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In other words, chips will have an abundance of transistors, i. e., more than the number that can be simultaneously powered-on.
To the best of our knowledge, these are the most radiation-hard thin film transistors reported to date.
The proposed circuit structure and the procedure virtually eliminate usual constraint on the number of transistors that can be present in an array.
Journal ArticleDOI
Y. Naveh, K.K. Likharev 
119 Citations
The results show that transistors with channel length as small as 8 nm can exhibit either a transconductance up to 4000 mS/mm or gate modulation of current by more than 8 orders of magnitude, depending on the gate oxide thickness.
Vertical Organic Transistors are a novel technology that has the potential to overcome these limitations of OFETs.
The results show that transistors with channel length as small as 8 nm can exhibit either a transconductance up to 4000 mS mm − 1or gate modulation of current by more than 8 orders of magnitude, depending on the gate oxide thickness.
The data are consistent with the formation of parasitic transistors resulting from the microdose deposited in the gate oxides of these devices by the heavy ions.

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How solution processed SnO2 concentration effect the thin films properties?
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