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It is found that quantum effects become important for a thin film of small thickness.
The nonreciprocity of a 25-nm-thick-film, however, is lower than those of thicker films.
This performance is better than many reported results for thin film technology
Contrary to other thin films, this nanoparticle thin film can achieve a thickness up to several hundred nanometers, even to micron.
This study leads to the development of a high-quality thin film.
It is found that the deposition angle and, to a lesser extent, the film thickness are the most important parameters controlling properties of the thin film.
Noticeably, there is a characteristic thickness H* physically defining what a thin film is; namely, once the film thickness H is the same order as H*, the effect of film thickness should be taken into account.
This significantly limits the decline of the thin film capacitance with the film thickness.
Proceedings ArticleDOI
Joseph E. Yehoda, Russell Messier 
23 Dec 1986
8 Citations
There is considerable evidence that thin film morphology, which includes both the film top surface and internal void network structure, is a key link between film preparation processes and resulting film characteristics and properties.
The thin film has several advantages over traditional methods.

Related Questions

What is the thickness for relaxor antiferroelectric thin film for energy storage applications?5 answersRelaxor ferroelectric and antiferroelectric thin films for energy storage applications vary in thickness based on the specific material and design. For relaxor ferroelectric thin films, thicknesses of 4 μmand 1.2 μmhave been reported. On the other hand, antiferroelectric thin films, such as Al-doped HfO2, have been studied at thicknesses of 20 nm and 50 nm. These thin films exhibit promising energy storage properties, with the 50 nm thick 8 at. % Al-doped HfO2 film showing a maximum energy storage density of 63 J/cm3. The choice of thickness is crucial in determining the operating electric fields, energy storage densities, and efficiency of these thin films, highlighting the importance of material design and optimization for energy storage applications.
What are the ways to make thin film?5 answersThere are several methods for making thin films. One method involves using atomic layer deposition (ALD) and atomic layer etching (ALE) processes. In this method, a first thin film is formed through ALD, and then etched to a predetermined thickness using ALE to create a second thin film with a reduced thickness. Another method involves a thin film forming process that includes supplying a source gas, purging the gas, supplying a reactive gas, supplying plasma, and purging the reactive gas. During these operations, the source gas is bypassed to the exhaust unit at a reduced flow rate, resulting in reduced gas consumption and minimized generation of reaction by-products. Additionally, a thin film can be manufactured by forming an ink droplet on a substrate, evenly distributing the solvent in the droplet, and evaporating the solvent to form the thin film. Another method involves dispensing a solution on a substrate, spreading it into a thin layer using a hydrophilic material, and either allowing a thin film to grow through chemical reaction or evaporating the solution to leave behind a particulate film. Finally, a method includes introducing an organic metal gas containing hydrogen onto a substrate, introducing an oxidizing or nitriding gas, generating plasma, detecting emission intensity, and stopping plasma generation based on the detected intensity.
How much does the thin film electrode cost ?3 answersThe cost of the thin film electrode is not mentioned in any of the abstracts provided.
How do you make a thin film?10 answers
How thick is Kerdi membrane with thinset?10 answers
What is thin film in air wedge?9 answers

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