Topic
Atomic layer deposition
About: Atomic layer deposition is a research topic. Over the lifetime, 19821 publications have been published within this topic receiving 477332 citations. The topic is also known as: ALD.
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01 May 1994
TL;DR: In this paper, the authors present thin film technology, thin film characterisation, and high energy techniques for thin film. But they do not discuss the effects of these technologies on the performance of the film.
Abstract: Thin Film Technology. Gas Kinetics. Vacuum Technology. Evaporation. Deposition. Epitaxy. Chemical Vapor Deposition. High-Energy Techniques. Plasma Processes. Film Characterization.
736 citations
TL;DR: The functionalization method could be used to integrate ultrathin high-kappa dielectrics in future graphene electronics and to decorate and probe single defect sites in graphene planes.
Abstract: We investigate atomic layer deposition (ALD) of metal oxide on pristine and functionalized graphene. On pristine graphene, ALD coating can only actively grow on edges and defect sites, where dangling bonds or surface groups react with ALD precursors. This affords a simple method to decorate and probe single defect sites in graphene planes. We used perylene tetracarboxylic acid (PTCA) to functionalize the graphene surface and selectively introduced densely packed surface groups on graphene. Uniform ultrathin ALD coating on PTCA graphene was achieved over a large area. The functionalization method could be used to integrate ultrathin high-κ dielectrics in future graphene electronics.
712 citations
TL;DR: The construction and performance of dye-sensitized solar cells (DSCs) based on arrays of ZnO nanowires coated with thin shells of amorphous Al(2)O(3) or anatase TiO( 2) by atomic layer deposition is described and it is found that alumina shells of all thicknesses act as insulating barriers that improve cell open-circuit voltage (V(OC) and fill factor with little current falloff.
Abstract: We describe the construction and performance of dye-sensitized solar cells (DSCs) based on arrays of ZnO nanowires coated with thin shells of amorphous Al2O3 or anatase TiO2 by atomic layer deposition. We find that alumina shells of all thicknesses act as insulating barriers that improve cell open-circuit voltage (VOC) only at the expense of a larger decrease in short-circuit current density (JSC). However, titania shells 10−25 nm in thickness cause a dramatic increase in VOC and fill factor with little current falloff, resulting in a substantial improvement in overall conversion efficiency, up to 2.25% under 100 mW cm-2 AM 1.5 simulated sunlight. The superior performance of the ZnO−TiO2 core−shell nanowire cells is a result of a radial surface field within each nanowire that decreases the rate of recombination in these devices. In a related set of experiments, we have found that TiO2 blocking layers deposited underneath the nanowire films yield cells with reduced efficiency, in contrast to the beneficial...
704 citations
TL;DR: Atomic layer deposition is applied to coat carbon nanocoils with magnetic Fe(3)O(4) or Ni with coaxial multilayer nanostructures and exhibits remarkably improved microwave absorption properties compared to the pristine carbon Nanocoils.
Abstract: In this work, atomic layer deposition is applied to coat carbon nanocoils with magnetic Fe(3)O(4) or Ni. The coatings have a uniform and highly controlled thickness. The coated nanocoils with coaxial multilayer nanostructures exhibit remarkably improved microwave absorption properties compared to the pristine carbon nanocoils. The enhanced absorption ability arises from the efficient complementarity between complex permittivity and permeability, chiral morphology, and multilayer structure of the products. This method can be extended to exploit other composite materials benefiting from its convenient control of the impedance matching and combination of dielectric-magnetic multiple loss mechanisms for microwave absorption applications.
703 citations
TL;DR: In this paper, the atomic layer deposition (ALD) technique was used to synthesize single Pt atoms anchored to graphene nanosheet using the ALD technique, and the single-atom catalysts exhibit significantly improved catalytic activity (up to 10 times) over that of the state-of-the-art commercial Pt/C catalyst.
Abstract: Platinum-nanoparticle-based catalysts are widely used in many important chemical processes and automobile industries. Downsizing catalyst nanoparticles to single atoms is highly desirable to maximize their use efficiency, however, very challenging. Here we report a practical synthesis for isolated single Pt atoms anchored to graphene nanosheet using the atomic layer deposition (ALD) technique. ALD offers the capability of precise control of catalyst size span from single atom, subnanometer cluster to nanoparticle. The single-atom catalysts exhibit significantly improved catalytic activity (up to 10 times) over that of the state-of-the-art commercial Pt/C catalyst. X-ray absorption fine structure (XAFS) analyses reveal that the low-coordination and partially unoccupied densities of states of 5d orbital of Pt atoms are responsible for the excellent performance. This work is anticipated to form the basis for the exploration of a next generation of highly efficient single-atom catalysts for various applications.
701 citations