Showing papers on "Barrier layer published in 1985"

Electrophotographic sensitive body

Abstract: PURPOSE:To provide excellent stability in a soln. and long-time stability of a coating liquid and to permit easy and continuous coating of an electric charge transfer material by providing a photosensitive layer consisting of the laminated structure of an electric charge generating layer and charge transfer layer on a conductive base and using the polyether obtainable from a specific diol component and dihalogen compd. for the effective component of the charge transfer layer. CONSTITUTION:An electrophotographic sensitive body is formed by laminating successively a barrier layer, charge generating layer and charge transfer layer on a conductive base. Al, Ni, Cu, etc. are used for the base. A thin film of a zinc oxide-PVA dispersion or the like is used for the barrier layer. The charge generating layer is manufactured by depositing by evaporation metallic phthalocyanine such as vanadyl phthalocyanine or the like or dispersing the same in a solvent and coating the soln. on the base. The polyether obtainable from 2,6-dimethoxy-9,10-anthracene diol and dihalogen compd. is used as the charge transfer material for the charge transfer layer. The amt. of the polyether in the charge transfer layer is required to be >=60wt%. The charge transfer layer is manufactured by dissolving the charge transfer material in 1,1,2-trichloroethane, etc., coating the soln. on the base and drying the same.

Photolithographic method and combination including barrier layer

Abstract: 57 Photolithographic methods employing a photoresist layer and a contrast enhancing photobleachable layer deposited thereon have certain disadvantages including compatibility and the tendency toward scum formation during stripping of the photobleachable layer. These problems are alleviated by the deposition of an aqueous alkali-soluble polymeric barrier layer such as poly(vinyl alcohol), which is removed simultaneously with the alkaline development step for the photoresist. In a preferred embodiment, the polymeric binder for the photobleachable layer is also watersoluble and is also removed simultaneously with development.

Kinetics and morphology of erbium silicide formation

Abstract: The growth kinetics and surface morphology of erbium silicide formation from Er layers on Si(100) substrates are examined using both fast e‐beam annealing and furnace annealing. Very smooth erbium silicide layers have been grown using a line‐source e beam to heat and react the Er overlayers with the substrate. This contrasts to the severe pitting observed when Er layers are reacted with Si in conventional furnace annealing. The pitting phenomenon can be explained by a thin contaminant layer at the interface between Er and Si. Our results suggest the contamination barrier is not due to oxygen, as usually assumed, but may be related to the presence of carbon. Rapid e‐beam heating to reaction temperatures of ∼1200 K permits dispersion of the barrier layer before substantial silicide growth can occur, allowing smooth silicide growth. Heating to shorter times to just disperse the interface barrier allows uniform layer growth by subsequent furnace annealing and has permitted measurement of the kinetics of erbiu...

Interface disorder in GaAs/AlGaAs quantum wells grown by molecular beam epitaxy at high substrate temperature

Abstract: The interface disorder of quantum wells grown by molecular beam epitaxy at high substrate temperature is investigated by low‐temperature photoluminescence. The excitonic emission from a single quantum well is a single sharp peak, and the well width precisely determined from the emission peak energy does not equal to integral multiples of one‐monolayer width in almost all samples. These results indicate that the lateral size of growth islands with a one‐monolayer height is much smaller than the exciton diameter and a one‐monolayer interface acts as a layer with smaller AlAs mole fraction than the barrier layer.

