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Chemical state
About: Chemical state is a research topic. Over the lifetime, 2378 publications have been published within this topic receiving 78183 citations.
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TL;DR: In this article, the chemical transformations of supported Rh particles, ranging in size from a few micrometers to a few nanometers, and nanocrystalline Rh films have been studied under identical oxidizing and reduction conditions by means of scanning photoelectron microscopy (SPEM), which allows determination of the chemical state of single Rh microparticles.
Abstract: The chemical transformations of supported Rh particles, ranging in size from a few micrometers to a few nanometers, and nanocrystalline Rh films have been studied under identical oxidizing and reduction conditions by means of scanning photoelectron microscopy (SPEM), which allows determination of the chemical state of single Rh microparticles. Comparing the oxidation states attained by the Rh particles revealed substantial reactivity differences with particle size, as well as variations in the reactivity of particles with similar dimensions and within the same particle. The results are interpreted in terms of the variable morphology of the particles as verified by secondary electron microscopy and atomic force microscopy.
15 citations
TL;DR: In this article, Auger electron spectroscopy and electron-stimulated desorption (ESD) were used to examine a polycrystalline tin oxide surface before and after annealing in vacuum at 500 C.
15 citations
TL;DR: In this paper, the effect of Fe doping on structural properties of ZrO2 grown by atomic layer deposition (ALD) using Zr(TMHD)4 for Zr and Fe(TMHP)3 for Fe precursors (TMHD = 2,2,6,6-tetramethyl-3,5-heptanedionate) and ozone as oxygen source.
15 citations
TL;DR: In this paper, a core-level photoemission spectroscopy study of the deposition of sulphur on the Si(100) surface has been performed, and the results are interpreted in terms of a submonolayer sulphur coverage, approximating to 3/4 monolayer, displaying a (1×1) bulk-like surface termination.
15 citations
30 Apr 2009
TL;DR: In this paper, the authors used x-ray reflectivity (XRR) to determine the parameters of the stacks, i.e. thickness and roughness of all the layers, and they concluded that the roughness is a purely geometrical parameter and not related to chemical interfacial reactions.
Abstract: We present the characterization of Al/SiC periodic multilayers designed for op tical applications. In some samples, a thin layer of W or Mo is added at the SiC-on-Al interfaces. We use x-ray reflectivity (XRR) in order to determine the parameters of the stacks, i.e. thickness and roughness of all the layers. We have performed x-ray emission spectroscopy (XES) to identify the chemical state of th e Al and Si atoms present within the stru cture from an analysis of the shape of the Al KE and Si KE emission bands. Finally, time of flight secondary ion mass spectrometry (ToF-SIMS) is used to obtain the depth profile of the different elements present within the studied stacks. A fit of the XRR curves shows that the Al/SiC multilayer present large interfacial roughness (up to 2.8 nm), which is decreased considerably (down to 1 nm or less) when the refractory metal layers are introduced in the periodic structure. The combination of XES and ToF-SIMS allows us to conclude that in these systems the roughness is a purely geometrical parameter and not related to chemical interfacial reactions. Keywords: periodic multilayer, x-ray emission, x-ray reflectivity, time of flight secondary ion mass spectrometry * philippe.jonnard@upmc.fr , phone 33 1 44 27 63 03, fax 33 1 44 27 62 26, www.lcpmr.upmc.fr/
15 citations