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The fT of 213 GHz is the highest value yet reported for any silicon-based bipolar transistor.
Our results show that the present device operates as a radio-frequency single electron transistor.
The high speed performance of the pnp transistors surpasses the best reported values of this transistor type substantially.
Compared with the field-effect transistor, a source-gated transistor more nearly meets these requirements.
To the best of the authors' knowledge, this is the first demonstration of a transistor with both f T and f max over 700 GHz on any material system.
Experimental results obtained for a silicon RF bipolar transistor demonstrate validity of the method.
The transistor results are promising with good mobility values and drive current.
The transistor design could provide the basis for low-noise radiation-tolerant circuits.
We concluded the circular-gate transistor is more tolerant to radiation than the rectangular-gate transistor.

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What is the key feature of optospintronic?
4 answers
Optospintronic devices combine the functionalities of optoelectronic and spintronic devices, offering unique features. These devices typically involve structures where light interacts with the spin of electrons. Key features of optospintronic devices include the integration of optoelectronic components with spintronic functionalities, enabling control of spin-polarized currents using light. Opto-electronic devices can also incorporate waveguides with active and passive regions, allowing for light absorption variations based on electric field changes along the waveguide. Additionally, optoelectronic devices can utilize modulation and demodulation units to determine phase differences in transmitted and received light beams, aiding in object detection and boundary definition within protected areas. These devices may also include multiple projectors emitting different types of light and retroreflectors for alignment and detection purposes.
What is an advanced blast and the aim or purpose of using it?
5 answers
An advanced blast refers to a method that utilizes different membrane materials like acetate, Mylar, and aluminum to generate shock waves similar to free-field blasts for biological and biomechanical studies. The aim of using advanced blasts is to compare rupture patterns and pressure traces of these distinct membrane materials to understand their advantages and disadvantages in blast simulators. Each material, whether acetate, Mylar, or aluminum, presents unique characteristics in terms of rupture patterns, pressure traces, and shock wave speeds, influencing the effectiveness and cost considerations of the blast simulation process. This comparative analysis helps in selecting the most suitable membrane material for specific research requirements, balancing performance and practicality in advanced blast simulations.
How long can silicon wafers be stored?
5 answers
Silicon wafers can be stored for varying durations depending on the storage method employed. Proper storage conditions are crucial to prevent surface degradation and contamination. Research suggests that the storage life of silicon wafers can extend up to 18 months with strict control of moisture inside the wafer package. Methods such as adsorbing a polymer onto the wafer surface or immersing wafers in an aqueous hydrogen peroxide solution can help prevent contamination and surface staining during storage. Additionally, storing freshly sliced silicon wafers in ethanol solution at controlled temperatures can maintain their state and cleanliness effectively. By following appropriate storage protocols, the longevity and quality of silicon wafers can be preserved for extended periods.
What is 'Exposure tasks ' defined by William J. Potter?
5 answers
'Exposure tasks' as defined by William J. Potter encompass various processes in semiconductor fabrication. These tasks involve exposing patterns from a reticle onto a substrate using advanced exposure apparatus. The exposure apparatus described in the research papers includes components like a wafer stage, light source, reticle, projection optical system, and correction mechanisms. These tasks are crucial for ensuring precise and efficient pattern transfer during semiconductor manufacturing. Potter's definition highlights the complexity and precision required in the exposure processes, emphasizing the need for continuous advancements in exposure apparatus technology to enhance productivity and maintain high-quality standards in semiconductor fabrication.
What is the number of studies on memcapacitor emulator in the literature?
5 answers
There are five studies on memcapacitor emulators in the literature. These studies propose innovative designs for memcapacitor emulators using various components such as current feedback amplifiers, analog multipliers, resistors, and capacitors. The emulators are designed to operate at high frequencies, exhibit non-volatility behavior, and are robust against mismatch and process variations. Additionally, the studies demonstrate the expandability of memcapacitor circuits using memristors and mutators, enabling the construction of complex circuit configurations. The proposed emulators have been validated through simulations, experimental verifications, and post-layout analyses, showcasing their efficiency, low power consumption, and applicability in practical applications like neuromorphic computing.
What are 3t3 cells?
