Topic
Chemical state
About: Chemical state is a research topic. Over the lifetime, 2378 publications have been published within this topic receiving 78183 citations.
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TL;DR: There was significant difference in both surface roughness parameters of silica-coated zirconia after chemical treatments and the surface topography varied depending on the acid treatment.
49 citations
TL;DR: In this article, the primary stages of the oxidation of NiCr23 and NiCr21Fe12 and the final oxide layers were studied at room temperature and oxygen pressures between 10−6 Pa and 10−4 Pa using AES and XPS.
Abstract: The primary stages of the oxidation of NiCr23 and of NiCr21Fe12 and the final oxide layers were studied at room temperature and oxygen pressures between 10−6 Pa and 10−4 Pa using AES and XPS. The composition of the surface during oxygen exposure was monitored by continuous recording of the Auger transitions M23 VV and L3M23V of the metallic components and the KL23L23 transition of oxygen. The low energy M23VV transitions are especially indicative of the present chemical state which is additionally characterized by the 2p photoelectron spectra. After different oxygen exposures, the thickness of the oxide layers was determined by angle resolved AES, XPS results, and by sputter depth profiling which also gives the elemental in depth distribution. It is concluded that the initial preferential oxidation of Cr is followed by a surface enrichment and oxidation of the remaining elements with lower affinity to oxygen, i.e. Ni in NiCr and both Ni and Fe in NiCrFe.
49 citations
TL;DR: In this article, InAs(100) wafers were either passivated with sulfur from a (NH4)2Sx solution or etched with NH4OH and then characterized with monochromatic x-ray photoelectron spectroscopy (XPS) before and after in situ deposition of Al2O3 by atomic layer deposition.
Abstract: Undoped InAs(100) wafers were either passivated with sulfur from a (NH4)2Sx solution or etched with NH4OH and then characterized with monochromatic x-ray photoelectron spectroscopy (XPS) before and after in situ deposition of Al2O3 by atomic layer deposition. Sulfur passivation minimized oxidation. Trimethyl aluminum (TMA) exposure reduced trivalent indium and arsenic oxidation states. The In1+ chemical state persisted while elemental arsenic remained at the Al2O3/InAs interface prior to TMA exposure and possibly a mixture of As–As and As–Al bonds were present afterwards. The In 3d5/2 peak line shape from bulk InAs differed from previous XPS experiments on epitaxial InxGa1−xAs.
49 citations
Patent•
18 Apr 1980TL;DR: In this article, the authors describe a process and apparatus to control the chemical state of a material, that is, to cause said material to retain desired characteristics in an environment that normally would cause a change in those characteristics or to cause a material that has deteriorated from a desired chemical state to revert to the desired state.
Abstract: Electrochemical process and apparatus to control the chemical state of a material, that is, to cause said material to retain desired characteristics in an environment that normally would cause a change in those characteristics or to cause a material that has deteriorated from a desired chemical state to revert to the desired state.
49 citations
TL;DR: In this article, the interaction of low-energy nitrogen ions with ZnO surface has been studied by photoemission spectroscopy (PES) around N 1s core-level and near-edge X-ray absorption fine structure (NEXAFS), around N K-edge.
49 citations