Showing papers on "Ammonium hydroxide published in 1997"

Post clean treatment composition comprising an organic acid and hydroxylamine

Abstract: A composition for removal of chemical residues from metal or dielectric surfaces or for chemical mechanical polishing of a copper surface is an aqueous solution with a pH between about 3.5 and about 7. The composition contains a monofuctional, difunctional or trifunctional organic acid and a buffering amount of a quaternary amine, ammonium hydroxide, hydroxylamine, hydroxylamine salt, hydrazine or hydrazine salt base. A method in accordance with the invention for removal of chemical residues from a metal or dielectric surface comprises contacting the metal or dielectric surface with the above composition for a time sufficient to remove the chemical residues. A method in accordance with the invention for chemical mechanical polishing of a copper surface comprises applying the above composition to the copper surface, and polishing the surface in the presence of the composition.

Acid and Base Catalysts in the Hybrid Silica Sol–Gel Process

Abstract: Sol-gel silicas were synthesized from the hydrolysis of tetraethoxysilane and N-beta-aminoethyl-gamma-aminopropyltrimethoxysilane in the presence of water and ethanol by using ammonium hydroxide or hydrochloric acid as base or acid catalysts, respectively. The influence of the type of the catalyst employed was studied by comparing the surface areas and pore sizes and volumes for both sol-gel silicas. Nitrogen elemental analysis and 13C and 29Si NMR spectra showed that both silicas present similar chemical compositions and structures. The electron-microscope results demonstrated that the particles are uniformly spherical and well shaped in both cases. The sol-gel silica obtained via basic catalysis presented relatively small spherical particles in comparison to those synthesized by acidic catalysis. The results obtained suggest that acidic catalysis is a better procedure for the synthesis of these organofunctionalized hybrid sol-gel silicas. Copyright 1997 Academic Press. Copyright 1997Academic Press

Recovery of Nucleic Acids from Immobilized Biotin−Streptavidin Complexes Using Ammonium Hydroxide and Applications in MALDI-TOF Mass Spectrometry

Abstract: The effects of ammonium hydroxide treatment of complexes consisting of biotinylated nucleic acids and immobilized streptavidin were investigated. It was found that incubation of such complexes with ammonium hydroxide at room temperature leads to denaturation of double-stranded DNA molecules, liberating only the complementary nonbiotinylated strand, whereas incubation at elevated temperatures leads to an efficient dissociation of biotin-streptavidin complexes. The introduced procedure is especially suitable as a purification and conditioning format prior to matrix-assisted laser desorption/ionization time-of-flight (MALDI-TOF) mass spectrometric analysis of DNA from complex enzymatic reactions. This is demonstrated by analysis of polymerase chain reaction (PCR) and sequencing products.

Capillary supercritical fluid chromatography-atmospheric pressure chemical ionization mass spectrometry of triacylglycerols in berry oils

Abstract: A capillary supercritical fluid chromatograph (SFC), combined with a triple-quadrupole mass spectrometer (MS) via a liquid chromatography-atmospheric pressure chemical ionization (LC-APCI) interface, was utilized in the analysis of berry oil triacylglycerols. No modification of the commercially available interface was required. Vapor of different solvents, such as methanol, isopropanol, water, or ammonium hydroxide in methanol, was introduced in the sheath gas flow in the APCI source to achieve adequate ionization of triacylglycerols. The separation of triacylglycerols according to acyl carbon number and degree of unsaturation was accomplished on a 20 m × 50 µm i.d. SB-Cyanopropyl-25 column. The resolution of triacylglycerols in the reconstructed ion chromatogram and the sensitivity of the SFC-(APCI)MS system was comparable to or slightly better than that obtained with a flame ionization detector. No baseline drifting was observed during the SFC density programming. Triacylglycerols formed diagnostic [M + H]+ and [M - RCOO]+ ions with all tested reactant ion solvents except with ammonium hydroxide in methanol, which formed abundant [M + 18]+ ions instead of [M + H]+ ions. The abundance of the [M + H]+ ion increased with increasing degree of unsaturation of a triacylglycerol, whereas the abundance of the [M - RCOO]+ ion depended on the regiospecific distribution of the fatty acid moiety between the sn-1/3 positions and the sn-2 position and on the number of double bonds.

