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Chemical state
About: Chemical state is a research topic. Over the lifetime, 2378 publications have been published within this topic receiving 78183 citations.
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TL;DR: Hard X-ray photoelectron spectroscopy (HAXPES) can be used to analyze the interfaces of heterogeneous catalysts because of its large information depth of more than 20nm as mentioned in this paper.
11 citations
TL;DR: In this paper, an X-EFM signal dependent on x-ray photon energy was used to obtain highly spatially resolved spectroscopic and image information of semiconductor surface region.
Abstract: Electrostatic force microscopy (EFM) was used to obtain highly spatially resolved spectroscopic and image information of semiconductor surface region. EFM with x-ray source (X-EFM) can probe x-ray induced photoionization of near surface electron trapping. The X-EFM signal dependent on x-ray photon energy results in nanometer scale x-ray absorption spectra. Furthermore, probing tip scanning at fixed x-ray photon energy provides chemical states imaging of the trapping. The authors demonstrate characterization of substoichiometric chemical oxidation of a Si surface with less than 1nm spatial resolution.
11 citations
TL;DR: In this paper, a simple method to obtain the electric potential distribution at the surface (charging-map) is demonstrated, and the sodium distribution on the Naβ-alumina surface after e-bombardment was found to be reflected in the corresponding charging-map.
11 citations
TL;DR: In this paper, the authors performed plasma treatment of thin layers of graphene oxide samples in various nitrogen containing gases (mainly NH3 and N2) in the preparation chamber of the X-ray photoelectron spectrometer, allowing the characterization of the treated surface.
Abstract: In this work, we performed plasma treatment of thin layers of graphene oxide samples in various nitrogen containing gases (mainly NH3 and N2). Experiments were performed in the preparation chamber of the X-ray photoelectron spectrometer, allowing “in situ” characterization of the treated surface. Introduction of nitrogen into the top surface was intensified by applying negative voltage on the sample between 0 and 300 V accelerating the positive plasma ions towards the sample.
Significant amount of nitrogen (≈10 atomic %) was built into the top atomic layers of the graphene oxide samples at application of the 2 types of plasma gases for 10-minute reaction time. When comparing the NH3 and N2 plasma treatments, more complete reduction and closely similar amount of nitrogen was found at applying NH3 plasma.
When increasing the bias, the N-content increased, together with decrease of the O content. The high-resolution C1s, O1s, and N1s spectra are broad, representing different chemical states. The peak envelopes of the O1s and N1s lines could be decomposed essentially to 3, while the C1s spectrum to 5 different, well-separated peaks, being identical for all samples.
The component peaks were assigned to specific chemical bonding states (N1s: 398.3 eV sp2 pyridine N, 399.7 eV sp2 pyrrole, diazine or triazine N, 401.0 eV N in graphite plane; O1s: 530.8 eV carbonyl, 532.2 eV ether, epoxy, alcohol, ester C═O, 533.6 eV ester C―O―C, carboxyl OH). The relative amounts of C―O and C―N bonding states changed significantly with advancement of the treatment performed at increasing biases.
11 citations
TL;DR: In this article, Li et al. showed that deuterium-irradiation and exposure at high temperature could result in the change of chemical states in Li2TiO3.
11 citations