Showing papers on "Ammonium hydroxide published in 1993"

Solubility behavior of titanium(IV) oxide in alkaline media at elevated temperatures

Abstract: A platinum-lined, flowing autoclave facility was used to investigate the solubility behavior of titanium dioxide (TiO2) in aqueous sodium phosphate, sodium hydroxide and ammonium hydroxide solutions between 17 and 288°. Baseline Ti(IV) solubilities were found to be on the order of one nanomolal, which were enhanced by the formation of anionic hydroxo- and phosphato-complexes. The measured solubility behavior was examined via a titanium(IV) ion hydrolysis/complexing reaction equilibria were obtained from a least squares analysis of the data. The existence of three new Ti(IV) ion complexes is reported for the first time: Ti(OH)4(HPO4)2−, Ti(OH)5(H2PO4)2− and Ti(OH)5(HPO4)3−. The triply-charged anionic complex was the dominant Ti(IV) species in concentrated, alkaline phosphate solutions at elevated temperatures. This complex is expected to exhibit C.N.=4 (i.e., Ti(OH)2OPO 4 3− ). A summary of thermochemical properties for species in the systems TiO2-H2O and TiO2-P2O5-H2O is also provided.

Quaternary ammonium carbonate compositions and preparation thereof

Abstract: Quaternary ammonium carbonates having the formula ##STR1## wherein R 1 is a C 1 -C 20 alkyl or aryl-substituted alkyl group and R 2 is a C 8 -C 20 alkyl group have been synthesized. These compounds and compositions further comprising the corresponding quaternary ammonium bicarbonate ##STR2## wherein R 1 is the same or a different C 1 -C 20 alkyl or aryl-substituted alkyl group and R 2 is the same or a different C 8 -C 20 alkyl group and/or the corresponding quaternary ammonium metal carbonate ##STR3## wherein R 1 is the same or a different C 1 -C 20 alkyl or aryl-substituted alkyl group; R 2 is the same or a different C 8 -C 20 alkyl group and M is a non-coupler metal, are prepared by reacting two reactants, a C 1 -C 20 alkyl or aryl-substituted alkyl, C 8 -C 20 alkyl quaternary ammonium chloride and a metal hydroxide, in a solvent comprising a C 1 -C 4 normal alcohol. The amount of metal chloride reactant is that amount sufficient to yield the C 1 -C 20 alkyl or aryl-substituted alkyl, C 8 -C 20 alkyl quaternary ammonium hydroxide, a metal chloride, and optionally unreacted metal hydroxide. The resultant quaternary ammonium hydroxide and any unreacted metal hydroxide are then reacted with carbon dioxide to yield the quaternary ammonium carbonate and optionally metal carbonate. Also provided is a method for preserving a wood substrate. Accordingly, the substrate is treated with a metal coupler-free wood preservative system comprising a biocidal effective amount of the carbonate quats above, preferably those prepared by the method above, and a solvent.

Absorption of nitric oxide promoted by strong oxidizing agents: organic tertiary hydroperoxides in n-hexadecane

Abstract: The selective removal of nitric oxide from gas streams was investigated using 3,6-dimethyl-3-octyl hydroperoxide, p-menthanyl hydroperoxide, pinanyl hydroperoxide, and cumenyl hydroperoxide in solutions of n-hexadecane (cetane). The influence of different variables such as temperature, gas stream flow rate (or residence time), and concentration of hydroperoxide compounds on rate of NO removal was evaluated. The NO reacted with the hydroperoxides to produce allyl nitrates. These are easily hydrolyzed with ammonium hydroxide to ammonium nitrate and the alcohol