TiB2 and ZrB2 diffusion barriers in GaAs Ohmic contact technology

Abstract: The transition metal diboride compounds, ZrB_2 and TiB_2, interposed between Ni/Ge/Au Ohmic contact metallization on n‐type GaAs wafers and an overlying thick Au contact layer, have been investigated to evaluate their effectiveness in stabilizing the Ohmic contact by limiting the in‐diffusion of Au. All of the metal layers were e‐beam deposited except the ZrB_2 which was rf‐diode sputtered. The barrier layer thicknesses were 50 and 100 nm for the TiB_2 and the ZrB_2, respectively. Postdeposition alloying of the contacts was performed at 400, 425, or 450 °C. Auger electron spectroscopy depth profiling of the resultant Ohmic contacts demonstrates that the barrier layers effectively preclude penetration of Au to the Ohmic contact structure. Specific contact resistivities for such contacts are in the low 10^(−7) Ω cm^2 range; although some degradation of the contact resistivity is observed after long term annealing, the values of resistivities do not exceed 1.5×10^(−6) Ω cm^2 after 92 h at 350 °C.

Rub-off advertising sampler and method of manufacture

Abstract: The advertising sampler provides a transfer layer material which is removable by finger tip and spreadable on the skin. The sampler includes a paper stock having printing thereon referring to the transfer layer sample. An oil-impervious barrier layer is located between the transfer layer and the paper stock to prevent bleed-through, and a removable protective covering sheet is positionable over the transfer layer to protect the transfer layer.

Method of making an isolation slot for integrated circuit structure

Abstract: The invention comprises an improved isolation slot in an integrated circuit structure which minimizes damage to the silicon substrate. The improved isolation slot is formed by etching a slot in the substrate of an integrated circuit structure; depositing a buffer layer in the slot adjacent the walls of the slot; and forming an isolation oxide layer in the slot over the buffer layer; whereby the presence of the buffer layer between the substrate and the isolation oxide minimizes damage to the substrate by the oxide. In a preferred embodiment, the buffer layer comprises polysilicon which is partially oxidized to form the isolation oxide layer. A barrier layer is formed between the slot walls and the polysilicon buffer layer to electrically insulate the polysilicon from the adjoining integrated circuit structure.

Polymer laminate possessing an intermediate water vapor transmission barrier layer

Abstract: An opaque barrier layer which comprises: (a) at least one thermoplastic polymer matrix substrate layer within which is located a strata of voids; positioned at least substantially within at least a substantial number of said voids is at least one spherical void-initiating particle which is phase distinct and incompatible with the matrix material, the void space occupied by said particle being substantially less than the volume of said void, with one generally cross-sectional dimension of said particle at least approximating a corresponding cross-sectional dimension of said void; the population of voids in said substrate and the thickness of said substrate being such as to cause a degree of opacity of less than 70% light transmission; and, (b) at least one thermoplastic water vapor transmission barrier layer affixed to said thermoplastic substrate layer.

Circuit board material

Abstract: A circuit board material includes an electrical resistance material layer having a preselected resistivity adhered to the support layer, and a barrier layer adhered to the electrical resistive layer, and a conductive layer adhered to the barrier layer, wherein the barrier layer is plated on the conductive material such that the resistance of the subsequently applied resistive layer does not vary substantially during exposure to printed circuit board processing chemistries. The process for making the material is directed to adjusting the electro deposition of the barrier layer by using the time for etching the resistive layer of the circuit board material in a standard etching bath.

Electrophotographic sensitive body

Abstract: PURPOSE:To form an image obtd after pause equally satisfactorily to an image formed in the stage of continuous use by subjecting a photosensitive body formed by laminating successively a barrier layer and a photoconductive layer bonded with photoconductive particles with a binder on a light transmittable base to processing for impressing an AC voltage CONSTITUTION:A photosensitive body formed by laminating successively a barrier layer 17 and a photoconductive layer 18 bonded with photoconductive particles by a binder on a light transmittable base 15 is subjected to processing for impressing an AC voltage A conductive developer 5 is disposed on the side of the base 15 opposite from the side processed in the above-mentioned way and a voltage is impressed between the developer 5 and an electrophotographic sensitive body 1 at the same instant when an image is exposed thereto from the base 15 side The AC voltage is impressed on the photoconductive layer in the above- mentioned way and current is forcibly passed thereto to eliminate the barrier at the boundary of the photoconductive particles and at the same time the barrier layer is provided, by which the image having good quality is obtd without change in the image density and without any photographic fog irrespectively of the pause time

