-electrodes, allowing for faster modulation and compatibility with NMOS transistor-based drivers. Another study introduces GaN-based micro-LED arrays with a reversed electrode structure, featuring a common p-electrode and individually addressable n-electrodes, enabling high-performance characteristics and compatibility with NMOS drivers for faster modulation. Additionally, a different research paper describes the fabrication of individually addressable GaN microdisk LED arrays, showcasing ultrahigh resolution and stable operation in free-standing and flexible forms. These articles collectively highlight advancements in LED array technology with individually addressable electrodes for various applications.