Resist release solution

Abstract: PURPOSE:To easily release a side wall protecting deposited film and to enhance noncorrosiveness to a wiring material by forming the resist release soln. with sugar alcohol, etc., alcoholamines, water and further quaternary ammonium hydroxide, if necessary. CONSTITUTION:This soln. is used to remove the deposited film for protecting the side wall of a resist, and consists of at least one kind of material (a) selected from a group consisting of sugar alcohol, isopropyl alcohol, dimethyl sulfoxide and 1,3-dimethyl-2-imidazolidinone, alcoholamine (b), water (c) and further quaternary ammonium hydroxide (d), if necessary. The alcoholamine (b) is selected from a group consisting of monoethanolamine, diethanolamine, etc. Accordingly, the releasability of the side wall protecting deposited film by an org. amine soln. is balanced with the noncorrosiveness of the sugar alcohol or the org. solvent to a wiring material the releasability of the side wall protecting deposited film is improved by the addition of quaternary ammonium hydroxide, and a highly precise circuit wiring is produced.

Method of processing organic quaternary ammonium hydroxide-containing waste liquid

Abstract: The invention is a method of processing a waste liquid containing at least an organic quaternary ammonium hydroxide. The waste liquid is brought into contact with a cation-exchanging material so as to make the organic quaternary ammonium ions adsorbed by the material to thereby remove the ions from the liquid (adsorbing step), and optionally the cation-exchanged water obtained by the contact is again processed to separate and remove resist peelings and surfactants therefrom. The invention is also a method of processing the organic quaternary ammonium hydroxide-containing waste liquid for recovering a valuable substance of the organic quaternary ammonium hydroxide therefrom. The method comprises the adsorbing step and an eluting step of bringing an eluent into contact with the cation-exchanging material that has adsorbed the organic quaternary ammonium ions so as to elute the ions from the material followed by an electrolyzing step of electrolyzing the eluate obtained in the eluting step to recover an aqueous solution of the organic quaternary ammonium hydroxide. The anodic liquid drawn from the electrolytic cell in the electrolyzing step may be re-circulated to the eluting step to be used as an eluent therein. By the invention, an organic quaternary ammonium hydroxide-containing waste liquid may be processed efficiently and inexpensively to give a low-COD, clean processed water, which may be directly discharged into rivers and others. If desired, the valuable substance organic quaternary ammonium hydroxide may be recovered efficiently and inexpensively with a high purity.

Quaternary ammonium hydroxide compositions and preparation thereof

Abstract: A high yield method for the preparation of C1 -C20 alkyl or aryl-substituted alkyl, C8 -C16 alkyl quaternary ammonium hydroxide is provided whereby two reactants, a corresponding quaternary ammonium chloride and a metal hydroxide, are reacted in a solvent comprising a C1 -C4 normal alcohol. The amount of metal hydroxide reactant is that amount sufficient to yield the quaternary ammonium hydroxide and a metal chloride. Also provided are wood preservative systems which include (a) a biocidal effective amount of at least one di C8 -C12 alkyl quaternary ammonium hydroxide and (b) a solvent, as well as a method for preserving a wood substrate whereby the substrate is treated with the preservative system.

Method for synthesizing fullerol

Abstract: PURPOSE:To synthesize fullerol (Cn(OH)m) having large value of addition number (m) of hydroxyl groups from fullerene (Cn) in a relatively short time. CONSTITUTION:Fullerene is brought into contact with an alkali water solution at normal temperature in the presence of oxygen and a catalyst. As the catalyst, a quaternary ammonium hydroxide is used.

Aerosol spray steel can dispensers with corrosion inhibitors

Abstract: An aerosol composition packaged in a steel can is described. The composition includes water, a propellant and as a corrosion inhibitor, a small amount of ammonium benzoate. The corrosion inhibitor can further be supplemented with ammonium hydroxide.

Formation of wiring

Abstract: PURPOSE:To prevent the corrosion of a wiring forming device by smoothing the surface of a metallic film when the polishing of the metallic film is completed under a condition where the thickness of the film is easily controlled by polishing the metallic film with abrasive grains and a specific abrasive grain liquid. CONSTITUTION:After forming grooves 11b into an insulating film 11 and a metallic film 12 containing copper on the film 11, the entire surface of the insulating film 11 is flattened by removing the film 12 from the surface of the film 11 by polishing and the grooves 11b are filled with metallic films 12a as wiring. At the time of polishing the metallic film 12, an aqueous solution of hydrochloric acid, ammonium persulfate, chromium oxide, phosphoric acid, or ammonium hydroxide or an aqueous solution containing copper chloride ammonium and ammonium hydroxide or containing ammonium hydroxide and hydrogen peroxide, or a mixture of these solutions is used as an abrasive grain liquid.