Silica-coated zinc oxide particle, its preparation, and composition containing it

Abstract: PROBLEM TO BE SOLVED: To obtain silica-coated zinc oxide particles improved in chemical resistance, dispersibility, ultraviolet screening effect, transparency, and safety by surface-coating zinc oxide with silica to lower the photocatalytic activity of the zinc oxide. SOLUTION: A dispersion is obtained by dispersing zinc oxide in a 1-5C alcohol containing 5-100 wt.%, based on the zinc oxide, dispersant selected among ethylcellulose, polyvinyl butyral resins, polyvinyl alcohol resins, acrylic resins, phosphoric ester activators, and unsaturated carboxylic acids. An alkoxysilane, an alkylalkoxysilane or an oligomer thereof is added to the dispersion and hydrolyzed in the presence of a catalyst to surface-coat the zinc oxide with 5-100 wt.%, based on the weight of the zinc oxide, silica. The obtained silica-coated zinc oxide particles comprise at least 90 wt.% particles having a particle diameter of 0.1-9.0 μm and have a mean article diameter of 0.5-5.0 μm. The hydrolysis catalyst is exemplified by hydrochloric acid, nitric acid, sulfuric acid, formic acid, acetic acid, oxalic acid, ammonia water, or ammonium hydroxide.

A convenient synthesis of R-(−)-carnitine from R-(−)-epichlorohydrin

Abstract: A convenient four-step synthesis of R -(−)-carnitine ( 1 ) is described from the reaction of R -(−)-epichlorohydrin ( 2 ) with vinylmagnesium bromide followed by formation of the ammonium salt 4 with trimethylamine and finally ozonolysis of the corresponding ammonium hydroxide 5 .

The Role of HO 2 − in SC-1 Cleaning Solutions

Abstract: The RCA Standard Clean, developed by W. Kern and D. Puotinen in 1965 and disclosed in 1970 [1] is extremely effective at removing contamination from silicon surfaces and is the defacto industry standard.[2]. The RCA clean consists of two sequential steps: the Standard Clean 1 (SC-1) followed by the Standard Clean 2 (SC-2). The SC-1 solution, consisting of a mixture of ammonium-hydroxide, hydrogen-peroxide, and water, is the most efficient particle removing agent found to date. This mixture is also referred to as the Ammonium- Hydroxide/Hydrogen-Peroxide Mixture (APM). In the past, SC-1 solutions had the tendency to deposit metals on the surface of the wafers, and consequently treatment with the SC-2 mixture was necessary to remove metals. Ultra-clean chemicals minimize the need for SC-2 processing. SC-1 solutions facilitate particle removal by etching the wafer underneath the particles; thereby loosening the particles, so that mechanical forces can readily remove the particles from the wafer surface. The ammonium hydroxide in the solution steadily etches silicon dioxide at the boundary between the oxide and the aqueous solution (i.e., the wafer surface). The hydrogen peroxide in SC-1 serves to protect the surface from attack by OH− by re-growing a protective oxide directly on the silicon surface (i.e., at the silicon/oxide interface). If sufficient hydrogen peroxide is not present in the solution, the silicon will be aniostropically etched and surface roughening will quickly occur. On the other hand, hydrogen peroxide readily dissociates and forms water and oxygen. If the concentration of the resulting oxygen is too high, bubbles will appear in the solution. The gas liquid interfaces that result from the bubble formation act as a “getter” for particles that can re-deposit on the wafer surface if a bubble comes in contact with the wafer.

Treatment of flyash

Abstract: A method for treating powdered coal ash includes the reaction of powdered coal ash on sulfuric acid to prepare aluminium sulfate, the reaction of dregs with ammonium hydroxide to extract V2O5, and mixing residual with lime stone and mineral slags to calcine cement.

Combined Effects of a Buffer and Solvent on Tetramethylpyrazine Formation in a 3-Hydroxy-2-butanone/Ammonium Hydroxide System

Abstract: A phosphate buffer was found to significantly promote tetramethylpyrazine (TMP) formation in an acetoin (3-hydroxy-2- butanone)/ammonium hydroxide system. The effect of the phosphate ion on TMP formation was additive in the range of 0.05–0.2 m. The change in pH value of the system reveals that a proton-coupled redox type of reaction occurred during TMP formation. Phosphate serves both as proton donor and acceptor to facilitate proton transfer during the Schiff base formation between ammonia and 3-hydroxy-2-butanone. Protic solvents, methanol, and ethanol, were found to attract the water released from the system. The combination of a phosphate buffer and protic solvent led to the completion of TMP formation. The TMP formation mechanism in a phosphate buffer (pH 7.2) is proposed.