Tubular, multi-layer film and method of making

Abstract: A tubular film and method for making the film by extrusion provide a multi-layer film having a central layer of barrier material which overlaps itself by a substantial distance along a weld line. The film includes inner and outer adhesive layers positioned on opposite sides of the central barrier layer, which adhesive layers completely encapsulated the central barrier layer. Finally, the film includes inner and outer surface layers. The inner surface layer is positioned within the inner adhesive layer, and the outer surface layer is positioned outside the outer adhesive layer.

Presensitized color-proofing diazo resin sheet with acrylic thermal adhesive layer

Abstract: A light-sensitive color proofing sheet is described for producing an image on various substrates. A light-sensitive continuous color layer is releasably attached to a carrier. Overlying the color layer is a water-insoluble transparent colorless barrier layer. On the opposite surface of the barrier layer is a thermally laminable adhesive layer. Upon lamination of the sheet to a substrate, removal of the carrier and exposure to actinic radiation, the color layer is formed into an image, photomechanically, by removal of the non-image areas.

Energy levels and electron wave functions in semiconductor quantum wells having superlattice alloylike material (0.9 nm GaAs/0.9 nm AlGaAs) as barrier layers

Abstract: Energy levels and wave functions of carriers are studied both experimentally and theoretically in 4 nm GaAs quantum wells (QW’s), for the case when barriers are formed with alternating layers of 0.9 nm GaAs/0.9 nm AlxGa1−xAs (x=0.39). The photoluminescence spectra of the QW’s are studied at 77 K and are found nearly equivalent to that of conventional QW’s having alloy barriers with Al content of 0.26, which is much higher than the averaged alloy composition (∼0.2). The modified Kronig–Penney analysis is found effective in predicting the observed energy and has clarified a feature of enhanced penetration of wave function into the novel barrier layer.

Microstructure and Electrical Properties of Sodium-Diffused and Potassium-Diffused SrTiO3 Barrier-Layer Capacitors Exhibiting Varistor Behavior

Abstract: In sodium-diffused strontium titanate internal-boundary-layer capacitors exhibiting good varistor properties, high-resolution transmission electron microscopy and scanning transmission electron microscopy revealed sodium segregation at grain boundaries in the absence of intergranular phases. The segregation layer is narrow (≅10 nm), unlike much broader diffused boundary layers which have also been observed. The nonohmic behavior in these and in potassium-diffused specimens suggests that segregated acceptor alkali ions act as grain-boundary electron traps leading to varistor electrical barriers.

Laminated preform with internal barrier layer

Abstract: This relates to laminated preforms, the method of forming such preforms and products which may be beneficially formed utilizing such preforms. Most particularly, this relates to a preform which has formed as part of the injection molding thereof two layers of barrier material which are disposed within two layers of thermoplastic resin and having received therebetween a solid core of thermoplastic resin. The specific method of forming the preform permits the barrier material layers to be of a greatly reduced thickness as compared to such layer tick- nesses permissible in the past, with the result that the barrier material layers in the blow molded articles are of a thickness recognized to be acceptable for the barrier function. The barrier material layers may be selectively terminated along the length of the preform so as to permit portions of the resultant blow molded article to be removed and reused.

