Showing papers on "Atomic layer deposition published in 1985"
29 May 1985
12 citations
TL;DR: In this article, the authors report on several CVD thin films stacks for photothermal solar energy conversion which combine promising spectral selectivity and durability at elevated operating temperatures, and show that these stacks can be used for optical thin-film applications.
12 citations
3 citations
Journal Article•
TL;DR: In this paper, a three-year program to obtain an understanding of deposition processes of thin films from plasmas was conducted, and a model was constructed which took into account both gas phase and the surface processes leading to deposition.
Abstract: : This report summarizes the work performed on a three year program to obtain an understanding of deposition processes of thin films from plasmas. Deposition plasmas of methane and of methane-hydrogen and methane-silane mixtures were characterized via electrical, optical, and mass spectroscopic measurements. Surface chemical studies of the fundamental surface reactions were performed, and a model was constructed which takes into account both gas phase and the surface processes leading to deposition. The properties of the deposited films were related to the plasma conditions associated with their deposition. Advances in process modeling and surface chemical techniques were achieved on this program, in addition to the knowledge that was gained about the specific plasma deposition processes that were studied.