Hydrothermal synthesis of Al- and Ga-substituted Omega zeolite

Abstract: The synthesis and characterisation of zeolite Al- and Ga-Omega has been studied in the temperature range 383–413 K using tetramethyl ammonium hydroxide as a template. The evidence for framework gallium substitution was obtained from chemical analysis, X-ray diffraction, IR, solid state MAS NMR, thermoanalytical studies and ion exchange. Crystal morphology varied with the degree of isomorphous substitution of both Al and Ga and the synthesis temperature.

Developer solution for photoresist composition

Abstract: Proposed is an aqueous developer solution for an alkali-developable photoresist composition which contains, besides a water-soluble organic basic compound such as tetramethyl ammonium hydroxide and an anionic or non-ionic surface active agent as conventional ingredients in the prior art developwer solutions, an inorganic ammonium salt such as ammonium sulfate, ammonium phosphates and ammonium borates in a limited amount. By virtue of this unique additive, the developer solution is advantageous in respect of the absence of any scums on the patterned resist layer obtained by the development treatment therewith as well as quite good orthogonality in the cross sectional profile of line-patterned resist layer in addition to the greatly improved latitude in the light exposure dose and range of focusing depth in the light-exposure process of the resist layer with ultraviolet light.

A novel electrochemical process for the production of ammonium perchlorate

Abstract: Perchloric acid, HCLO4, and ammonium perchlorate, NH4ClO4, of high purity have been produced by electrolysis of chloric acid and subsequent reaction with high purity ammonium hydroxide to produce ammonium perchlorate. The process involves no alkali metals, chlorides or transition metals such as chromates, and thus produces propellant and explosive grade ammonium perchlorate of high purity and with no associated instability or pollution problems. The products can be recovered by solution crystallization-drying or direct spray-drying, respectively.

Method for regenerating tetra-alkyl ammonium hydroxide

Abstract: PURPOSE:To regenerate tetra-alkyl ammonium hydroxide used for a developer of a positive photo resist from the waste solution of the developer. CONSTITUTION:The waste solution of the developer of the positive photo resist consisting mainly of tetra-alkyl ammonium hydroxide is neutralized and after an alkali soluble organic compound dissolved in the waste solution is precipitated and removed and furthermore is oxidatively decomposed, electrolyzed in an anode chamber 8 of an electrolytic bath 6 segmented with the cation exchange membrane to regenerate tetra-alkyl ammonium hydroxide which is reused as the developer.

Method for preparing aqueous quaternary ammonium hydroxide solution

Abstract: The present invention provides a method for preparing a high-purity aqueous quaternary ammonium hydroxide solution, and there is here disclosed this method for preparing the high-purity aqueous quaternary ammonium hydroxide solution which comprises reacting a quaternary ammonium organic acid salt with hydrogen peroxide, oxygen or an oxygen-containing gas in the presence of a platinum group metal catalyst to produce a quaternary ammonium inorganic acid salt, and then electrolyzing this inorganic acid salt by the use of an electrolytic tank having a cation exchange membrane.

Photoresist stripping process using n,n-dimethyl-bis(2-hydroxyethyl) quaternary ammonium hydroxide

Abstract: A process for stripping photo-resists and an aqueous bath for use in the process are disclosed. The process is carried out at 40° to 100 °C for about 0.1 to 10 minutes. The aqueous bath contains 1 to 10 weight percent N,N-dimethyl-bis(2-hydroxyethyl) quaternary ammonium hydroxide and preferably 0.5 to 10 weight percent of a metal complexing agent such as monoethanol amine, ethylene diamine, ethylene diamine tetraacetic, melamine, nitrillotriacetic acid, morpholine, acetonylacetone, and preferably from 0.1 to 5 weight percent ammonia.