Encapsulated electroluminescent lamp

Abstract: A barrier for an electroluminescent lamp having a phosphor-particle-containing layer disposed between corresponding electrodes consists of an integral multilayer polymeric film. A first layer of barrier material is integrally bonded in face-to-face contact with the exposed outer surface of the lamp body and the material has a characteristic vapor transmission rate significantly below the vapor transmission rate of the material of the lamp body; a second layer of barrier material is integrally bonded in face-to-face contact with the first barrier layer and the material has a vapor transmission rate significantly greater than the vapor transmission rate of the material of the first barrier layer; and a third layer of barrier material is integrally bonded in face-to-face contact with the second barrier layer and the material has a vapor transmission rate significantly less than the vapor transmission rate of the material of the second barrier layer. The barrier layer materials are thus selected to provide alternating zones of hydrophobic and hydrophilic character, with interfacial boundaries between the layers, to restrict and delay permeation of moisture through the barrier into the lamp, the effective retardation of vapor transmission through the barrier into the lamp being greater than the sum of the retardation characteristics of the individual barrier layers.

Method of laminating high barrier shrink film

Abstract: There is provided a heat shrinkable, high barrier laminate film which includes a hot blown, melt oriented high oxygen barrier film, of relatively high crystallinity and correspondingly relatively low ultimate elongation, laminated to a stretch oriented base film having a shrink tension substantially greater than that of said barrier film, the extent of orientation of said base film being sufficient such that its ultimate elongation is reduced so as to be commensurate with that of said barrier film. In one preferred mode, the barrier film is a layflat tubular film having its interior layflat surfaces laminated together. Representatively, the high barrier layer of the barrier film is vinylidene chloride copolymer having at least about 85% by weight vinylidene chloride content, preferably at least about 90%. Associated methods for making the laminate films are also provided.

Waterproof photographic paper support

Abstract: A multilayer, waterproof photographic paper support includes a paper which is coated with a layer of radiation hardened varnish or varnish color and a barrier layer is positioned between the paper and varnish layer. The barrier layer comprises a polymer, film-forming material, produced either by extrusion coating, a coating of an aqueous solution or dispersion.

Electrophotographic photosensitive member having a photoconductive layer of an amorphous material

Abstract: An electrophotographic photosensitive member, which is used for electrophotography, has a high dark resistivity and a high durability and achieves high charge acceptability and retentivity, the electrophotographic photosensitive member comprising a substrate, a photoconductive layer, a barrier layer provided between the substrate and the photoconductive layer for substantially inhibiting injection of carriers from the substrate to the photoconductive layer, and a covering layer provided on the photoconductive layer, wherein the layers are formed of amorphous hydrogenated silicon carbide doped with impurities.

Presensitized diazo color-proofing sheet with particular sized pigments

Abstract: A light-sensitive color-proofing sheet is described for producing an image on various substrates. A light-sensitive continuous color layer is releasably attached to a carrier. Overlaying the color layer is a water-insoluble transparent colorless barrier layer. On the opposite surface of the barrier layer is a thermally laminable adhesive layer. Upon lamination of the sheet to a substrate, removal of the carrier and exposure to actinic radiation, the color layer is formed into an image, photomechanically, by removal of the non-image areas.

Fuel-carrying line which can be installed fixed with a predetermined length for a motor vehicle

Abstract: Fuel-carrying line which can be installed fixed with a predetermined length for a motor vehicle, which line consists of a plastic tube with polyamide wall produced by extrusion by means of a screw. The polyamide wall has on the side facing the flow channel an alcohol barrier layer based on polyvinyl alcohol. This alcohol barrier layer has on the side facing the flow channel a water barrier layer based on polyamide. The polyamide wall, the alcohol barrier layer and the water barrier layer are combined by means of coextrusion so as to be integrally connected. The polyamide wall has a wall thickness which absorbs swelling of the water barrier layer due to alcohol absorption without troublesome enlargement of the predetermined length.

