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Chamber pressure

About: Chamber pressure is a research topic. Over the lifetime, 2988 publications have been published within this topic receiving 30725 citations.


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Patent
27 Nov 2007
TL;DR: In this article, a mold is disposed in an evacuable chamber, cleaned to remove surface organic contamination and coated with the surface release layer in a chamber, all without relocation or undesired time delay.
Abstract: In imprint lithography, the mold is coated with a surface release layer for a non-sticking separation. Bonding strength of the release layer to the mold depends on the cleanness of the surface and the process of release layer deposition. In accordance with the invention, the mold is disposed in an evacuable chamber, cleaned to remove surface organic contamination and coated with the surface release layer in a chamber, all without relocation or undesired time delay. The chamber encloses a support chuck for the mold or substrate, a surface cleaner unit adjacent the support, a heating source adjacent the support, and advantageously, sensors of measuring chamber pressure, vapor partial pressure and moisture concentration. A vapor source connected to the chamber supplies release surfactant vapor. The mold is cleaned, and the cleaning is followed by vapor phase deposition of the surfactant. The mold is advantageously heated. Typical ways of cleaning include exposure to ozone or plasma ion etch. Surfactant vapor may be generated by liquid surface vaporization, liquid injection or spray vaporization. A surface adhesion promoter can be coated on the substrate by a similar method with the same apparatus.

27 citations

Patent
James T Johnson1
16 Jun 1970
TL;DR: In this paper, an inflatable confinement means, stored fluid under pressure, and a propellant charge for the generation of a hot gas was provided for use in a safety system.
Abstract: An apparatus for use in a safety system utilizing an inflatable confinement means, stored fluid under pressure, and a propellant charge for the generation of a hot gas. Means are provided for storing fluid under pressure which has a fluid outlet. A propellant chamber is provided for receiving an ignitable hot-gas generating charge of propellant. Means are provided to seal said chamber from said stored fluid. The arrangement is such that upon development of a predetermined chamber pressure after ignition of propellant, the chamber is unsealed and the fluid outlet is opened to permit the stored fluid and hot gas from the burning of the propellant to exit through the outlet. Means are provided between the chamber and the fluid outlet to deflect the hot gas upon exit from the chamber in a direction away from the fluid outlet to mix with the fluid prior to exit.

27 citations

Journal ArticleDOI
TL;DR: In this paper, a diagnostic method was developed to interpret the results of basic combustion studies with diesel-like fuels performed in a constant volume reactor originally conceived for cetane number measurements, the main target of the method is to calculate the instantaneous heat release over time from the chamber pressure experimental signal.

27 citations

Proceedings ArticleDOI
20 Jun 1999
TL;DR: In this paper, the effects of chamber pressure (density) ranging from the thermodynamic subcritical to supercritical values at a supercritical chamber temperature are observed by acquisition of shadow images from the injector exit region using a CCD camera illuminated by short-duration light pulses.
Abstract: A high pressure chamber with a variety of ambient fluids is used into which pure I$. , He, and O2 fluids are injected. The effects of chamber pressure (density) ranging from the thermodynamic subcritical to supercritical values at a supercritical chamber temperature are observed by acquisition of shadow images from the injector exit region using a CCD camera illuminated by short-duration light pulses. At sufficiently low subcritical chamber pressures, the jet interface disturbances amplify and eventually break up downstream into irregularly-shaped small entities. Increasing the chamber pressure causes the formation of many small ligaments and droplets on the surface of the jet only within a narrow regime below the thermodynamic critical pressure of the injected fluid, resembling a second wind-induced liquid jet breakup. At even higher chamber pressures, near but below the critical pressure of the injectant, the expected transition into a full atomization regime to produce a liquid spray is inhibited due to sufficient reduction of both the surface tension and the heat of vaporization. The jet appearance changes abruptly at this pressure and resembles a turbulent gas jet injection for all higher chamber pressures. The jet initial growth rate is plotted together with available data on liquid fuel injection in diesel engine environments, and turbulent incompressible, supersonic, and variable-density jets and mixing layers. The resulting plot is unique on its own right. At nearand super-critical pressures, the present measurements agree well with theoretical growth rate equations proposed by Brown [l]/Papamoschou and Roshko (21 and Dimotakis [3] for incompressible but variable-density turbulent mixing layers. This constitutes the first quantitative evidence in support of qualitative observations that the jet appears to evolve into a gas-like behavior. The geometry of the jet interface has also been examined for the first time by fiactal analysis. The results clearly indicate a transition Ii-om a Euclidean to a fractal interface, with a tiactal dimension close to values measured for gaseous turbulent jets. This provides additional quantitative evidence for the hypothesis that the jet evolves into a gas-like behavior. Finally, an “intuitive/smart” equation is proposed that agrees well with the experimental growth rate data, based on a proposed physical mechanism and characteristic gasification times and interfacial bulge formation/separation times.

27 citations

Patent
15 Jan 1997
TL;DR: In this article, a process module is proposed for semiconductor wafer processing to perform ambient or near ambient pressure reactions without requiring an intermediate buffer chamber, which can be integrated with a reduced pressure cluster tool system.
Abstract: A process module which can be integrated with a reduced pressure cluster tool system for semiconductor wafer processing to perform ambient or near ambient pressure reactions without requiring an intermediate buffer chamber. The process module includes: a housing defining an evacuatable containment chamber; an evacuation system for evacuating the containment chamber to a pressure below ambient pressure; a process chamber in the interior of the housing adapted for performing a process operation on a substrate, at an operating pressure substantially above that of the pressure of the containment chamber, and including a substrate access port openable to the containment chamber, the substrate access port, when closed, isolating said process chamber from said containment chamber so that said containment chamber may be maintained at a lower pressure than the process chamber pressure during performance of said process operation, and the substrate access port, when opened to the containment chamber, permitting said evacuation means to evacuate the process chamber and the containment chamber to the same pressure. A control system is provided which is operable to cause said access port to open and close, to operate said evacuation means and to perform said process operation according to a predetermined processing sequence.

27 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
202322
202257
202167
202086
201991
201882