Topic
Blisters
About: Blisters is a research topic. Over the lifetime, 980 publications have been published within this topic receiving 16229 citations.
Papers published on a yearly basis
Papers
More filters
TL;DR: Skin blisters at different stages were taken from 4 patients with bullous pemphigoid and studied mainly by scanning electron microscopy to suggest that the basal cells are degenerated and shed off into the blister fluid, so that the prickle cells become flattened and directly face the blister fluids during blister formation.
Abstract: Skin blisters at different stages were taken from 4 patients with bullous pemphigoid and studied mainly by scanning electron microscopy. The under-surface of the roof of the newly formed blisters was
2 citations
TL;DR: In this article, the authors report studies of blister formation in rolled and annealed aluminum and a Cu-Be alloy and show that there is a correlation between crystallographic orientation and resultant blister size distribution.
Abstract: Blister formation by ion implantation has been recently attributed to the near surface gas concentration and the mechanical properties of the metal. At a critical level of near surface concentration blisters are created with a typical range of diameter size for the specific material and specific implantation ion energy. Single crystal implantation with high near surface He concentration has shown different typical blister sizes due to the crystallographic directions. In the present work the authors report studies of blister formation in rolled and annealed aluminum and a Cu-Be alloy. It was observed that, as a consequence of the reflective stopping powers, there is a correlation between crystallographic orientation and resultant blister size distribution.
2 citations
TL;DR: In this paper , an extensive experimental and analytical analysis of the spontaneous blister-formation in the multilayer graphene (MLG) flakes over a polymeric substrate is reported, which elucidates the involved mechanism and the governing parameters behind the development of elastic-solid as well as viscoelastic-substrate based instabilities.
Abstract: The blistering of elastic membranes is prone to elastic-solid as well as substrate-based mechanical instabilities. The solid-based instabilities have been well-explored in the mechanically indented blisters of elastic membranes over the rigid/solid substrates, but an integrated study illustrating the underlying mechanism for the onset of solid as well as substrate-based instabilities in the spontaneous blistering of a 2D material is still lacking in the literature. In this article, an extensive experimental as well as analytical analysis of the spontaneous blister-formation in the multilayer graphene (MLG) flakes over a polymeric substrate is reported, which elucidates the involved mechanism and the governing parameters behind the development of elastic-solid as well as viscoelastic-substrate based instabilities. Herein, a ‘blister-collapse model’ is proposed, which infers that the suppression of the hoop compression, resulting from the phase-transition of the confined matter, plays a crucial role in the development of the instabilities. The ratio of blister-height to flake-thickness is a direct consequence of the taper-angle of the MLG blister and the thickness-dependent elasticity of the upper-bounding MLG flake, which shows a significant impact on the growth-dynamics of the viscous fingering pattern (viscoelastic-substrate based instability) under the MLG blister.
2 citations
TL;DR: In this paper, the effects of fluorine stability and stress in SiOF films deposited by high-density plasma process on the generation of blisters were investigated by secondary ion mass spectrometry, thermal desorption spectroscopy (TDS), Fourier transform infrared spectroscopic (FTIR) and four point bending method using Top-SiN/TEOS/SiOF/Bottom-SiNs multilayer structure.
Abstract: Effects of fluorine stability and stress in SiOF films deposited by high-density plasma process on the generation of blisters were investigated by secondary ion mass spectrometry, thermal desorption spectroscopy (TDS), Fourier transform infrared spectroscopy (FTIR) and four point bending method using Top-SiN/TEOS/SiOF/Bottom-SiN multilayer structure. There are two kinds of fluorine in SiOF films, one is stable fluorine detected by FTIR, and the other is unstable one detected by TDS. Unstable fluorine in SiOF films is easy to diffuse and generates blisters at the interface of Top-SiN/TEOS films. Concentration of unstable fluorine is increased as the O 2 /SiH 4 flow ratio increases and at flow ratios higher than 2.38, blisters are generated. Only the stable fluorine is related with dielectric constant of SiOF film. Hydrogen in gas phase during SiOF-film deposition plays an important role for fluorine stabilization. Compressive stress in SiOF films does not cause blisters.
2 citations