Voltage Dependence of Activation Energy for Multilayer Ceramic Capacitors

Abstract: Current-voltage and activation energy measurements can be used to probe grain boundary potential barriers. A common type of activation energy for Current conduction in a polycrystalline material is that due to the grain boundary potential barrier. Activation energy can be related directly to grain boundary barrier height. The height of this barrier depends on occupation of grain boundary states. Its decrease with applied voltage accounts for the superohmic current-voltage behavior of polycrystalline silicon and of ZnO varistors. It also accounts for positive temperature coefficient device behavior. A similar voltage dependence is reported here for barrier layer and COG type capacitors, where activation energies decrease from 0.99 to 0.44 eV and from 1.61 to 0.90 eV, respectively. Such decreases are not seen for X7R devices, even though currents are superohmic. Several mechanisms account for this. It is concluded that the grain boundary potential barrier may offer a major source of impedance to leakage current in multilayer ceramic capacitors, and its decrease may result in device failure.

Photographic paper for thermal recording

Abstract: PURPOSE:To prevent the strike-through of dye from a printed surface, to avoid the bleeding, blurring, etc. of an image and thereby to enable the maintenance of a printed image of excellent quality for a long time, by providing a barrier layer checking the transfer of the dye. CONSTITUTION:A dye accepting layer 13 is provided with interposition of a barrier layer 12 formed on a substrate 11 or a surface containing the substrate 11 itself. The barrier layer 12 is formed by applying resin or a mixture of this resin and a pigment on the substrate 11. As for the resin constituting the barrier layer 12, the resin of which the glass transition temperature is 40 deg.C or above and the water absorption rate (ASTMD-570) 2% or below, such as polysulfone resin or methyl methacrylate resin, for instance, can be used therefor. As for the pigment used in the case when it is contained in the barrier layer 12, calcium carbonate, for instance, of which the equilibrium moisture is 2% or below is used therefore. The amount of coating of the barrier layer 12 is desirably 0.5g/m -20g/m when the layer is formed only of the resin, while said amount is desirably 1g/m -20g/m with the ratio in the amount between the pigment and the resin set to be 4 or below when the layer is composed of the resin and the pigment.

Sublimation transfer printing paper

Abstract: PURPOSE: To prevent a treating liquid for forming a receiving layer from infiltrating into a paper base and enable a smooth receiving layer to be provided, by providing a barrier layer of an organic high molecular weight substance between the receiving layer and the paper base. CONSTITUTION: The sublimation transfer printing paper comprises the paper base 1, the barrier layer 2 of an organic high molecular weight substance provided on at least one side of the base 1, and the receiving layer which is provided on the layer 2 and comprises 20W98pts.wt. of a thermoplastic resin and 80W2pts.wt. of a radical-polymerizable resin. The barrier layr 2 is formed of, for example, polyethylene, polypropylene, a polyester, a polycarbonate, polystyrene or an acrylic resin, and has a Bekk smoothness of not lower than 800sec, so that a treating liquid for forming the receiving layer is prevented from infiltrating into the paper base, and a smooth receiving layer can be provided. Accordingly, details of an image can be reproduced with good fidelity, and an image with high quality and high resolution can be obtained. COPYRIGHT: (C)1987,JPO&Japio

Electrophotographic recording material

Abstract: An electrophotographic recording material is disclosed comprising an electrically conductive support, a photoconductive layer and, optionally, an insulating barrier layer between the substrate and photoconductive layer. The photoconductive layer comprises at least one organic, n-type conducting pigment in a concentration between 10 and 50, preferably between 15 and 30, percent by weight, relative to the photoconductive layer weight, at least one electronically inert, carbonyl group-containing binder and an organic, p-type conducting photoconductor in a concentration from 0 to 20, preferably from 2 to 8 percent by weight, relative to the photoconductive layer weight. The n-type conducting pigment preferably comprises a compound selected from the trans-perinones, the perylene-tetracarboxylic acid diimides, and the condensed quinones.

