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Chemical state
About: Chemical state is a research topic. Over the lifetime, 2378 publications have been published within this topic receiving 78183 citations.
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TL;DR: In this paper, the chemical states of In3Sb1Te2 (IST) thin film using high-resolution X-ray photoelectron spectroscopy (HRXPS) with the synchrotron radiation during in-situ annealing in ultra-high vacuum.
5 citations
TL;DR: In this article, bulk samples of SmFeAsO with and without F doping were prepared by thermal synthesis of the powders and some samples of obtained oxy-pnictides were further pressed and sintered at 1300 °C.
Abstract: Bulk samples of SmFeAsO with and without F doping were prepared by thermal synthesis of the powders. Some samples of obtained oxy-pnictides were further pressed and sintered at 1300 °C.
The crystalline structure of the samples was investigated by X-ray powder diffraction. The samples were also characterized by resistivity measurements and SEM-Energy Dispersive Spectroscopy (EDS) analysis. The chemical composition (atomic concentration and chemical states of constituent elements) of the samples' surface was analyzed by means of XPS before and after the sample cleaning by Ar ion sputtering. For the analysis of the bulk composition, the samples were scraped by using superfine diamond file and immediately transferred into XPS apparatus. In this way, the in-depth distribution of fluorine and the contribution of surface oxides were revealed. Copyright © 2010 John Wiley & Sons, Ltd.
5 citations
TL;DR: In this paper, an investigation was carried out of the chemical behavior of radioactive lanthanide atoms formed in Pr and Nd trifluoroacetylacetonates and in Pr nd hexafluoracetylacetyl acetonates irradiated with 660 MeV protons, and those resulting from the implantation of the Ln ∗(1+) ions with an energy of 40 keV into crystalline Nd(HFA) 3.
5 citations
TL;DR: In this paper, radio frequency plasma enhanced Chemical Vapor Deposition (RF CVD) using N2, SiH4 and C2H4 as the reaction sources was used to prepare amorphous ternary SixCyNz thin films.
Abstract: Radio Frequency plasma enhanced Chemical Vapor Deposition (RF CVD) using N2, SiH4 and C2H4 as the reaction sources was used to prepare amorphous ternary SixCyNz thin films. The chemical states of the C, Si and N atoms in the films were characterized by X-ray photoelectron spectroscopy (XPS) and Fourier Transform Infrared Spectroscopy (FTIR). The refractive indexn, extinction coefficientk and optical band gapEopt of the thin films were investigated by UV-visible spectrophotometer and spectroscopic ellipsometer. The results show that a complex chemical bonding network rather than a simple mixture of Si3N4, SiC, CNx and a-C etc., may exist in the ternary thin films. Then's of the films are within the range of 1. 90–2. 45, andEopt's of all samples are within the range of 2. 71–2. 86 eV.
5 citations
TL;DR: In this article, the Zr3d spectrum in the XPS measurement of PZT ceramics was found to vary according to their crystalline phases, and the results indicate that XPS has potential for a novel analytical application to PZTs.
Abstract: The Zr3d spectrum in the XPS measurement of PZT ceramics was found to vary according to their crystalline phases. The Zr3d spectrum of the rhombohedral phase was deconvoluted to the Zr3d5/2 profile at 181.3±0.2eV (denoted as A1) and the Zr3d3/2 profile at 183.6±0.2eV (A2), corresponding to a single chemical state. In contrast, those of both the tetragonal phase and the MPB were deconvoluted to four profiles, Zr3d5/2 at 182.1±0.2eV (B1) and Zr3d3/2 at 184.5±0.2eV (B2) in addition to A1 and A2, corresponding to double chemical states. The area ratios of (B1+B2)/ (A1+A2) for the tetragonal phase and the MPB were 0.6 and 0.3, respectively. These results indicate that XPS has potential for a novel analytical application to PZT ceramics.
5 citations