5 answers
3T3 cells are a type of cell line commonly used in various research fields. These cells are embryonic mouse fibroblast cells that play a crucial role in cell biology studies due to their ability to grow in flat monolayers, making them ideal for cell culture experiments. 3T3 cells have been extensively studied in different contexts, such as investigating transformation, stress fiber formation, and serving as feeder cells for keratinocytes. Additionally, these cells are utilized in experiments related to calcium influx through various receptors, highlighting their significance in understanding cellular signaling pathways. Overall, 3T3 cells are valuable tools in biomedical research, offering insights into cell behavior, culture studies, and signaling mechanisms.
What are good papers that explain the delta method of minimizing offset thermal EMFs?
5 answers
The delta method for minimizing offset thermal EMFs is well explained in the paper by Rodenbeck et al., where they introduce a technique called "delta modulation" (DM) to improve the sensitivity of RF subsamplers in radar and coherent receiver applications. This method involves feeding the time-average output of a monobit analog-to-digital converter (ADC) back to the ADC input with opposite polarity to correct for aggregate DC offsets, enhancing ADC sensitivity. The paper demonstrates the effectiveness of analog and digital DM circuits in correcting output quantization imbalance, even under varying temperature conditions, and improving baseband spectrum quality for realistic radar applications. The DM technique does not impact ADC linearity, as confirmed through two-tone testing.
How transparent oxides can be used as gate dielectric?
5 answers
Transparent oxides can be utilized as gate dielectrics in various applications. For instance, in the study by Alshammari et al., a novel process was developed to fabricate thin film transistors (TFTs) using a binary oxide, Hf x Zn1- x O2- δ (HZO), for all transistor layers, including the gate and dielectric layers. This approach allowed for tuning the electronic properties of the oxide from conducting to insulating by adjusting the chemical precursors' flow ratio. Additionally, the work by ViolBarbosa et al. demonstrated that ionic liquid gating can induce a metallic phase in insulating films of WO3, altering the material's conductivity while maintaining transparency in the visible range. These studies highlight the versatility of transparent oxides in serving as gate dielectrics with tunable electronic properties for various electronic devices.
Cleanliness is important in stereolithography?
5 answers
Cleanliness is crucial in stereolithography processes to maintain the quality of components and prevent contamination. Methods such as using cleaning systems with laser radiation sources, inspecting reflective masks for contaminants, and employing cleaning compositions with specific components like water-soluble polymers and surfactantsare essential. Additionally, applying cleaning fluids with protection additives and solvents, followed by a removal process, helps ensure cleanliness and protection of substrates. In 3D printing, a cleaning mechanism with wipers and carriers facilitates the maintenance of cleanliness during the printing process. Overall, these approaches highlight the significance of cleanliness in stereolithography for achieving optimal results and preventing issues related to contamination and quality degradation.
What is the difference between constant voltage and constant current in gel electrophoresis?
5 answers
In the context of gel electrophoresis, the difference between constant voltage and constant current lies in their control mechanisms and adaptability. Constant current control in microchip electrophoresis directly indicates the velocity of the electroosmotic flow (EOF), making it more convenient than constant voltage control. Constant voltage electromigration testing offers advantages over constant current testing for materials with varying geometries, while the benefits are minimal for properly produced materials. A constant current circuit with high breakdown-voltage transistors is designed for high voltage circuits with low manufacturing costs. Additionally, a constant current constant voltage circuit stabilizes voltage and controls levels effectively, featuring strong anti-interference capabilities. These findings highlight the nuanced differences and applications of constant voltage and constant current in gel electrophoresis.
Is there an article about a led-array with individually addressable electrodes?
5 answers
Yes, there are multiple articles discussing LED arrays with individually addressable electrodes. One article presents a novel approach using GaN micro-light-emitting diodes (LEDs) with individually addressed n-electrodes, allowing for faster modulation and compatibility with NMOS transistor-based drivers. Another study introduces GaN-based micro-LED arrays with a reversed electrode structure, featuring a common p-electrode and individually addressable n-electrodes, enabling high-performance characteristics and compatibility with NMOS drivers for faster modulation. Additionally, a different research paper describes the fabrication of individually addressable GaN microdisk LED arrays, showcasing ultrahigh resolution and stable operation in free-standing and flexible forms. These articles collectively highlight advancements in LED array technology with individually addressable electrodes for various applications.