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These data indicate that previously reported analyses, which lead to a linear dependence of common‐base current‐gain on fast neutron exposure, yield a good approximation for the npn device, but are not of general validity for the pnp germanium transistor.
The parameters are extracted from a single measurement in the forward active region on one transistor test structure with two separate base contacts, making it a simple and attractive tool for bipolar transistor characterization.
In npn transistors, these two factors both result in increased base current, while in pnp devices, positive charge in the oxide moderates the increase in base current due to surface recombination.
The dose-rate dependence of gain degradation in lateral PNP transistors is even stronger than the dependence previously reported for NPN BJTs.
These calculations confirm tie general picture given of transistor action.
The measurements reveal that the fabricated devices show the desired transistor characteristics.
It can be equivalently regarded as parallel connection of an incorporated PNPN SCR part and an NPN BJT part.
Model predictions agree very well with measured terminal characteristics of various NPN and PNP transistor structures and support heavy-doping parameters used in the model.
The analysis indicates that high-performance pnp InP-based HBT's are feasible, but that optimization of the transistor's multilayer structure is different than for the npn device.

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Production of field effect transistors?
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Are there led arrays with individual addressable p and n contacts?
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What is the current state of research on the synthesis, characterization, and utilization of Janus TMDs in various fields?
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