scispace - formally typeset
Search or ask a question
Topic

Atomic layer deposition

About: Atomic layer deposition is a research topic. Over the lifetime, 19821 publications have been published within this topic receiving 477332 citations. The topic is also known as: ALD.


Papers
More filters
Journal ArticleDOI
TL;DR: In this article, a cubic phase of HfO2 was observed by reflection high-energy electron diffraction in nanocrystalline thin films grown by atomic layer deposition from HfCl4 and H2O at substrate temperatures of 880-940°C.

135 citations

Journal ArticleDOI
TL;DR: In this paper, the phase of alternating layers of ZnSe and CdSe is zinc blende and the (111) planes of the two superlattices are oriented at 60°.
Abstract: Atomic layer deposition has been employed to grow nanowires composed of ZnSe/CdSe superlattices. Growth of the nanowires was initiated using gold nanoparticles and the vapor-liquid-solid mechanism. High-resolution transmission electron microscopy shows that these structures are single crystals and the phase of alternating layers of ZnSe and CdSe is zinc blende. The (111) planes of ZnSe and CdSe are oriented at 60°.

135 citations

Journal ArticleDOI
TL;DR: In this article, the authors describe a procedure to quantify the effective electrical conductivity of conductive coatings on non-conductive fi brous networks by applying a normal force orthogonal to the current and fi eld direction.
Abstract: Conductive coatings on complex fi brous systems are attracting interest for new electronic and other functional systems. Obtaining a quantitative conductivity value for complex surface coatings is often diffi cult. This work describes a procedure to quantify the effective electrical conductivity of conductive coatings on non-conductive fi brous networks. By applying a normal force orthogonal to the current and fi eld direction, fi ber/fi ber contact is improved and consistent conductance values can be measured. Nylon fi bers coated with an electroless silver plating shows effective conductivity up to 1950 S cm − 1 , and quartz fi bers coated with tungsten by atomic layer deposition (ALD) show values up to ∼ 1150 S cm − 1 . Cotton fi bers and paper coated with a range of ZnO fi lm thicknesses by ALD show effective conductivity of up to 24 S cm − 1 under applied normal force, and conductivity scaled as expected with fi lm coating thickness. Furthermore, we use the conductive coatings to produce an “all-fi ber” metal‐insulator‐metal capacitor that functions as a liquid chemical sensor. The ability to reliably analyze the effective conductivity of coatings on complex fi ber systems will be important to design and improve performance of similar devices and other electronic textiles structures.

135 citations

Journal ArticleDOI
TL;DR: In this paper, water and oxygen were compared as oxidizing agents for the Al2O3 deposition process using spatial atomic layer deposition reactor, and the influence of the precursor dose on the deposition rate and refractive index was measured as a function of residence time, defined as the time which the moving substrate spent within one precursor gas zone.
Abstract: Water and oxygen were compared as oxidizing agents for the Al2O3 atomic layer deposition process using spatial atomic layer deposition reactor. The influence of the precursor dose on the deposition rate and refractive index, which was used as a proxy for film density, was measured as a function of residence time, defined as the time which the moving substrate spent within one precursor gas zone. The effect of temperature on the growth characteristics was also measured. The water-based process gave faster deposition rates and higher refractive indices but the ozone process allowed deposition to take place at lower temperatures while still maintaining good film quality. In general, processes based on both oxidation chemistries were able to produce excellent moisture barrier films with water vapor transmission rate levels of 10−4 g/m2 day measured at 38 °C and 90% of relative humidity on polyethylene naphthalate substrates. However, the best result of <5 × 10−5 was obtained at 100 °C process temperature with...

135 citations

Journal ArticleDOI
TL;DR: In this article, a rotary particle bed reactor was developed to achieve constant particle agitation during static ALD reactant exposures, where a cylindrical drum with porous metal walls was positioned inside a vacuum chamber and rotated by a magnetically coupled rotary feedthrough.
Abstract: Challenges are encountered during atomic layer deposition (ALD) on large quantities of nanoparticles. The particles must be agitated or fluidized to perform the ALD surface reactions in reasonable times and to prevent the particles from being agglomerated by the ALD film. The high surface area of nanoparticles also demands efficient reactant usage because large quantities of reactant are required for the surface reactions to reach completion. The residence time of the reactant in a fluidized particle bed reactor may be too short for high efficiency if the ALD surface reactions have low reactive sticking coefficients. To address these challenges, a novel rotary reactor was developed to achieve constant particle agitation during static ALD reactant exposures. In the design of this new reactor, a cylindrical drum with porous metal walls was positioned inside a vacuum chamber. The porous cylindrical drum was rotated by a magnetically coupled rotary feedthrough. By rotating the cylindrical drum to obtain a cen...

135 citations


Network Information
Related Topics (5)
Thin film
275.5K papers, 4.5M citations
94% related
Silicon
196K papers, 3M citations
94% related
Band gap
86.8K papers, 2.2M citations
93% related
Carbon nanotube
109K papers, 3.6M citations
91% related
Oxide
213.4K papers, 3.6M citations
91% related
Performance
Metrics
No. of papers in the topic in previous years
YearPapers
2023542
20221,013
20211,032
20201,269
20191,298
20181,322