Anchor For One‐Step Release of 3′‐Aminooligonucleotides from a Solid Support.

Abstract: A linker is described that permits covalently bound aminooligonucleotides to be liberated from a solid support by one step treatment with ammonium hydroxide.

Irrigation and fertilization system

Abstract: A fertilization and irrigation system including a hollow tubular fiber conduit having a liquid permeable wall for nitrogen fertilizing and irrigating soil. The conduit or length of this tubular material is placed within the soil generally in the vicinity of the root level of plants to be irrigated. For nitrogen fertilization, ammonium hydroxide (NH 4 OH) is introduced into the conduit, the ammonia (NH 3 ) then allowed to permeate through the conduit wall into the soil. The presence of ammonium hydroxide may be by circulation or held statically under a varying amount of static head pressure. The ammonium hydroxide interacts to dissolve plasticizer within the hollow fiber conduit so that the plasticizer will thereafter go into colloidal suspension within water and carried away. By removal of plasticizer in this manner, both fertilization efficiency and the water permeability of the conduit for subsequent irrigation of the plants and soil are increased significantly.

Diffusion Coefficients In a Water/Sodium Dodecyl Sulfate/ Penlanol Mlcroemulslon Base and Its Ammonium Hydroxide Analogue

Abstract: The self-diffusion coefficients were determined in sodium dodecyl sutfale/pcnlanol solutions with water and an aqueous concentrated ammonium hydroxide solution using NMR. Replacing water by the ammonium hydroxide solution destabilized the liquid crystalline phase in the system and also reduced the size of the colloidal association structures in the isotropic liquid part.

Comparative effect of alkali treatment on chemical composition and in vitro dry matter and organic matter digestibility of peanut shells, soybean straw and wheat straw

Abstract: A laboratory study was conducted to compare the effect of type and concentration of alkalis on chemical composition and in vitro dry matter and organic matter digestibility of peanut shells, soybean straw, and wheat straw. Ground straws and shells were treated with sodium hydroxide (NaOH), calcium hydroxide [Ca(OH)2], and ammonium hydroxide (NH40H). Water was added to the mixture to reach 65% moisture level. Concentrations of each of the above alkalis were 0, 2, 3,4, and 5% on a dry weight basis. The resulting silage was dried at 50°C and ground through a 1 mrn screen. The MOORE modified method of the two-sta~e dimtion technique of TILLEY and TERRY was used. Rumen fliid collected from a 500 kg Hereford steer. Treatments with either NaOH or Ca(OH)2 reduced (P < 0.05) the organic matter (OM) of all three residues. In general, the neutral detergent fiber (NDF) of the residues was depressed (P < 0.05) by all alkali treatments at the 4 or 5% concentrations. Acid detergent fiber (ADFI content was reduced (P < 0...

Developing solution for positive type photoresist

Abstract: PURPOSE:To obtain the developing solution capable of forming a resist pattern high in resolution, ultraminute in size, small in dispersion in pattern size and excellent in the profile by adding a kind of sugar and the like into an aqueous solution of a specified ammonium hydroxide. CONSTITUTION:The developing solution contains an aqueous solution of the 1-10weight% quaternary ammonium hydroxide represented by formula I and the 0.1-3weight% sugar or sugar alcohol. In formula, R is 1-3C alkyl or alkoxy, and R is 1-3C alkyl. The quaternary ammonium hydroxide is tetramethyl-, tetraethyl-, or trimethyl(2-hydroxyethyl) ammonium hydroxide, and it is used generally in an amount of 1-10weight% of the total solution and practically, each in a suitable concentration dependent on compound to be used. The sugar or sugar alcohol is xylitol, sorbitol, or sucrose.

