Topic
Calibration curve
About: Calibration curve is a research topic. Over the lifetime, 6552 publications have been published within this topic receiving 95128 citations.
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TL;DR: In this article, a bulk optical fluorescence based immunosensor capable for multianalyte water analysis is presented. But the sensor is reusable due to its regenerability and cost effective due to the use of components customary in the trade.
Abstract: We demonstrated a bulk optical fluorescence based immunosensor capable for multianalyte water analysis. Calibration curves obtained for 2,4-dichlorophenoxyacetic acid (2,4-D) and simazine had detection limits of 0.035 µg/l and 0.026 µg/1 respectively. The sensor is reusable due to its regenerability and cost effective due to the use of components customary in the trade. Ways to further enhance device sensitivity by means of a high index film deposited on the sensor surface or by employing an integrated optical waveguide as transducer are presented. A concept for the detection of a varying range of analytes on the same transducer is discussed.
58 citations
TL;DR: An automated method for the determination of submicrogram amounts of selenium in vegetation is described and a relative standard deviation of better than 10% and a detection limit of 0.025 microg/g were obtained.
58 citations
TL;DR: In this paper, the efficiency calibration of germanium spectrometers in the energy range nbelow 300 keV was studied and produced suitable primary calibration sources and used them to set up efficiency calibration curves for three germanIUM spectrometer in the range from 122-412 keV.
58 citations
Patent•
07 Dec 1994TL;DR: In this article, a method is provided for measuring at resolutions which are in some instances less than 20 nanometers the concentration densities within one or more diffusion regions within a semiconductor substrate.
Abstract: A method is provided for measuring at resolutions which are in some instances less than 20 nanometers the concentration densities within one or more diffusion regions within a semiconductor substrate. The diffusion regions are prepared for measurement by cleaving a cross-sectional surface and polishing that surface to a substantially flat, exposed profile. The profile is purposefully pre-etched to remove oxide abutting the implant area and thereafter dopant-selective etched in accordance with concentration densities within the substrate. Pre-etching of oxide and concentration density etching of doped silicon provides an exposed topological contour measurable by atomic force microscopy (AFM). AFM can detect the entire cross-sectional surface including conductors and dielectrics. The topological height of impurity region profiles of a calibration wafer are correlated to impurity concentrations to form a calibration curve. The calibration curve, in conjunction with topological contour of a target region profile, allows direct and quick measurement of concentration densities along the target region profile at each AFM scan location. The initial scan position is purposefully defined by an oxide pre-etch step to present an easily discernible AFM-read gradient which signals an initial AFM read position.
58 citations
TL;DR: A novel method for H2O2 quantification was developed using simple modifications of an HPLC-DAD setup that is available in most analytical chemistry laboratories and showed excellent robustness by maintaining high regression coefficient and excellent sensitivity in all calibration curves regardless of the matrix content.
58 citations