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The proposed array structure and the procedure virtually eliminate usual constraint on the number of transistors that can be present in an array.
These are the highest values ever reported for organic transistors.
The fabricated transistors exhibit excellent I-V characteristics.
Furthermore, the proposed approach requires, on an average, less than 10% of the number of the transistors in comparison with a recent decoder-based design for various ternary benchmark circuits.
These are the first reported metal gate transistors in the III‐V materials and the first using a nonepitaxial base and laterally seeded overgrowth.
In this regime, utilizing transistors to design specialized cores that optimize energy-per-computation becomes an effective approach to improve system performance.
I–V characteristics of the transistors before and after preparation indicate that the sectioned transistors show a higher leakage current, but are still functionally operational.
The data are consistent with the formation of parasitic transistors resulting from the microdose deposited in the gate oxides of these devices by the heavy ions.
Our findings paint a picture of BTI and TDDB that in many respects is similar to that of Si transistors but with some unique characteristics.
Journal ArticleDOI
Qin Zhang, Wei Zhao, Alan Seabaugh 
555 Citations
This formula is consistent with two recent reports of interband tunnel transistors, which show lower than 60-mV/dec subthreshold swings and provides two simple design principles for configuring these transistors.

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