Composition and method for treatment of lead-containing surface coatings and soil

Abstract: A method is provided to render non-hazardous surface soil which is contaminated with lead compounds. The soil is treated by applying an aqueous composition comprising hydrogen peroxide, ammonium hydroxide, nitric acid and acetic acid and allowing said composition to migrate through the soil.

Preparation of vanadium antimonate based catalysts using SnO2 ·xH2 O

Abstract: A method of preparing a catalyst having the elements and the proportions indicated by the following empirical formula: VSb.sub.m A.sub.a D.sub.d O.sub.x where A is one or more Ti, Sn, where Sn is always present D is one or more Li, Mg, Ca, Sr, Ba, Co, Fe, Cr, Ga, Ni, Zn, Ge, Nb, Zr, Mo, W, Cu, Te, Ta, Se, Bi, Ce, In, As, B, Al and Mn wherein m is 0.5 to 10 a is greater than zero to 10 d is zero to 10 x is determined by the oxidation state of the cations present, comprising making an aqueous slurry of a mixture of source batch materials comprising compounds of said elements to be included in the final catalyst, followed by drying and heat calcining the mixture to an active catalyst, wherein the source batch material for the tin is a solution which comprises SnO 2 .xH 2 O wherein x≧0 dispersed in tetraalkyl ammonium hydroxide wherein the tetraalkyl ammonium hydroxide is defined by the following formula: C.sub.n H.sub.2n+1 NOH wherein 5≧n≧1, drying said slurry and calcining the mixture to an upper calcination temperature of at least 500° C.

Alumina para utilização cerâmica, obtida a partir do rejeito de beneficiamento de caulim* (Alumina for ceramic manufacture using residues of kaolin processing)

Abstract: The kaolin processing for paper covering produces a great volume of residues formed primarily by kaolinite claymineral, here the starting material for the synthesis of ammonium alumen aiming to obtain free sodium alumina with fine grade for ceramic manufacturing. The synthesis process to obtain ammonium alumen consisted of the following procedures: residues calcination and sulphuric leaching of metakaolinite followed by neutralization/ crystallisation of aluminum sulphate solution with ammonium hydroxide concentrated solution. The effect of calcination temperature (650 °C, 700 °C and 750 °C), calcination time of residues (30 min, 60 min and 120 min), sulphuric acid concentration as well as leaching temperature (70 °C, 80 °C and 90 °C) on the kinetics of aluminum leaching were studied. The influence of pH on ammonium alumen crystallization was also studied. Data on chemical analysis, XRD, DTA, TGA and granulometry of the material utilized and synthesized are presented and discussed.

Existence and estimated enthalpies of formation of ammonium hydroxide, hydronium amide, and some related species

Abstract: The names of many simple inorganic species reflect an earlier inadequate understanding of chemical identities. For example, the nonmetal chlorine and the metal manganese are relatable in that they both have seven valence electrons, and the salts of the oxyanions with the formal oxidation state of +7 are relatedly named perchlorates and permanganates for C10 4 and MnO4containing species, respectively. There are salts of oxyanions of these elements with a lower oxidation state named chlorate and manganate: these do not correspond, as they contain the ions C103and MnO42-, respectively. We do not know of salts containing MnO3or C1042-, nor can it be said that either anion is particularly well-characterized in the gas phase or matrix either. The prefix \" p e r \" and suffix \"a t e\" do not uniquely define stoichiometry or structure. We recall from organic chemistry the prefix \" b i \" meaning two as in biphenyl, (C6H5) 2. However, it is well established that sodium bicarbonate is neither Na(CO3)2 nor NaCO3 [i.e., \"monomeric\" Na2(CO3)2]--in essentially all ionic compounds, Na has a charge of +1 and CO3 has a charge of 2 . By contrast, there is no ambiguity associated with the name \"ammonium hydroxide.\" Both constituents, NH4 § and O H , are conventional ions found in aqueous solution and solid salts alike, and NH4OH obeys the roles of stoichiometry and valence. However, ammo-

Semiconductor circuit cleaning agent and manufacture of semiconductor circuit by use thereof

