Chamber pressure

About: Chamber pressure is a research topic. Over the lifetime, 2988 publications have been published within this topic receiving 30725 citations.

Process and device for production of electricity in a fuel cell through oxidation of hydrocarbons followed by filtration of particles

Abstract: A process for producing electricity in which comprises reacting a hydrocarbon stream 1 and stream 2 and air in a chamber 3 partial oxidation, the operating conditions being: - residence time in the chamber between 100 and 1200 milliseconds - Release room temperature between 1150 and 1650 ° C - chamber pressure between 0.1 and 1.5 MPa. The amount of soot contained in the effluent is less than 0.1% by weight relative to the load. Cooling the effluent from the room and it is circulated in a soot capture zone comprising a first circuit 6 comprising at least a first filter 7 and a second circuit 41 which feels connected in parallel, is carried out for a period of time a filtration step of the soot from the effluent in the first filter that has a filtration area ratio on working volume between 80 and 5000 m-1. For another period of time is regenerated first filter in the presence of oxygen, and is made to flow the effluent cooled in the second circuit. Recovering an effluent from the hydrogen-rich capture zone and a battery 10 is supplied to fuel effluent.

Tungsten films having low fluorine content

Abstract: Aspects of the methods and apparatus described herein relate to deposition of tungsten nucleation layers and other tungsten-containing films. Various embodiments of the methods involve exposing a substrate to alternating pulses of a tungsten precursor and a reducing agent at low chamber pressure to thereby deposit a tungsten-containing layer on the surface of the substrate. According to various embodiments, chamber pressure may be maintained at or below 10 Torr. In some embodiments, chamber pressure may be maintained at or below 7 Torr, or even lower, such as at or below 5 Torr. The methods may be implemented with a fluorine-containing tungsten precursor, but result in very low or undetectable amounts of fluorine in the deposited layer.

Boundary-Layer Suction System Design for Laminar-Flying-Wing Aircraft

Abstract: DOI: 10.2514/1.C031283 The present study aims to provide insight into the parameters affecting practical laminar-flow-control suction power requirements for a commercial laminar-flying-wing transport aircraft. It is shown that there is a minimum power requirement independent of the suction system design, associated with the stagnation pressure loss in the boundary layer. This requirement increases with aerofoil section thickness, but depends only weakly on Mach number and (for a thick, lightly loaded laminar flying wing) lift coefficient. Deviation from the optimal suction distribution, due to a practical chamber-based architecture, is found to have very little effect on the overall suction coefficient;hence,toagoodapproximation,thepowerpenaltyisgivenbytheproductoftheoptimalsuction flowrate coefficient and the average skin pressure drop. In the spanwise direction, through suitable choice of chamber depth, the pressure drop due to frictional and inertial effects may be rendered negligible. Finally, if there are fewer pumps than chambers, the average pressure drop from the aerofoil surface to the pump collector ducts, rather than to the chambers,determinesthepowerpenalty.Fortherepresentativelaminar-flying-wingaircraftparametersconsidered here, the minimum power associated with boundary-layer losses alone contributes some 80–90% of the total power requirement.

Atomic layer deposition of strontium oxide via N-propyltetramethyl cyclopentadiendyl precursor

Abstract: A method of depositing oxide materials on a substrate is provided. A deposition chamber holds the substrate, where the substrate is at a specified temperature, and the chamber has a chamber pressure and wall temperature. A precursor molecule containing a cation material atom is provided to the chamber, where the precursor has a line temperature and a source temperature. An oxidant is provided to the chamber, where the oxidant has a source flow rate. Water is provided to the chamber, where the water has a source temperature. By alternating precursor pulses, the water and the oxidant are integrated with purges of the chamber to provide low contamination levels and high growth rates of oxide material on the substrate, where the pulses and the purge have durations and flow rates. A repeatable growth cycle includes pulsing the precursor, purging the chamber, pulsing the water, pulsing the oxidant, and purging the chamber.