Dynamic wetting behavior of silicon wafers in alkaline solutions of interest to semiconductor processing

Abstract: Alkaline solutions based on ammonium hydroxide and quaternary ammonium hydroxides are used widely in the wet processing of silicon wafers for control of ionic and particulate impurities following etching in acidic or buffered fluoride solutions. Etched silicon is hydrophobic in nature and alkaline solutions, because of their capacity to etch silicon, will probably alter its wettability. In this paper, the wettability of silicon in choline (2-hydroxyethyl trimethyl ammonium hydroxide) and ammonium hydroxide solutions as investigated by a dynamic contact angle analysis technique is discussed. Specifically, it has been found that silicon exhibits a profound hysteresis in wettability during the first immersion/emersion cycle in dilute choline as well as in ammonia solutions Ellipsometric and XPS (X-ray photoelectron spectroscopy) analyses have shown that exposure of choline-treated surfaces to air results in the oxidation of Si to SiO2.

Zirconium sulfate precipitation

Abstract: Zirconium containing less than about 400 ppm aluminum/zirconium is produced by precipitating zirconium sulfate from an aqueous stream containing from 0.5 M to 2 M zirconium oxychloride and contaminated with from 1000 to 3000 ppm aluminum/zirconium and having an acidity of greater than 1.5 N total acid per M zirconium. Ammonium hydroxide having a concentration of at least 14% by weight is added to the zirconium-containing solution to adjust the acidity to between 0.6 and 1.2 N total acid/M zirconium. Because the acidity adjustment results in the premature and undesired precipitation of zirconium hydroxide and aluminum hydroxide, the solution is maintained at a temperature of 60° C. or more for 15 minutes to 60 minutes to dissolve at least some of the zirconium hydroxide without permitting the undissolved zirconium hydroxide to dehydrate to the extent that a gelatinous zirconium oxide precipitate forms. Ammonium sulfate or sulfuric acid is then added to the acid adjusted solution to provide a 0.6 to 0.9 M sulfur/M zirconium ratio for precipitating zirconium sulfate from the solution without coprecipitating aluminum. After mixing the precipitation agent and the zirconium-containing solution together to precipitate some of the zirconium, the slurry is maintained at a temperature of between 90° C. and the boiling point of the solution for at least 15 minutes to precipitate additional zirconium sulfate. The zirconium sulfate is filtered to produce an asfiltered cake contaminated with less than 400 ppm aluminum/zirconium.

Para-hydroxyalkylation of hydroxylated aromatic compounds

Abstract: Hydroxylated aromatic compounds devoid of substituents in the para-position to the hydroxyl group thereof are para-hydroxyalkylated, e.g., into optionally substituted p-hydroxymandelic acid compounds, more particularly p-hydroxymandelic acid and 3-methoxy-p-hydroxymandelic acid, by condensing same with an organic carbonyl compound in the presence of a quaternary ammonium hydroxide.

Preparation of pure ammonium thioglycolate

Abstract: A process is disclosed for the preparation of pure ammonium thioglycolate from thioglycolic acid contaminated with the isopropyl ester of thioglycolic acid wherein the contaminated acid is reacted with aqueous ammonia or ammonium hydroxide at a pH of at least 6.5 to about 9.0 at elevated temperature.

Production of graphite

Abstract: PURPOSE:To obtain graphite having improved-electrical conductivity and flexibility by forming a liquid crystal of polyterephthalic acid dihydrazide and heat- treating the formed product in vacuum or in an inert gas atmosphere. CONSTITUTION:A polyterephthalic acid dihydrazide which is a polymer having the recurring unit of formula is dissolved in an aqueous solution containing a quaternary ammonium hydroxide [e.g. trimethyl(2-hydroxyethyl)ammonium hydroxide] at a concentration of 5-40wt.% to obtain a processing solution having a concentration of 5-24wt.% and exhibiting liquid crystal nature. The processing solution is extruded and coagulated in a 0.5-1N aqueous solution of phosphoric acid. The formed fiber or film is washed with water or a mixture of water and a water-soluble organic solvent and dried by heating in N2 gas. The dried product is heat-treated at >=500 deg.C in an inert gas such as Ar to obtain a high- performance formed graphite having high electrical conductivity and flexibility.