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Chemical state
About: Chemical state is a research topic. Over the lifetime, 2378 publications have been published within this topic receiving 78183 citations.
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TL;DR: In this article , the results of quantitative examination of electron beam damage on LiPON surface and lithium chemical mapping were discussed, and the optimal conditions for AES mapping were determined using the optimal condition.
Abstract: All‐solid‐state batteries (ASSBs) have been attracting attention as the next generation batteries. Despite the growing interest, there are still many challenges faced in the commercial use of ASSBs. One of the biggest issues is the internal resistance generated at the interface between solid electrolyte (SE) and electrode. Understanding the solid–solid interactions requires chemical analysis near the interface. Auger electron spectroscopy (AES) is a suitable surface analysis technique to determine the lithium chemical state with high spatial resolution. However, SEs are often sensitive to electron beam irradiation, and the chemical state of SEs is easily changed during measurement. Therefore, in this study, scanning Auger microprobe (SAM) incorporated into a multitechnique XPS system was used to evaluate the electron beam damage on a LiPON (lithium phosphorus oxynitride) surface, and then the optimal conditions for AES mapping were determined. Using the optimal conditions, lithium chemical maps from LiPON/LiCoO2 cross‐section were obtained. In this paper, the results of quantitative examination of electron beam damage on LiPON surface and lithium chemical mapping will be discussed.
25 Jan 2000
TL;DR: In this paper, the authors used a raster electron-beam method to determine the local surface parameters with practically the same spatial resolution ( -100 im2) as the one described in this paper.
Abstract: The possibility to determine simultaneously a wide range of the characteristics of solid surfaces is of great importance in studying their electronic properties. In material science, surface physics and emission electronics it is particularly interesting to get at the same time information about elemental composition, chemical state and work function distribution ofthe surface under investigation. Up to a present, these surface parameters have been determined separately, under nonidentical conditions. The composition and chemical state ofthe surface are usually studied by different kinds of electron spectroscopy most often -by Auger electron spectroscopy (AES); the absolute value ofwork function and its relative distribution along the surface are measured by the raster electron-beam method 2 Both methods allow to determine the local surface parameters mentioned above with practically the same spatial resolution ( -100 im2).
TL;DR: In this article, the chemical state change on the cresol-novolak photoresist surfaces was investigated using Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) and some basic information of the chemical reactions caused by UV irradiation were obtained.
Abstract: The chemical state change on the cresol-novolak photoresist surfaces was investigated using Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) and some basic information of the chemical reactions caused by UV irradiation were obtained. The photoresist sample used in this study was a mixture of the base polymer of cresol-novolak resin and an additive which has naphtoquinonediazide as the photosensitive materials. This photoresist was coated on a Si wafer and then exposed to a 254 nm UV light over varied periods of time. It was clearly observed that the intensity of the peaks resulting from the scissioning of the chemical bonds and oxidation of the polymer backbone increased with the increase of exposure time. We also investigated the same samples using XPS and FT-IR. It was demonstrated that TOF-SIMS provides more sensitive information on the slight change of chemical state due to chemical bond scissioning and oxidation than XPS or FT-IR and that this technique is quite useful for the surface characterization of this kind of photoresist materials.
TL;DR: In this paper, the soft X-ray L-emission spectra of nickel from several nickel compounds and impregnated nlckel-on-γ-alumina catalysts are presented.
Abstract: Soft X-ray L-emission spectra of nickel from several nickel compounds and impregnated nlckel-on-γ-alumina catalysts are presented. The intensity ratios of Lα, LβT and satellite peaks are characteristic of the chemical state and coordination of the metal. These are used in characterizing low concentration of nickel (0.1-1.0 wt%) supported on γ-alumina. Preliminary studies on the correlation of the chemical states of nickel with the impregnation profiles and impregnation strategies is discussed.
TL;DR: The features of PANI/Me composites (Me-Cu, Zr) have been studied spectroscopically as mentioned in this paper, and it has been found that polyaniline is in a partially oxidized form in composites regardless of the type of modifying additive used.
Abstract: The features of the electronic structure and chemical bonds of PANI/Me composites (Me–Cu, Zr) have been studied spectroscopically. X-ray absorption spectroscopy, x-ray photoelectron spectroscopy, and infrared spectroscopy have been used for the research. It has been found that polyaniline is in a partially oxidized form in composites regardless of the type of modifying additive used, but it is more oxidized in PANI/Zr than in PANI/Cu. The chemical states of nitrogen in composites have been determined and the ratio of neutral and charged nitrogen groups is different.