Effect of barrier thickness on the luminescence properties of AlAs/GaAs multiple quantum wells grown by molecular beam epitaxy

Abstract: The influence of barrier layer thickness LB for LB >3 nm on the optical properties of all‐binary AlAs/GaAs multiple quantum well heterostructures (MQWH) is studied by photoluminescence and excitation spectroscopy measurements at 2 K. In contrast to expectation for a simple coupling between the constituent GaAs quantum wells, MQWH samples with thinner barrier layers show excitonic peaks shifted to higher energies and exhibit a larger splitting between the electron to heavy‐hole and electron to light‐hole free excitons. This feature remains for different values of the otherwise constant well width within different series and when a small amount of Al is added to the well. Our detailed experimental data indicate that the mechanism responsible for the high‐energy shift is intrinsic in nature. This unusual feature demonstrates the inadequacy of photoluminescence and excitation spectroscopy to determine well widths accurately.

Wiring layers in semiconductor devices

Abstract: A semiconductor device has an electrode wiring layer including a first conductive layer (4) extending over an active region of the device, and a second conductive layer (6) spaced from the first conductive layer by a barrier layer (5) used for reaction prevention. The barrier layer consists of an insulating film having a thickness thin enough for flow of a tunnel current. In this way a wiring layer can be produced satsifactorily such as to have lower resistivity than an otherwise comparable prior wiring layer.

Structure of al metal layer

Abstract: PURPOSE: To improve reliability of the structure of an A1 metal layer by laminating 2 layers of any of TiN, TaN and ZrN used as a barrier layer and any of TiW and W as a cap layer on an aluminum film to prevent a projection generated on the aluminum film surface and to obtain a metal layer strong against a shallow junction. CONSTITUTION: After an aluminum film 5 (Al-I) is formed, TiN is laminated as a barrier layer 6 approx. 1,000Å thick. TiN is grown by a reactive magnetron sputtering method with a Ti target. Then, a with TiW or W as a target it is similarly sputtered to laminate a cap layer 7 500Å thick. Thereafter, a PSG film 8 is laminated as an insulating film. TaN, ZrN have extremely similar properties as nitride except TiN and are usable as the layer 6. These nitrides belong to the type of interstitial type nitride, melting point is very high (3,200°K or higher), very hard and adapted for a stopper against etching at the time of opening a through hole. COPYRIGHT: (C)1987,JPO&Japio

Heat sensitive magnetic recording medium

Abstract: PURPOSE: To prevent the reading of a prescribed signal and to prevent forgery by providing tow layers of high coercive force and low coercive force on one surface of a base and providing a leuco dye exothermic color forming layer as well as a barrier layer and protective layer on the other surface. CONSTITUTION: A heat sensitive magnetic recording medium is constituted of a substrate 11, a high coercive force layer 12, a low coercive force layer 13, a protective printing layer 14, a leuco dye heat sensitive color forming layer 15, a barrier layer 16 and a protective layer 17. A normal signal is recorded to the high coercive force layer and a dummy signal is recorded to the low coercive force layer. The heat sensitive recording layer to be formed on one surface of the base is the leuco dye heat sensitive color forming layer consisting of a sulfonate-contg. polyester resin as a binder, and further the protective layer essentially consisting of a polyurethane resin is provided via the barrier layer thereon. The normal signal of the high coercive force layer and the dummy signal of the low coercive force layer are superposed and it is not possible to detect which is the normal signal if the record of the magnetic medium is reproduced. The reproduction of the normal record by a transfer method and thermal transfer method is thus made difficult. COPYRIGHT: (C)1987,JPO&Japio

Spin‐coated As2S3: A barrier layer for high resolution trilayer resist system

Abstract: A trilayer resist process using spin‐coated As2S3 film as a barrier layer was investigated and optimized for use in optical and electron beam submicron lithography. The As2S3 layer eliminates the intermixing of solvents used to deposit the organic layers. Dimensional loss due to reflection from the substrate is avoided. A high reactive ion etch differential rate of the As2S3 film compared to organic resists has been observed which allows a precise transfer of patterns. 0.4 μm wide patterns over 1 μm topography were replicated without dimensional loss. Preliminary work on a bilayer process using As2S3 planarizer shows promise.