Topic
Chemical state
About: Chemical state is a research topic. Over the lifetime, 2378 publications have been published within this topic receiving 78183 citations.
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TL;DR: In this article, a set of thin Cu-Al alloy films, about 30A in thickness, are deposited on SiO 2 substrates, and a study of the interface formation during bias temperature stressing (BTS) of metal/dielectric interfaces was performed.
Abstract: Cu-Al alloys have been recommended for application as the diffusion barriers/adhesion promoters for advanced copper based metallization schemes In this study interfacial reaction between Cu-Al alloy/SiO 2 is investigated by x-ray photoelectron spectroscopy (XPS) A set of thin Cu-Al alloy films, about 30A in thickness, are deposited on SiO 2 substrates These were directly examined by XPS This is followed by a study of the interface formation during bias temperature stressing (BTS) of metal/dielectric interfaces in Cu/Cu-5at%AI/SiO 2 subjected to the electrical testing Core-level spectra of silicon and aluminum obtained indicate that the reduction of silicon dioxide initiates at room temperature when the aluminum concentration in the copper alloys reaches about 5 atomic percent The silicon diffusion into metal or vice versa is found to be suppressed during the low temperature anneal (300°C) by the Al 2 O 3 interfacial layer Also, a difference is present in the observed chemical states and interfacial reaction progressing between sputter and electron-beam deposited films The films of Cu doped with Al appear to act as a suitable diffusion barrier and adhesion promoter between SiO 2 and Cu
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TL;DR: In this paper, the original chemical state of Ta 2 O 5 thin films grown by reactive ionbeam-sputter deposition (RSD) and ion-beam-assisted sputter deposition (IBAD) was analyzed using a 3 keV oxygen ion beam of 30° incidence angle.
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TL;DR: In this paper, the valence shell, the outermost shell of electrons in a system, contributes most to the physical properties of material, it is these electrons that are shared in covalent bonding, transferred in ionic systems, coupled to form bands in bulk material, and interact most strongly with the environment.
Abstract: Chemical dynamics is the study of the elementary processes and interactions in chemistry. Fundamental properties such as dipole moments, ionization energies, electron affinities, proton affinities, and electronic structure all contribute to the photochemistry, radiationless processes and reactivity underlying all physical processes. The making and breaking of chemical bonds, and the energy partitioning in chemical systems after transformation, are also in the domain of chemical dynamics. The valence shell, the outermost shell of electrons in a system, contributes most to the physical properties of material. It is these electrons that are shared in covalent bonding, transferred in ionic systems, coupled to form bands in bulk material, and interact most strongly with the environment.
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TL;DR: In this article, the chemical states of Ni species were systematically investigated using an in situ XAFS technique for a series of SiO 2 -supported Ni catalysts with different Ni particle sizes.
1 citations
1 citations