Showing papers on "Atomic layer deposition published in 1972"

Deposition of metal films by laser-controlled CVD

Abstract: From fourth international conference on chemical deposition vapor; Boston, Massachusetts. USA (7 Oct 1973). It is shown that a focused laser beam can be used to create local heating sufficdent to causc tungsten deposition from the tungsten hexafluoride-hydrogen reaction. Using this techniquc, tungsten film patterns have been generated. Film resistivities are shown to depend on the - inear power density-. Problems and limitations of this method of film deposition are discussed. (auth)