Abstract: PROBLEM TO BE SOLVED: To remove polymer deposits so as to protect a metal material against corrosion by a method wherein composition which contains a specific amount of specific quaternary ammonium hydroxide and water-soluble organic solvent and water as the rest is used as cleaning agent. SOLUTION: In a formula, R 1 to R 4 may be identical or different and denote an alkyl group possessed of carbon atoms 1 to 4 in number, a hydroxy- substituted alkyl group whose number of carbon atoms is 1 to 4, or an aryl group. In the formula, 0.01 to 15 wt.% of quaternary ammonium hydroxide is contained in all solution, a mixture of one or more kinds of solvent is used as water-soluble organic solvent, and 20 to 95 wt.% of the above mixture is contained in the solution. This cleaning agent is used to remove resist, modified resist, or polymer deposits left on the processed layer after an inorganic base is subjected to dry etching or subjected to an oxygen plasma ashing treatment after dry etching. Photoresist and the like deposited on a side wall are easily separated off, and a metal material is completely protected against corrosion caused by etching. COPYRIGHT: (C)1998,JPO

Photoresist peeling composition

Abstract: PROBLEM TO BE SOLVED: To peel resist modified product formed during etching and a side wall protection film at a low temperature and a short time by mixing aprotic polar solvent, water, fluoride and quaternary ammonium salt or hydroxylamine. SOLUTION: The composition is prepared by mixing aprotic polar solvent, water, fluoride and quaternary ammonium salt or hydroxylamine. The suitable mixing rate is aprotic polar solvent at 5 to 90 wt.%, water at 1 to 70 wt.%, fluoride at 0.01 to 20 wt.% and quaternary ammonium salt or hydroxylamines at 0.01 to 20 wt.%. Embodiments of aprotic polar solvent are dimethyl sulfoxide, N-methyl-2-pyrolidone, etc., and concrete examples of fluoride are ammonium fluoride, etc., and embodiments of quaternary ammonium salt are tetramethyl ammonium hydroxide, etc.

Surface conditioning insulating layer for fine line conductive pattern

Abstract: The surface of an insulating layer is conditioned by treatment with ammonium hydroxide and hydrogen peroxide, thereby reducing the frequency of shorting between conductive lines of a subsequently formed conductive pattern thereon.

Chemical for treating semiconductor substrate and treatment method thereof

Abstract: PROBLEM TO BE SOLVED: To reduce the change of treatment performance with the lapse of time, by providing a chemical, which contains quaternary ammonium hydroxide and ozone and has an OH - concentration within a specific range, and setting the ozone concentration at a specific value of more. SOLUTION: A treatment chemical contains quaternary ammonium hydroxide and ozone, has an OH - concentration within a range of 10 -5 -10 -3 mol/l and an ozone concentration of 10 -5 mol/l or more. The concentration of quaternary ammonium hydroxide is preferably 10 -3 -1 mol/1. In the cleaning to remove particulates by using this treatment chemical, the loss during treatment due to the volatility and self decomposition of the chemical component is small and the life of the chemical is lengthened. Since the fluctuation of the composition is small, the chemical treatment performance is stabilized, thereby improving the yield and reliability of a semiconductor device. Further, the consumption of the chemical is remarkably reduced and chemical purchase cost and exhaust and waste solution treatment cost can be also greatly reduced. COPYRIGHT: (C)1999,JPO

Photoresist exfoliation agent and manufacture of semiconductor integrated circuit

Abstract: PROBLEM TO BE SOLVED: To peel easily a photoresist from an inorganic base body at a low temperature and in a short time by a method wherein an exfoliation agent composition consists of a quaternary ammonium hydroxide, a nucleophilic amine compound having an oxidation-reduction potential and an aqueous solution containing succharides or a sugar alcohol and the like. SOLUTION: A photoresist exfoliation agent contains 0.01 to 20wt.% of a quarternary ammonium hydroxide, which is shown by a general formula [(R )3 N- R] .OH (The R is an alkyl group of 1 to 4 carbon atoms or a hydroxy- substituted alkyl group and the R is an alkyl group of 1 to 3 carbon atoms.), 80 to wt.% of a nucleophilic amine compound having an oxidation-reduction potential and 0.5 to 20wt.% of succharides and/or a sugar alcohol and the like with the remnant of water. A photoresist coated on an inorganic base body is peeled from the base body using this agent. Thereby, a photoresist layer, photoresist residues and the like can be easily peeled from the base body at a low temperature and in a short time.

Hydration of dodecyltrimethyl-ammonium hydroxide micelles

Abstract: The hydration of dodecyltrimethylammonium hydroxide (DTAOH) micelles was determined by viscosity measurements, giving 39.2 ± 7.0 water molecules per micellized dodecyltrimethylammonium ion. This result is lower than the hydration of DTAB micelles, which is about 65. This difference may be due to the effect of the electro-restrictive structure-making hydroxide ion on the hydration of the alkyltrimethylammonium head group, in comparison with the less hydrated structure-breaking bromide ion.

