Topic
Buffer gas
About: Buffer gas is a research topic. Over the lifetime, 3565 publications have been published within this topic receiving 47283 citations.
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TL;DR: In this article, the output rate, alteration of elemental composition, size distribution and crystalline structure of the nanopowders depending on parameters of laser radiation and buffer gas flow are reported.
Abstract: Oxide nanopowders Y2O3, ZrO2, YSZ (Y2O3-stabilized ZrO2), Ce0.8Gd0.2O2 and Y2O3- Al2O3 compounds were prepared with the help of laser evaporation and subsequent vapor condensation in the flow of buffer gas. An efficient technology and setup to produce high purity weakly agglomerated nanopowders are demonstrated. The output rate, alteration of elemental composition, size distribution and crystalline structure of the nanopowders depending on parameters of laser radiation and buffer gas flow are reported.
16 citations
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16 citations
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TL;DR: In this paper, a KD*P crystal electro-optic modulator was used for active mode-locking of the 1.315 mu m iodine photodissociation laser oscillator.
Abstract: Active mode-locking of the 1.315 mu m iodine photodissociation laser oscillator has been carried out using a KD*P crystal electro-optic modulator. This modulator provides a 100% depth of modulation of cavity losses which enables bandwidth limited mode-locked pulses to be obtained. Several laser gases have been investigated and pulsewidths down to 300 ps obtained without added buffer gas. The mode-locked pulsewidths have been used to obtain values of the relative pressure broadening parameters, which for CF3I, C2F5I and C3F7I are in the ratio of 1:1.13:1.34. The performance of the system suggests that mode-locked pulsewidths down to 50 ps should be obtainable with additional broadening by buffer gases.
16 citations
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24 Jun 1998
TL;DR: In this article, a cleaning solution preparation device includes a deionized water supply source, a gas supply source and a gas-dissolving unit, which is used to dissolve the gas supplied from the source to the sink.
Abstract: A cleaning solution preparation device includes a deionized water supply source, a gas supply source, a gas-dissolving unit, and a gas supply pressure controller. The gas supply source supplies any of an oxidative gas, a reductive gas, an inert gas, a mixed gas of an oxidative gas and an inert gas, or a mixed gas of a reductive gas and an inert gas. The gas-dissolving unit dissolves the gas supplied from the gas supply source in deionized water supplied from the deionized water supply source to supply a gas-dissolved cleaning solution to objects to be cleaned. The gas supply pressure controller controls the pressure of the supplied gas at a value exceeding the atmospheric pressure when dissolving the gas in the deionized water.
16 citations
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14 Oct 1997TL;DR: In this paper, a method and apparatus for safely, conveniently, and inexpensively liberating gas from gas hydrates includes the use of a device, provided adjacent to or in the bulk gas hyddrates, for exposing the gas hydrate to heat from a gas or liquid (preferably steam).
Abstract: A method and apparatus for safely, conveniently, and inexpensively liberating gas from gas hydrates includes the use of a device, provided adjacent to or in the bulk gas hydrates, for exposing the gas hydrates to heat from a gas or liquid (preferably steam). The gas hydrates can be directly exposed to the gas or liquid or indirectly exposed through a thermally conductive coil or channel. The heat from the gas or liquid dissociates the gas hydrates into the corresponding gas component and water component. After liberation, the gas component can be collected for further storage, transport, or use. The apparatus further includes a mechanism for moving at least a portion of the gas or liquid through the device for exposing the gas hydrates to heat. The device for exposing the gas hydrates to heat also can be movable, so it can be maintained in close proximity to or in contact with the gas hydrates for continued efficient gasification of the hydrates.
16 citations