Nuclear magnetic resonance measurement of ammonia diffusion in dense solid-liquid slurries

Abstract: The diffusion of ammonium ions in aqueous solutions was measured by nuclear magnetic resonance (NMR) using the pulsed field gradient (PFG) method. The ammonium ions were obtained from aqueous solutions of ammonium chloride, ammonium sulfate, ammonium bicarbonate, and ammonium hydroxide. The translation diffusion of the ammonium ions was determined by measuring the diffusion of nitrogen nuclei ({sup 14}N and {sup 15}N) in solution. Our results showed that the ammonium diffusion coefficient can be measured in aqueous solutions with concentrations as low as 20 x 10{sup -3} M. Typical values measured for the diffusion coefficient of the ammonium ion are 2 x 10{sup -5} cm{sup 2/s} ({+-}10%), similar to the values found for pure water. Due to the effect of the solution pH upon the NMR relaxation parameters for {sup 14}N, measurements are constrained to pH values below 8.5. However, {sup 15}N labeled ammonium is less sensitive to the solution pH, extending the measurement range to pH of 9.5. Diffusion measurements were conducted with solutions of varying viscosity and porosity. The results show that the solution viscosity has a measureable impact on the diffusion coefficient. The diffusion coefficient is almost inversely proportional to the relative viscosity of the solution, irrespective of how the viscosity is increased. Further, a randomly-packed porous bed of 200 mm PMMA resulted in a reduction of {approximately}30% in the diffusion coefficient as a result of hindered diffusion.

Quaternary ammonium salt of citric acid, its production and use

Abstract: PROBLEM TO BE SOLVED: To obtain a new compound that is useful as an antistatic agent, an electroconductivity-imparting agent, an electrolyte for battery or condenser, a moisture absorbent or the like. SOLUTION: This compound is a quaternary ammonium salt of oxalic acid of formula I or formula II (R is a 1-30C alkyl, a 6-30C aryl; R to R are each a 1-6C alkyl), for example, bis(benzyltrimethylammonium) oxalate. The compound of the formula I or the formula II is obtained by reaction of oxalic acid with a quaternary ammonium hydroxide of formula III, for example, benzyltrimethylammonium hydroxide at a molar ratio of 1:2 in the case of the compound of the formula I or at a molar ratio of 1:1 in the case of the compound of the formula II in a solvent as acetone or the like.

Hydrolytic polycondensation of tetraethoxysilane with metal salts and oxides in sol-gel process

Abstract: Hydrolysis of tetraethoxysilane catalyzed by ammonium hydroxide was studied as influenced by the reagent ratio and solvent nature. Polycondensation of tetraethoxysilane with Group I, II, and IV metal salts and oxides in 2-propanol was studied in the presence of NH 4 OH.

Process of synthesizing titanium-silicon molecular sieve TS-1 using silica gel as raw material

Abstract: The present invention uses the silica gel and titanate as raw material, and the mixture of tetraethyl ammonium hydroxide (TEAOH) and tetrabutyl ammonium hydroxide (TBAOH) as formwork agent to prepareTi-Si molecular sieve TS-1. The finished product is obtained by adopting static method or dynamic method to crystalize for 4-6 days under 170-180 deg.C and through the process of separating, washing,drying and roasting. Said invention features easy available raw material, simple technological process. When TS-1 molecular sieve is used in the hydroxylating reaction of phenol, the selective oxidisability is high, the utilicing factor of H2O2 is increased greatly.

Reduction and Management of Risks Associated With Aflatoxin and Fumonisin Contamination in Corn.

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Method for driving metal

Abstract: PROBLEM TO BE SOLVED: To obtain a clean metallic surface while preventing the occurrence staining and unequalness by treating the metallic surface subjected to a surface treatment with an aq soln contg an ammonium compd, then drying the metallic surface without washing SOLUTION: The metallic surface is treated with a surface treating agent or metal detergent and is then treated with the aq soln contg the compd expressed by formula prior to a drying stage In the formula, R1 to R4 are hydrogen or 1 to 5C alkyl groups, 2 to 4C alkenyl; X denotes a hydroxyl group or carbonic acid group, bicarbonate group; (n) is 1 or 2 As a result, the metal oxide in the drying stage is prevented and the occurrence of the unequal drying and staining is suppressed even if the metallic surface is dried while the water is held adhered thereon The compd expressed by the formula is selected from ammonium hydroxide, ammonium carbonate and ammonium bicarbonate The compd is selected from tetramethyl ammonium hydroxide, choline and neurine